MW-3

Heidelberg uPG501

Nanofabrication Facility

MAKE

Heidelberg

MODEL

uPG501

LOCATION

Cleanroom G07 LISE

The Heidelberg Instruments uPG501 is an optical direct-write lithography system. Using 390nm light and a micro-mirror array, the system can reproduce GDSII format CAD patterns directly on both positive tone and SU-8 photoresist. The system has a semi-automated alignment capability. Maximum resolution is 1 micron, though 2-3 micron is more typical. The system can accommodate substrates between 5 and 100 mm diameter, and between 100 microns and 7 mm thick, and can write on opaque, transparent, and reflective substrates. Writing speed is up to 44 mm2/min, depending greatly on the type and thickness of resist used.

Contact staff for training information.

Guixiong Zhong

617-384-5672

gzhong@cns.fas.harvard.edu

primary contact

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