All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page

(Important information - please read)

Open Events
CNS Users Only
LISE Cleanroom Users Only
Month

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: B15A online safety training - Harvard Training Portal
Trainer: Jules Gardener
CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013222 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.

Training: Basic Arctica Cryo-EM course Day 2 - B58 control room
Trainer: Svetla Stoilova-McPhie
Practicing of the Arctica Cryo-EM workflow.

Training: Basic Arctica Cryo-EM course Day 3 - B58 Control room
Trainer: Svetla Stoilova-McPhie
Practice and Certification to follow with Intermediate course

Training: Basic Arctica Cryo-EM course, Day 1 - B58 control room
Trainer: Svetla Stoilova-McPhie
CNS users will be demonstrated the Basic operation of our Tecnai Arctica Cryo-TEM workflow and have their own area set up to practice.

Training: Cryo-TEM sample preparation - GO5
Trainer: Svetla Stoilova-McPhie
CNS users will be trained to use the Vitorbot Mark IV to freeze their samples. CNS users need to do the training for GO5 (2h) with Sandra Nacasone, (snakasone@cns.fas.harvard.edu) to use the equipment.

Training: Intermediate Arctica Cryo-EM course Day 1 - B58 Control room
Trainer: Svetla Stoilova-McPhie
The Intermediate Arctica Cryo-EM course has to be taken the week after the Basic Cryo-EM course. It will consist of working with a standard Cryo-EM sample (vesicle and Apoferritin).

Training: Sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013226 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.

Training: TEM Training Part 1: Online training - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100 and FEI F20 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or FEI F20 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Time	Max Attendees	Available	CNS Users ONLY
Monday, September 23rd, 2019
Training: G05 Cell Culture and Cryo-Prep Room Orientation - Meet outside of G05
Trainer: Sandra Nakasone
This safety orientation is mandatory for access to our biomaterials, cryo-prep, and cell culture BL2 laboratory (LISE G05). In order to gain access users must attend this orientation, complete at least one training for equipment inside G05, and take the "Laboratory Biosafety" online training from the Harvard EH&S website (https://www.ehs.harvard.edu/training). Email Sandra Nakasone (snakasone@cns.fas.harvard.edu) the certificate of completion once you are done. LONG PANTS and CLOSED-TOE SHOES MANDATORY.
10:30 am - 11:00 am LONG PANTS and CLOSED-TOE SHOES MANDATORY. Long hair must be tied up.	6	FULL	Registration Closed

Training: G06 Nanotechnology and Rapid Prototyping Room Orientation - Meet outside of G06
Trainer: Sandra Nakasone
This safety orientation is mandatory for access to our chemical nanotechnology and rapid prototyping room (LISE G06). In order to gain access users must complete this safety orientation and at least one training for equipment inside G06. LONG PANTS AND CLOSED-TOE SHOES ARE MANDATORY.
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 11:30 am LONG PANTS and CLOSED-TOE SHOES are MANDATORY. Long hair must be tied up.	6	2	Register!

Training: SP-3 AJA 3-gun sputtering system - In the cleanroom, next to the sputtering tools
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Thin Film deposition processes" The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:30 pm - 2:30 pm	3	2	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Tuesday, September 24th, 2019
Training: RIE-8 - STS ICP RIE - LISE CNS Cleanroom at the tool
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training! STS RIE - 8 is an Inductively Coupled Plasma etching system and characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Major features include: 1. ICP power up to 1,500 W 2. RF bias up to 300 W 3. Available gases: SF6, C4F8, CHF3, CF4, H2, Cl2, HBr, BCl3, Ar, O2, and N2 4. Substrate temperatures from 10 °C to 30 °C 5. Handling 6″ or smaller samples Applications Etching silicon-based materials, boron nitride, and other compatible 2-D materials Available Processes 1. High aspect ratio Si pillars 2. Si nano-wires and nano-needles 3. Si micro holes 4. Si trenches 5. SiO2 and Si3N4 trenches 6. Graphene and boron nitride etch
1:30 pm - 3:00 pm	4	FULL	Registration Closed

Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B
Trainer: Tim Cavanaugh
This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available �Zeiss SEM Part 1: Online training� prior to registration.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 4:00 pm	4	FULL	Registration Closed

Training: Basic Arctica Cryo-EM course Day 2 - B58 control room
Trainer: Svetla Stoilova-McPhie
Practicing of the Arctica Cryo-EM workflow.
Time	Max Attendees	Available	CNS Users ONLY
9:00 am - 4:00 pm	1	FULL	Registration Closed

Training: Cleanroom orientation -- CNS - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and operations of CNS cleanroom
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:30 pm please be prompt	8	FULL	Registration Closed

Training: Form2 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 3:30 pm	4	4	Register!

