All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page


(Important information - please read)
 
  • Open Events
  • CNS Users Only
  • LISE Cleanroom Users Only
  • Month
Date TBD - you can pre-register for this training session.
CNS staff will notify you when a date has been set.
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
 
Training: B15A online safety training - Harvard Training Portal
Trainer: Jules Gardener
CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013222 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time.

Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.
 
Training: Basic Arctica Cryo-EM course Day 2 - B58 control room
Trainer: Svetla Stoilova-McPhie
Practicing of the Arctica Cryo-EM workflow.
 
Training: Basic Arctica Cryo-EM course Day 3 - B58 Control room
Trainer: Svetla Stoilova-McPhie
Practice and Certification to follow with Intermediate course
 
Training: Basic Arctica Cryo-EM course, Day 1 - B58 control room
Trainer: Svetla Stoilova-McPhie
CNS users will be demonstrated the Basic operation of our Tecnai Arctica Cryo-TEM workflow and have their own area set up to practice.
 
Training: Cryo-TEM sample preparation - GO5
Trainer: Svetla Stoilova-McPhie
CNS users will be trained to use the Vitorbot Mark IV to freeze their samples.
CNS users need to do the training for GO5 (2h) with Sandra Nacasone, (snakasone@cns.fas.harvard.edu) to use the equipment.
 
Training: Intermediate Arctica Cryo-EM course Day 1 - B58 Control room
Trainer: Svetla Stoilova-McPhie
The Intermediate Arctica Cryo-EM course has to be taken the week after the Basic Cryo-EM course.
It will consist of working with a standard Cryo-EM sample (vesicle and Apoferritin).
 
Training: Sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.

Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013226 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.
 
Training: TEM Training Part 1: Online training - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100 and FEI F20 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or FEI F20 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142

Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
 
Tuesday, November 12th, 2019
Training: ALD-1 and ALD-4 Training - ALD Oxide Deposition - Starts in CNS Cleanroom Gowning Area
Trainer: Mac Hathaway
Training for the Savannah ALD-1 and ALD-4 systems - Used for Al2O3, HfO2, TiO2, SiO2, ZrO2, and ZnO, as well as Pt and mixed oxides.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:00 pm
51Register!
 
Training: Cleanroom orientation -- CNS - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and operations of CNS cleanroom
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
please be prompt
87Register!
 
Training: CVD-14 Oxford ICP-CVD - Low Temp - Cleanroom PVD Bay
Trainer: Philippe de Rouffignac
Training session for the Oxford ICP-CVD system.
System capable of SiO2 and SiNx growth from RT to 350C. Optimized recipes at 80C. a:Si growth at 200C (optimal), full range also available.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:00 pm
53Register!
 
Training: CVD-3 Training: STS PECVD Training Session - Dry processing bay in the cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This training will provide users with the tools necessary to grow high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. These films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 2:30 pm
prerequisite: Introduction to Thin Film Growth and Processing
52Register!
 
Training: FIB-4 FEI Helios - Basic Training - B15F
Trainer: Stephan Kraemer
Basic introduction to operation of a focused ion beam microscope. Discussion of available deposition, milling and imaging techniques on the Helios Nanolab 660.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 5:00 pm
Prior SEM training recommended
42Register!
 
Training: Form2 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
44Register!
 
Training: Helix Laser Cutter Training - G06
Trainer: Sandra Nakasone
Prereq 1: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.

Prereq 2: You must complete the EH&S online training called "Enclosed Laser Instrument Safety" and email the certificate of completion to Sandra Nakasone (snakasone@cns.fas.harvard.edu). You can access the online training here: https://www.ehs.harvard.edu/training
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
43Register!
 
Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom
Trainer: Mac Hathaway
Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:30 am
107Register!
 
Training: Keyhigh TE-1 thermal evaporator training - LISE G07 (CNS cleanroom), PVD bay
Trainer: Ed Macomber
TE-1 is a thermal evaporator that can facilitate a wide range of materials including many materials that cannot be deposited with TE-3, 4, and 5. TE-1 can accommodate up to (1) 4" diameter wafer on a water-cooled flange, and up to three different materials per pump-down. Deposition is directional; meaning sidewalls of features will not be coated. This makes TE-1 an excellent choice for devices that will undergo a lift-off process later in the fabrication stream. TE-1 is designed to operate in the E-7 torr range (~1.5 hour of pumping). At this training, we go right through a whole standard operating procedure, including venting, loading wafer and material, pump-down, and deposition. Plan on about 2 hours for this training, and we meet right at the system in LISE G07 (the CNS cleanroom), PVD bay.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 4:00 pm
(Please review document links in email confirmation)
41Register!
 
Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Dry Processing Bay in cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This is a general training for all of the LPCVD and APCVD furnaces. These Tystar furnaces can accommodate anything from a single 1cm substrate up to 50 6" wafers.
The various furnaces encompass the following processes:
- Anneals non metal containing samples from 250 to 1100C under O2, N2, and H2/He
- Anneals of metal containing samples from 250 to 1100C under N2 and H2/He
- Low stress and stoichiometric silicon nitride
- Amorphous and polycrystalline silicon (doped with P or B or undoped)
- SiO2 from TEOS (conformal, additive SiO2 process)
- SiO2 from oxidation of silicon using H2O or O2
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:30 am
prerequisite: Introduction to Thin Film Growth and Processing
43Register!
 
Training: Makerbot 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 3:00 pm
44Register!
 
Training: O2 plasma stripper : RIE-9 and RIE-5 - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
O2 plasma stripper : RIE-9 and RIE-5
3:30 to 4 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:30 pm - 4:00 pm
kenlinhuang@cns.fas.harvard.edu
4FULLRegistration Closed
 
Training: Raman and PL spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam HR Evolution with 532 nm and 633 nm excitation lines for Raman and PL spectroscopy or mapping
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
32Register!
 
Training: RTP3 training - meet inside in PVD bay
Trainer: John Tsakirgis
To understand safety and operations of RTP
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please bring a cleanroom notebook
21Register!
 
Training: SEM-10 Hitachi 8230 SEM User training - in the cleanroom, next to the SEM
Trainer: Christine Yi-Ju Wang
Pre-requisite: Previous SEM experience.
If not, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:30 am
21Register!
 
Training: Spinner training - In the cleanroom, next to the spinners
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 1:30 pm
4FULLRegistration Closed
 
Training: UV-VIS-NIR spectroscopy - LISE G04
Trainer: Arthur McClelland
learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm
TimeMax AttendeesAvailableCNS Users ONLY
12:30 pm - 2:00 pm
31Register!
 
Wednesday, November 13th, 2019
Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B
Trainer: Tim Cavanaugh
This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available Zeiss SEM Part 1: Online training prior to registration.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 4:00 pm
41Register!
 
Training: Contact Angle Measurement Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
11:30 am - 12:00 pm
44Register!
 
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
(check links in confirmation email for documents)
5FULLRegistration Closed
 
Training: DOE-1 - ULVAC Deep Oxide Etcher - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
DOE-1 - ULVAC Deep Oxide Etcher
3:30 pm to 4:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:30 pm - 4:30 pm
kenlinhuang@cns.fas.harvard.edu
43Register!
 
Training: Freeze Dryer/Lyophilizer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 1:30 pm
44Register!
 
Training: Introduction to Dry Etching - LISE 311
Trainer: Ling Xie
This class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:00 am
127Register!
 
Training: Introduction to Lithography - LISE room 319
Trainer: Christine Yi-Ju Wang
The class describes the basic working principles of lithography techniques. It also gives an overview of tools that are available in CNS. This is a prerequisite for all lithography process trainings.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:00 pm
109Register!
 
Training: JEOL 2100 Introductory TEM Training - LISE B15C
Trainer: Jules Gardener
In this training you will learn how to use the JEOL 2100 TEM. We will cover introductory topics including the standard TEM-mode operation and alignment of the microscope, start-up and shut-down procedure and high resolution imaging. You will be required to pass a certification test which will be scheduled after this training class before access can be granted for this instrument.

Important: Please complete the online TEM training module before attending this session.
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 3:30 pm
41Register!
 
Training: JEOL CP Training - B15A
Trainer: Austin Akey
This training covers operation of the JEOL CP ion-beam cross section polisher in B15A. Prerequisite: safety training for B15A (online)
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
33Register!
 
Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
It is strongly recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 12:30 pm
3FULLRegistration Closed
 
Training: Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
It is recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Full independent access to the AFM (SPM-5) requires at least one individual user assisted session that serves as a qualification for independent use and scheduled on another day. AFM probes are provided for training; however, users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 4:30 pm
33Register!
 
