TE-4

Sharon Thermal Evaporator TE-4

Nanofabrication Facility

MAKE

Sharon

MODEL

N/A

LOCATION

LISE Cleanroom G07

Equipment description and usage: SHARON TE-4 is a four-source thermal evaporation system for depositing thin films by resistive heating. The system has two 2.5-kW power supplies, each controls two deposition sources, allowing deposition of two materials at the same time. Film thicknesses for each pair of sources are monitored in-situ, respectively, by two quartz crystal monitors. A cryopump and oil-free roughing pump vacuum system allows base pressures down to ~2e-7 torr. Applications: This is system is currently set up for common use of depositing low vapor-pressure materials, magnetic or non-magnetic. Features: * Four thermal source pockets * Two 2.5 kW power supplies, capable of sequential thin film deposition * Quartz crystal monitor for closed loop thickness control * Multiple substrate holders with substrate size up to 3"" maximum * Provision of water or liquid nitrogen cooling and substrate heating up to 340 °C * Cryopump, base pressure down to ~ 2E-7 torr

Click here to view this tool in the CNS virtual reality model.

If you wish to become a qualified user for this facility, you must contact Ed Macomber for training and qualification.  Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.

Ed Macomber

eddiemac@cns.fas.harvard.edu

primary contact

David LaFleur

dlafleur@cns.fas.harvard.edu

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