Training: Helix Laser Cutter Training - G06
Trainer: Sandra Nakasone
Prereq 1: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. Prereq 2: You must complete the EH&S online training called "Enclosed Laser Instrument Safety" and email the certificate of completion to Sandra Nakasone (snakasone@cns.fas.harvard.edu). You can access the online training here: https://www.ehs.harvard.edu/training
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:00 pm	4	4	Register!

Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom
Trainer: Mac Hathaway
Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 11:30 am	10	FULL	Registration Closed

Training: Makerbot 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:00 pm	4	3	Register!

Training: MLA150 Maskless Aligner - Metrology bay in the cleanroom
Trainer: Guixiong Zhong
Training on the Heidelberg MLA150 Maskless Aligner. This tool can be used to expose positive and negative photoresist without the need for a photomask. The tool has 1 micron or better feature resolution, 0.5 micron alignment accuracy. The prerequisites for this training are the wet bench training, and Spinner/developing training.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	4	1	Register!

Training: Raman and PL spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam HR Evolution with 532 nm and 633 nm excitation lines for Raman and PL spectroscopy or mapping
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	3	2	Register!

Training: RIE-7 - Unaxis Shuttleline ICP RIE - in front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-7 - Unaxis Shuttleline ICP RIE 3:30 pm
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:30 pm - 4:30 pm kenlinhuang@cns.fas.harvard.edu	4	3	Register!

Training: RTP3 training - meet inside in PVD bay
Trainer: John Tsakirgis
To understand safety and operations of RTP
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
9:30 am - 10:30 am please bring a cleanroom notebook	2	FULL	Registration Closed

Training: SEM-10 Hitachi 8230 SEM User training - in the cleanroom, next to the SEM
Trainer: Christine Yi-Ju Wang
Pre-requisite: Previous SEM experience. If not, please complete the Harvard SEM on-line training- There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:30 am	2	FULL	Registration Closed

Training: Spinner training - In the cleanroom, next to the spinners
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 1:30 pm	4	FULL	Registration Closed

Training: UV-VIS-NIR spectroscopy - LISE G04
Trainer: Arthur McClelland
learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm
Time	Max Attendees	Available	CNS Users ONLY
1:30 pm - 3:30 pm	3	2	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Wednesday, September 25th, 2019
Training: AS200 i-line Stepper - Photolithography bay
Trainer: Guixiong Zhong
Training for the stepper. System overview, job making, editing, reticle loading, wafer loading, and unloading will be covered in the training. Please see the tool webpage for more information on the capabilities of this tool. The prerequisites for this training are the wet bench training, spinner/developing training, and the Introduction to Lithography class.
2:00 pm - 3:30 pm	4	1	Register!

Training: Contact Angle Measurement Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
11:30 am - 12:00 pm	4	3	Register!

Training: Freeze Dryer/Lyophilizer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 1:30 pm	4	4	Register!

Training: FTIR Spectroscopy and Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Nicolet iS50 FTIR spectrometer and the Bruker Lumos FTIR microscope
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	3	1	Register!

Training: Introduction to Dry Etching - LISE 311
Trainer: Ling Xie
his class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed.
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 10:30 am	12	FULL	Registration Closed

Training: Introduction to Lithography - LISE room 319
Trainer: Guixiong Zhong
The class describes the basic working principles of lithography techniques. It also gives an overview of tools that are available in CNS. This is a prerequisite for all lithography process trainings.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:00 pm	10	4	Register!

Training: Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
It is recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Full independent access to the AFM (SPM-5) requires at least one individual user assisted session that serves as a qualification for independent use and scheduled on another day. AFM probes are provided for training; however, users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:30 pm - 4:30 pm	3	FULL	Registration Closed

Training: Planetary Ball Mill Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
1:30 pm - 2:00 pm	4	4	Register!

Training: RCA WET PROCESS TRAINING - Meet in Wet Bay
Trainer: John Tsakirgis
To understand safety and protocols of RCA training
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
9:30 am - 10:30 am please be prompt	5	4	Register!

Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - in front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-13 - Oxford PlasmaPro 100 Cobra 300
Time	Max Attendees	Available	CNS Users ONLY
2:30 pm - 3:30 pm kenlinhuang@cns.fas.harvard.edu	4	1	Register!

Training: Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (last bay inside of LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). All materials are user supplied for EE-3 (pellets and crucible liners). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. This is a manually operated deposition system and will likely take most users a few times using it to become comfortable with the machine. We meet in the cleanroom PVD bay (last bay inside LISE G07).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm (Please review document links in email confirmation)	4	3	Register!

Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography" The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:00 am	3	2	Register!

Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography" The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
11:00 am - 11:30 am	3	3	Register!

Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE
Trainer: Mac Hathaway
Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 12:30 pm	8	FULL	Registration Closed

Time	Max Attendees	Available	CNS Users ONLY
Thursday, September 26th, 2019
Training: ALD3 - PDR Thermal ALD System Training - Cleanroom PVD Bay
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training: This ALD system utilizes a smaller chamber and faster heating and cooling to achieve quicker ALD process times. It is also equipped with an ozone generator that enables the growth of high quality, conformal SiO2 films as well as low temperature Pt metal films. Other films available include Al2O3, TiO2, and HfO2.
10:00 am - 11:00 am prerequisite: Introduction to Thin Film Growth and Processing	4	3	Register!

Training: Atomic Force Microscopy (AFM) Part-2 Individual User Qualification (Asylum MFP3D or Cypher SPM-2&6) -
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d or Cypher AFM�s with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tip�s, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE B58
Time	Max Attendees	Available	CNS Users ONLY
2:30 pm - 5:30 pm	3	2	Register!

Training: Basic Arctica Cryo-EM course Day 2 - B58 control room
Trainer: Svetla Stoilova-McPhie
Practicing of the Arctica Cryo-EM workflow.
Time	Max Attendees	Available	CNS Users ONLY
9:00 am - 4:00 pm	1	FULL	Registration Closed

Training: CVD4 Lindberg - meet in front of CVD4
Trainer: John Tsakirgis
To understand safety and operation of CVD4
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
9:30 am - 10:30 am please bring a cleanroom notebook	3	2	Register!

Training: Discussion for nanofabrication related questions. - LISE G52
Trainer: Ling Xie
Discussion for nanofabrication related questions.
Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 3:30 pm	1	1	Register!

Training: Orientaion for Cleanroonm Access - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and tools
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:30 pm	8	7	Register!

Training: Raman, PL, and hyperspectral spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba XploRa with 405 nm and 785 nm excitation lines for Raman and PL spectroscopy or mapping. The system also has a Cytoviva hyperspectral imaging system attached for reflection or transmission in bright field or dark field from 420-1000 nm.
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	2	FULL	Registration Closed

Training: Synergy H1m Plate Reader - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 12:00 pm	4	4	Register!

Training: Zetasizer Nano ZS DLS Training - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:00 pm	4	4	Register!

Time	Max Attendees	Available	CNS Users ONLY
Monday, September 30th, 2019
Training: FIB-4 FEI Helios - Basic Training - B15F
Trainer: Stephan Kraemer
Basic introduction to operation of a focused ion beam microscope. Discussion of available deposition, milling and imaging techniques on the Helios Nanolab 660.
1:00 pm - 5:00 pm Prior SEM training recommended	4	2	Register!

Training: O2 plasma stripper : RIE-9 and RIE-5 - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
O2 plasma stripper : RIE-9 and RIE-5 3:30 to 4 pm
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:30 pm - 4:00 pm kenlinhuang@cns.fas.harvard.edu	4	1	Register!

Training: Soft Materials Cleanroom (SMCR) Orientation - Meet outside the cleanroom in the ground floor couches
Trainer: Sandra Nakasone
This orientation is required for access to the Soft Materials Cleanroom (SMCR). The SMCR is a cleanroom devoted to Soft Lithography with a focus on rapid prototyping of microfluidic devices using PDMS elastomer. LONG PANTS & CLOSED-TOE SHOES ARE MANDATORY. Long hair must be tied up. Quiz to follow.
Time	Max Attendees	Available	CNS Users ONLY
10:30 am - 12:00 pm Long pants and closed-toe shoes are MANDATORY. Long hair must be tied up. Quiz to follow.	6	FULL	Registration Closed

Training: SP-3 AJA 3-gun sputtering system - In the cleanroom, next to the sputtering tools
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Thin Film deposition processes" The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:30 pm - 2:30 pm	3	3	Register!