Training: Nikon Micro-CT system training - G27
Trainer: Hao-Yu (Greg) Lin
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:00 pm
43Register!
 
Training: Planetary Ball Mill Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 2:00 pm
44Register!
 
Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-13 - Oxford PlasmaPro 100 Cobra 300
2:30 - 3:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:30 pm
kenlinhuang@cns.fas.harvard.edu
4FULLRegistration Closed
 
Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:00 am
33Register!
 
Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
11:00 am - 11:30 am
33Register!
 
Training: Thermo Scientific Nexsa XPS/UPS/REELS/ISS training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Prerequisites: Thermo Scientific K-Alpha+ XPS system training
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 4:00 pm
hylin@fas.harvard.edu
44Register!
 
Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE
Trainer: Mac Hathaway
Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:30 pm
88Register!
 
Thursday, November 14th, 2019
Training: ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - G-07 Cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This tool utilizes both ALD and pulsed CVD techniques to grow conductive, conformal thin films.
Currently those include Ni, NiNx and WNx. These films are the most conductive ALD films available at the CNS.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:00 am
prerequisite: Introduction to Thin Film Growth and Processing
44Register!
 
Training: Atomic Force Microscopy AFM Part-2 Individual User Qualification (Asylum MFP3D or Cypher S/ES) - LISE B58
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d or Cypher AFMs with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tips, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE B58
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 5:00 pm
32Register!
 
Training: CVD4 Lindberg - meet in front of CVD4
Trainer: John Tsakirgis
To understand safety and operation of CVD4
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please bring a cleanroom notebook
32Register!
 
Training: Orientaion for Cleanroonm Access - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and tools
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
88Register!
 
Training: Synergy H1m Plate Reader - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
11:00 am - 12:00 pm
44Register!
 
Training: Zetasizer Nano ZS DLS Training - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
43Register!
 
Friday, November 15th, 2019
Training: JAWoollam Spectroscopic Ellipsometer training - LISE-G07, in the main cleanroom
Trainer: Jiangdong Deng
this training will cover the basic principle and operation procedure of JAWoollam Spectroscopic Ellipsometer system for thin film optical measurement.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:30 pm
42Register!
 
Monday, November 18th, 2019
Training: G05 Cell Culture and Cryo-Prep Room Orientation - Meet outside of G05
Trainer: Sandra Nakasone
This safety orientation is mandatory for access to our biomaterials, cryo-prep, and cell culture BL2 laboratory (LISE G05). In order to gain access users must attend this orientation, complete at least one training for equipment inside G05, and take the "Laboratory Biosafety" online training from the Harvard EH&S website (https://www.ehs.harvard.edu/training). Email Sandra Nakasone (snakasone@cns.fas.harvard.edu) the certificate of completion once you are done. LONG PANTS and CLOSED-TOE SHOES MANDATORY.
TimeMax AttendeesAvailableCNS Users ONLY
10:30 am - 11:00 am
LONG PANTS and CLOSED-TOE SHOES MANDATORY. Long hair must be tied up.
65Register!
 
Training: G06 Nanotechnology and Rapid Prototyping Room Orientation - Meet outside of G06
Trainer: Sandra Nakasone
This safety orientation is mandatory for access to our chemical nanotechnology and rapid prototyping room (LISE G06). In order to gain access users must complete this safety orientation and at least one training for equipment inside G06. LONG PANTS AND CLOSED-TOE SHOES ARE MANDATORY.
TimeMax AttendeesAvailableCNS Users ONLY
11:00 am - 11:30 am
LONG PANTS and CLOSED-TOE SHOES are MANDATORY. Long hair must be tied up.
63Register!
 
Training: RIE-12:Matrix Plasma Asher - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-12:Matrix Plasma Asher
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:00 pm - 3:30 pm
kenlinhuang@cns.fas.harvard.edu
3FULLRegistration Closed
 
Training: SP-3 AJA 3-gun sputtering system - In the cleanroom, next to the sputtering tools
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Thin Film deposition processes"
The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 2:30 pm
33Register!
 
Tuesday, November 19th, 2019
Training: RIE-8 - STS ICP RIE - LISE CNS Cleanroom at the tool
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training!

