OL-5

Suss MJB4 Mask Aligner

Nanofabrication Facility

MAKE

Karl Suss

MODEL

MJB4

LOCATION

Cleanroom G07 LISE

The MJB4 Mask Aligner allows different type of contact exposures (vacuum, hard, soft proximity contact) for different size sample (up to 4 inch in diameter). The achievable adjustment accuracy X, Y and theta is below 1 um. Masks and wafer/substrates to a total thickness of 9.00 mm can be processed. The MJB4 is equipped with 400 nm exposure optics and lamps that allow a sub-micro exposure in vacuum contact.

*Positive and negative tone photoresists
*Substrate sizes up to 4 inches in diameter
*4 inch or 5 inch mask plates
*Topside alignment only
*Minimum alignment mark separation for binocular vision: 3.5 cm
*Typical pattern resolution 1 micrometer
*Achievable alignment resolution 1 micrometer

Please contact staff for information on training.

Dr. Christine Wang

617-496-5466

cyjwang@fas.harvard.edu

primary contact

Guixiong Zhong

617-384-5672

gzhong@cns.fas.harvard.edu

Dr. Ling Xie

617-496-9069

lxie@cns.fas.harvard.edu

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