RIE-1

South Bay RIE

Nanofabrication Facility

MAKE

South Bay Tech.

MODEL

RIE-2000

LOCATION

Cleanroom G07 LISE

The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6″ sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.

RIE-1 can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.

Contact staff for training information.

Kenlin Huang

617-495-1738

kenlinhuang@cns.fas.harvard.edu

primary contact

Dr. Ling Xie

617-496-9069

lxie@cns.fas.harvard.edu

Logins

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