EE-3

Sharon E-Beam Evaporator

Nanofabrication Facility

MAKE

Sharon

MODEL

N/A

LOCATION

Cleanroom G07 LISE

Equipment description and usage: SHARON EE-3 is an e-beam evaporation system suitable for depositing metal thin films. The system has a six-pocket e-gun with a 10 kW power supply. Film thickness is in-situ monitored by quartz crystal monitor. The systems vacuum is supported by a cryopump and an oil-free roughing pump. Vacuum can reach 10e-8 torr range. Applications: This system is currently set up for depositing low vapor-pressure metal materials. These metals include: Ag, Co, Cr, Cu, Ge, Mo, Ni, NiFe (permalloy), Pd, and Ti. CNS supplies some of these, others are user supplied.

Contact staff for training information.

Ed Macomber

617-384-5227

eddiemac@cns.fas.harvard.edu

primary contact

David LaFleur

617-384-5024

dlafleur@cns.fas.harvard.edu

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