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COVID-19 Nanofabrication re-opening protocol orientation (2nd wave)
07/17/2020
COVID-19 Nanofabrication re-opening protocol orientation
CNS
06/23/2020
Atomic Layer Deposition at Harvard CNS
Mac Hathaway - Harvard University
10/03/2019
MOCVD enables cutting-age applications
Dr. Xiaoqing Xu - Stanford University
10/04/2019
ALD Capabilities at Penn State
Bangzhi Liu - Penn State
Spectroscopic Ellipsometry for In Situ Applications
Greg Pribil - J. A. Woollam
Chemicals for Vapor and Atomic Layer Deposition
Strem Chemicals
Beyond A/B/A/B… Unorthodox Pulse Sequences in Atomic Layer Deposition
Jeffrey W. Elam - Energy Systems Division - Argonne National Laboratory - Argonne, IL, USA
11/30/2012
ALD Precursors and Reaction Mechanisms
Prof. Roy Gordon
ALD at Cornell NanoScale Facility
Vince Genova
Mac Hathaway
Atomic Layer Deposition at the Stanford Nanofabrication Facility
J. Provine & Michelle Rincon
ALD at University of Minnesota
ALD Capabilities at MRC UT Austin
Marylene Palard, J. H. Yum, T. Akyol, B Fallahazad, E Tutuc, J Lee, S Banerjee
ALD at Georgia Tech IEN
John Pham
Atomic Layer Deposition at ASU NanoFab
S. Myhajlenko and A. Handugan
ALD Nanofilm microchannel plate Technology
N. T. Sullivan
ALD at Penn State
Atomic Layer Deposition at UCSB
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