STS RIE - 8 is an Inductively Coupled Plasma etching system and characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Major features include:

1. ICP power up to 1,500 W
2. RF bias up to 300 W
3. Available gases: SF6, C4F8, CHF3, CF4, H2, Cl2, HBr, BCl3, Ar, O2, and N2
4. Substrate temperatures from 10 °C to 30 °C
5. Handling 6″ or smaller samples

Applications
Etching silicon-based materials, boron nitride, and other compatible 2-D materials

Available Processes
1. High aspect ratio Si pillars
2. Si nano-wires and nano-needles
3. Si micro holes
4. Si trenches
5. SiO2 and Si3N4 trenches
6. Graphene and boron nitride etch
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:00 pm
4FULLRegistration Closed
 
Training: Asylum Cypher S/ES and MFP3d BiO/SA Atomic Force Microscopy Training Part-1 (SPM-2 & 6) - LISE B58
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of the Asylum Research Cypher S/ES and MFP3D BiO AFMs available at CNS (SPM- 2 and 6). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. Please register for each event and meet in hallway outside LISE B58
TimeMax AttendeesAvailableCNS Users ONLY
2:30 pm - 4:00 pm
32Register!
 
Training: Cleanroom orientation -- CNS - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and operations of CNS cleanroom
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
please be prompt
88Register!
 
Training: Form2 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
44Register!
 
Training: Helix Laser Cutter Training - G06
Trainer: Sandra Nakasone
Prereq 1: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.

Prereq 2: You must complete the EH&S online training called "Enclosed Laser Instrument Safety" and email the certificate of completion to Sandra Nakasone (snakasone@cns.fas.harvard.edu). You can access the online training here: https://www.ehs.harvard.edu/training
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
43Register!
 
Training: Introduction to Metrology for Nanofabrication Lecture - LISE G07 Hallway
Trainer: Jason Tresback
This lecture is an informal discussion about the measurement tools and techniques available inside the nanofabrication cleanroom G07. The introduction serves as a pre-requisite for metrology for nanofabrication part 1 & 2 training events, however, metrology part-1 is not required to attend part-2. Please email jtresback@cns.fas.harvard.edu if you have any questions
TimeMax AttendeesAvailableCNS Users ONLY
4:30 pm - 6:00 pm
5FULLRegistration Closed
 
Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom
Trainer: Mac Hathaway
Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:30 am
1010Register!
 
Training: Makerbot 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 3:00 pm
43Register!
 
Training: Raman and PL spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam HR Evolution with 532 nm and 633 nm excitation lines for Raman and PL spectroscopy or mapping
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
33Register!
 
Training: RIE-7 - Unaxis Shuttleline ICP RIE - in front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-7 - Unaxis Shuttleline ICP RIE
3:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:30 pm - 4:30 pm
kenlinhuang@cns.fas.harvard.edu
44Register!
 
Training: RTP3 training - meet inside in PVD bay
Trainer: John Tsakirgis
To understand safety and operations of RTP
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please bring a cleanroom notebook
22Register!
 
Training: SEM-10 Hitachi 8230 SEM User training - in the cleanroom, next to the SEM
Trainer: Christine Yi-Ju Wang
Pre-requisite: Previous SEM experience.
If not, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:30 am
21Register!
 
Training: Spinner training - In the cleanroom, next to the spinners
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 1:30 pm
42Register!
 
Training: UV-VIS-NIR spectroscopy - LISE G04
Trainer: Arthur McClelland
learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm
TimeMax AttendeesAvailableCNS Users ONLY
12:30 pm - 2:00 pm
32Register!
 
Wednesday, November 20th, 2019
Training: Contact Angle Measurement Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
11:30 am - 12:00 pm
44Register!
 
Training: Freeze Dryer/Lyophilizer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 1:30 pm
44Register!
 
Training: FTIR Spectroscopy and Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Nicolet iS50 FTIR spectrometer and the Bruker Lumos FTIR microscope
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
33Register!
 
Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
It is strongly recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 12:30 pm
31Register!
 
Training: Nikon Micro-CT system training - LISE G27
Trainer: Hao-Yu (Greg) Lin
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:00 pm
hylin@fas.harvard.edu
43Register!
 
Training: Planetary Ball Mill Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 2:00 pm
44Register!
 
Training: RCA WET PROCESS TRAINING - Meet in Wet Bay
Trainer: John Tsakirgis
To understand safety and protocols of RCA training
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please be prompt
54Register!
 
