RIE-1
South Bay RIE
Nanofabrication Facility
MAKE
South Bay Tech.
MODEL
RIE-2000
LOCATION
Cleanroom G07 LISE
The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6″ sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar.
RIE-1 can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.
Contact staff for training information.
Kenlin Huang
617-495-1738
kenlinhuang@cns.fas.harvard.edu
primary contact
Dr. Ling Xie
617-496-9069
lxie@cns.fas.harvard.edu