The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6″ sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.

RIE-1 can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.