Training: Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (last bay inside of LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). All materials are user supplied for EE-3 (pellets and crucible liners). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. This is a manually operated deposition system and will likely take most users a few times using it to become comfortable with the machine. We meet in the cleanroom PVD bay (last bay inside LISE G07).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
(Please review document links in email confirmation)
4FULLRegistration Closed
 
Training: Steady state PL (fluorescence) spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Cary Eclipse steady state PL (fluorescence) spectrometer
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 1:30 pm
22Register!
 
Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:00 am
33Register!
 
Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
11:00 am - 11:30 am
32Register!
 
Training: Transparency photomask printer training - LISE G27
Trainer: Hao-Yu (Greg) Lin
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 3:00 pm
hylin@fas.harvard.edu
43Register!
 
Thursday, November 21st, 2019
Training: Atomic Force Microscopy AFM Part-2 Individual User Qualification (Asylum MFP3D or Cypher S/ES) - LISE B58
Trainer: Jason Tresback
This training event is designed to allow individual users to operate the Asylum MFP3d or Cypher AFMs with staff assistance in order to qualify for independent tool use. Users are encouraged to bring their own sample and/or probe tips, otherwise they will be provided for training purposes. Full tool access requires attending part-1 basic imaging and operation demonstrated by staff, followed by at least one user assisted session on another day that serves as an individual user qualification. We meet in hallway outside LISE B58
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 5:00 pm
32Register!
 
Training: CVD4 Lindberg - meet in front of CVD4
Trainer: John Tsakirgis
To understand safety and operation of CVD4
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please bring a cleanroom notebook
33Register!
 
Training: Discussion for nanofabrication related questions. - LISE G52
Trainer: Ling Xie
Discussion for nanofabrication related questions.
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
11Register!
 
Training: Orientaion for Cleanroonm Access - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and tools
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
88Register!
 
Training: Raman, PL, and hyperspectral spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba XploRa with 405 nm and 785 nm excitation lines for Raman and PL spectroscopy or mapping. The system also has a Cytoviva hyperspectral imaging system attached for reflection or transmission in bright field or dark field from 420-1000 nm.
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
21Register!
 
Training: Sharon TE-3, 4, and 5 thermal evaporator training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Malcolm Tse
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 4:00 pm
4FULLRegistration Closed
 
Training: Zetasizer Nano ZS DLS Training - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
42Register!
 
Friday, November 22nd, 2019
Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B
Trainer: Tim Cavanaugh
This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available Zeiss SEM Part 1: Online training prior to registration.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 1:00 pm
43Register!
 
Monday, November 25th, 2019
Training: FIB-4 FEI Helios - Basic Training - B15F
Trainer: Stephan Kraemer
Basic introduction to operation of a focused ion beam microscope. Discussion of available deposition, milling and imaging techniques on the Helios Nanolab 660.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 5:00 pm
Prior SEM training recommended
44Register!
 
Training: O2 plasma stripper : RIE-9 and RIE-5 - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
O2 plasma stripper : RIE-9 and RIE-5
3:30 to 4 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:30 pm - 4:00 pm
kenlinhuang@cns.fas.harvard.edu
42Register!
 
Training: Soft Materials Cleanroom (SMCR) Orientation - Meet outside the cleanroom in the ground floor couches
Trainer: Sandra Nakasone
This orientation is required for access to the Soft Materials Cleanroom (SMCR). The SMCR is a cleanroom devoted to Soft Lithography with a focus on rapid prototyping of microfluidic devices using PDMS elastomer.

LONG PANTS & CLOSED-TOE SHOES ARE MANDATORY. Long hair must be tied up. Quiz to follow.
TimeMax AttendeesAvailableCNS Users ONLY
10:30 am - 12:00 pm
Long pants and closed-toe shoes are MANDATORY. Long hair must be tied up. Quiz to follow.
65Register!
 
Training: SP-3 AJA 3-gun sputtering system - In the cleanroom, next to the sputtering tools
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Thin Film deposition processes"
The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 2:30 pm
33Register!
 
Tuesday, November 26th, 2019
Training: ALD-1 and ALD-4 Training - ALD Oxide Deposition - Starts in CNS Cleanroom Gowning Area
Trainer: Mac Hathaway
Training for the Savannah ALD-1 and ALD-4 systems - Used for Al2O3, HfO2, TiO2, SiO2, ZrO2, and ZnO, as well as Pt and mixed oxides.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:00 pm
55Register!
 
Training: Asylum Cypher S/ES and MFP3d BiO/SA Atomic Force Microscopy Training Part-1 (SPM-2 & 6) - LISE B58
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of the Asylum Research Cypher S/ES and MFP3D BiO AFMs available at CNS (SPM- 2 and 6). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. Please register for each event and meet in hallway outside LISE B58
TimeMax AttendeesAvailableCNS Users ONLY
2:30 pm - 4:00 pm
33Register!
 
Training: Cleanroom orientation -- CNS - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and operations of CNS cleanroom
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
please be prompt
88Register!
 
Training: CVD-14 Oxford ICP-CVD - Low Temp - Cleanroom PVD Bay
Trainer: Philippe de Rouffignac
Training session for the Oxford ICP-CVD system.
System capable of SiO2 and SiNx growth from RT to 350C. Optimized recipes at 80C. a:Si growth at 200C (optimal), full range also available.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:00 pm
55Register!
 
Training: CVD-3 Training: STS PECVD Training Session - Dry processing bay in the cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This training will provide users with the tools necessary to grow high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. These films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 2:30 pm
prerequisite: Introduction to Thin Film Growth and Processing
55Register!
 
Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom
Trainer: Mac Hathaway
Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:30 am
1010Register!
 
Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Dry Processing Bay in cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This is a general training for all of the LPCVD and APCVD furnaces. These Tystar furnaces can accommodate anything from a single 1cm substrate up to 50 6" wafers.
The various furnaces encompass the following processes:
- Anneals non metal containing samples from 250 to 1100C under O2, N2, and H2/He
- Anneals of metal containing samples from 250 to 1100C under N2 and H2/He
- Low stress and stoichiometric silicon nitride
- Amorphous and polycrystalline silicon (doped with P or B or undoped)
- SiO2 from TEOS (conformal, additive SiO2 process)
- SiO2 from oxidation of silicon using H2O or O2
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:30 am
prerequisite: Introduction to Thin Film Growth and Processing
44Register!
 
Training: Raman and PL spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam HR Evolution with 532 nm and 633 nm excitation lines for Raman and PL spectroscopy or mapping
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
33Register!
 
Training: RIE 10 DRIE Training - Meet in LISE 311 for the first hour then CNS cleanroom
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training!

SPTS RIE-10, a state-of-the-art deep silicon etching system, is furnished with dual plasma sources and dual gas inlets. The tool is characterized with high etch rate 6-10 µm/min; high aspect ratio 50:1; good selectivity > 50:1 to resist and >100:1 to silicon oxide; and a good uniformity < 5% cross 6” wafers. Its fixed RF matching technology reduces the step-process time to 1 second, which leads to a controllable side wall roughness < 6nm for nanoscale features. Major features include:

• Primary rf power up to 3,000W
• Secondary rf power up to 3,000W
• Substrate power up to 300W
• Chuck temperatures from -15°C to +40°C
• Handling 6″ or smaller samples
• Claritas End Point Detector

Applications
• Si etch only
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad feature sizes: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handling 6″ or smaller samples
• Absolutely no-metal mask or metal stop layers

Available Processes
• Micro Pillars
• Nano Pillars
• Micro Trenches
• Nano Trenches
• Via etch
• Through wafer via etch
• Wafer thinning
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 4:00 pm
43Register!
 
Training: RTP3 training - meet inside in PVD bay
Trainer: John Tsakirgis
To understand safety and operations of RTP
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please bring a cleanroom notebook
22Register!
 
Training: SEM-10 Hitachi 8230 SEM User training - in the cleanroom, next to the SEM
Trainer: Christine Yi-Ju Wang
Pre-requisite: Previous SEM experience.
If not, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:30 am
22Register!
 
Training: Spinner training - In the cleanroom, next to the spinners
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 1:30 pm
44Register!
 
Training: UV-VIS-NIR spectroscopy - LISE G04
Trainer: Arthur McClelland
learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm
TimeMax AttendeesAvailableCNS Users ONLY
12:30 pm - 2:00 pm
33Register!
 
Wednesday, November 27th, 2019
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
(check links in confirmation email for documents)
55Register!
 
Training: DOE-1 - ULVAC Deep Oxide Etcher - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
DOE-1 - ULVAC Deep Oxide Etcher
3:30 pm to 4:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:30 pm - 4:30 pm
kenlinhuang@cns.fas.harvard.edu
44Register!
 
Training: Introduction to Dry Etching - LISE 311
Trainer: Ling Xie
This class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:00 am
1212Register!
 
Training: Introduction to Lithography - LISE room 319
Trainer: Christine Yi-Ju Wang
The class describes the basic working principles of lithography techniques. It also gives an overview of tools that are available in CNS. This is a prerequisite for all lithography process trainings.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:00 pm
1010Register!
 
Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
It is strongly recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 12:30 pm
33Register!
 
Training: Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
It is recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Full independent access to the AFM (SPM-5) requires at least one individual user assisted session that serves as a qualification for independent use and scheduled on another day. AFM probes are provided for training; however, users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 4:30 pm
31Register!
 
Training: RIE-11 Diamond RIE Training - LISE G07 CNS Cleanroom
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training!

PT RIE-11 is Plasma-Therm’s Versaline Inductive Coupled Plasma (ICP) etching system, a product resulting from decades of technology evolution. Its 2 MHz ICP RF for efficient coupling of power to plasma makes etching results stable and repeatable. Well designed thermal management components control chamber temperatures at desired values from beginning to the end during processes. Major features include:

• ICP RF up to 1,200 W
• RF bias up to 600 W
• Substrate temperatures from 10 °C to 180 °C
• Lid, ceramic spool, and metal liner temperatures from 20 °C to 180 °C

Applications
Diamond etch only

Available Processes
• Thorough O2 plasma chamber cleaning processes for NV center applications
• Nano-feature etch
• Diamond thinning
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:00 pm
43Register!
 
Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-13 - Oxford PlasmaPro 100 Cobra 300
2:30 - 3:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:30 pm
kenlinhuang@cns.fas.harvard.edu
43Register!
 
Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:00 am
32Register!
 
Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
11:00 am - 11:30 am
32Register!
 
Training: Thermo Scientific K-Alpha+ XPS system training - LISE G27
Trainer: Hao-Yu (Greg) Lin
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:00 pm
44Register!
 
Training: Thermo Scientific Nexsa XPS/UPS/REELS/ISS training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Prerequisites: Thermo Scientific K-Alpha+ XPS system training
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 4:00 pm
hylin@fas.harvard.edu
44Register!
 
Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE
Trainer: Mac Hathaway
Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:30 pm
88Register!
 
Thursday, November 28th, 2019
Training: CVD4 Lindberg - meet in front of CVD4
Trainer: John Tsakirgis
To understand safety and operation of CVD4
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:30 am - 10:30 am
please bring a cleanroom notebook
33Register!
 
Training: Discussion for nanofabrication related questions. - LISE G52
Trainer: Ling Xie
Discussion for nanofabrication related questions.
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
11Register!
 
Training: Orientaion for Cleanroonm Access - meet in front of G07
Trainer: John Tsakirgis
To understand safety, protocols and tools
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
88Register!
 
Training: XEF2-1 Training - LISE G07 CNS Cleanroom
Trainer: Ling Xie
XeF2 etch is mainly for isotopically etching silicon. It is widely used for releasing MEMS structures, such as switches, cantilevers, bridges, mirrors, membranes, channels, and thermal isolation cavities. Its merits include highly selective etch, no stiction problems as existed with wet etch, and long under cuts. XeF2 also etches Ge, Mo and SiGe and transitional metals W, Ti, Ta, TiN and TaN under certain conditions such as high temperatures, but wont etch Al, Ni, Cr, Pt, Ga, MgO, ZnO, AlN, GaAs, resist, and PDMS.

The Xactix e2TM System installed in CNS Cleanroom is manufactured by SPTS, an Orbotech Company, its main features include:
Table Top System
PC based control software manages recipes, logs data and manages multiple users with password protection
Open load system to handle multiple types of substrates (wafers, chips, dicing frames, packages) without special handling substrates
Expansion chamber-based design for precise, repeatable pulse pressures, and ease of mixing XeF2 with other gasses.
Transparent process chamber lid and shower head over full wafer allows visual inspection of the entire wafer.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
44Register!
 
Friday, November 29th, 2019
Training: JAWoollam Spectroscopic Ellipsometer training - LISE-G07, in the main cleanroom
Trainer: Jiangdong Deng
this training will cover the basic principle and operation procedure of JAWoollam Spectroscopic Ellipsometer system for thin film optical measurement.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:30 pm
44Register!
 

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