All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page


(Important information - please read)
 
  • Open Events
  • CNS Users Only
  • LISE Cleanroom Users Only
  • Month
Date TBD - you can pre-register for this training session.
CNS staff will notify you when a date has been set.
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
 
Training: B15A online safety training - Harvard Training Portal
Trainer: Jules Gardener
CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013222 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time.

Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.
 
Training: Cryo-TEM sample preparation - GO5
Trainer: Svetla Stoilova-McPhie
CNS users will be trained to use the Vitorbot Mark IV to freeze their samples.
CNS users need to do the training for GO5 (2h) with Sandra Nacasone (snakasone@cns.fas.harvard.edu)
 
Training: Intermediate Arctica Cryo-EM course Day 1 - B58 Arctica control room
Trainer: Svetla Stoilova-McPhie
The Intermediate Arctica Cryo-EM course has to be taken the week after the Basic Cryo-EM course.
It will consist of working with a standard Cryo-EM sample (vesicle) and your own sample, frozen the day before. One of the participant of the Basic Cryo-EM course will take Day 1 and the other Day 2. You will need to have passed both the Basic and Intermediate Cryo-EM course certification to be a able to schedule the microscope.
 
Training: Intermediate Arctica Cryo-EM course Day 2 - B58 Arctica control room
Trainer: Svetla Stoilova-McPhie
The Intermediate Arctica Cryo-EM course has to be taken the week after the Basic Cryo-EM course.
It will consist of working with a standard Cryo-EM sample (vesicle) and your own sample, frozen the day before. One of the participant of the Basic Cryo-EM course will take Day 1 and the other Day 2. You will need to have passed both the Basic and Intermediate Cryo-EM course certification to be a able to schedule the microscope.
 
Training: Sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.

Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013226 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.
 
Training: TEM Training Part 1: Online training - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100 and FEI F20 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or FEI F20 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142

Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
 
Monday, May 27th, 2019
Training: RCA CLEAN - inside Wentbench Bay
Trainer: John Tsakirgis
To understand the Safety, Operation and Chemicals used here at CNS
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:00 am
Please be prompt and bring cleanroom notebook and pen
44Register!
 
Tuesday, May 28th, 2019
Training: ALD-1 and ALD-4 Training - ALD Oxide Deposition - Starts in CNS Cleanroom Gowning Area
Trainer: Mac Hathaway
Training for the Savannah ALD-1 and ALD-4 systems - Used for Al2O3, HfO2, TiO2, SiO2, ZrO2, and ZnO, as well as Pt and mixed oxides.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:00 pm
52Register!
 
Training: CNS Cleanroom Orientation - Meet in front of G07
Trainer: John Tsakirgis
To understand the registration process and the protocols in place for clean room access
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
Please be prompt and bring cleanroom notebook
53Register!
 
Training: CVD-14 Oxford ICP-CVD - Low Temp - Cleanroom PVD Bay
Trainer: Philippe de Rouffignac
Training session for the Oxford ICP-CVD system.
System capable of SiO2 and SiNx growth from RT to 350C. Optimized recipes at 80C. a:Si growth at 200C (optimal), full range also available.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:00 pm
5FULLRegistration Closed
 
Training: CVD-3 Training: STS PECVD Training Session - Dry processing bay in the cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This training will provide users with the tools necessary to grow high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. These films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 2:30 pm
prerequisite: Introduction to Thin Film Growth and Processing
55Register!
 
Training: FIB-4 FEI Helios - Basic Training - B15F
Trainer: Stephan Kraemer
Basic introduction to operation of a focused ion beam microscope. Discussion of available deposition, milling and imaging techniques on the Helios Nanolab 660.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 5:00 pm
Prior SEM training recommended
43Register!
 
Training: Form2 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
44Register!
 
Training: Helix Laser Cutter Training - G06
Trainer: Sandra Nakasone
Prereq 1: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.

Prereq 2: You must complete the EH&S online training called "Enclosed Laser Instrument Safety" and email the certificate of completion to Sandra Nakasone (snakasone@cns.fas.harvard.edu). You can access the online training here: https://www.ehs.harvard.edu/training
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
44Register!
 
Training: Introduction to Scanning Probe Microscopy - LISE 311
Trainer: Antonio Ambrosio
This is an introduction to Scanning Probe Microscopy (SPM) aimed at providing general concept of AFM microscopy. It is also used as orientation for the potential users to the
TimeMax AttendeesAvailableCNS Users ONLY
4:00 pm - 6:00 pm
101Register!
 
Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom
Trainer: Mac Hathaway
Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:30 am
107Register!
 
Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Dry Processing Bay in cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This is a general training for all of the LPCVD and APCVD furnaces. These Tystar furnaces can accommodate anything from a single 1cm substrate up to 50 6" wafers.
The various furnaces encompass the following processes:
- Anneals non metal containing samples from 250 to 1100C under O2, N2, and H2/He
- Anneals of metal containing samples from 250 to 1100C under N2 and H2/He
- Low stress and stoichiometric silicon nitride
- Amorphous and polycrystalline silicon (doped with P or B or undoped)
- SiO2 from TEOS (conformal, additive SiO2 process)
- SiO2 from oxidation of silicon using H2O or O2
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:30 am
prerequisite: Introduction to Thin Film Growth and Processing
43Register!
 
Training: Makerbot 3D Printer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 3:00 pm
44Register!
 
Training: Raman and PL spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam HR Evolution with 532 nm and 633 nm excitation lines for Raman and PL spectroscopy or mapping
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
33Register!
 
Training: RIE 10 DRIE Training - Meet in LISE 311 for the first hour then CNS cleanroom
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training!

SPTS RIE-10, a state-of-the-art deep silicon etching system, is furnished with dual plasma sources and dual gas inlets. The tool is characterized with high etch rate 6-10 µm/min; high aspect ratio 50:1; good selectivity > 50:1 to resist and >100:1 to silicon oxide; and a good uniformity < 5% cross 6” wafers. Its fixed RF matching technology reduces the step-process time to 1 second, which leads to a controllable side wall roughness < 6nm for nanoscale features. Major features include:

• Primary rf power up to 3,000W
• Secondary rf power up to 3,000W
• Substrate power up to 300W
• Chuck temperatures from -15°C to +40°C
• Handling 6″ or smaller samples
• Claritas End Point Detector

Applications
• Si etch only
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad feature sizes: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handling 6″ or smaller samples
• Absolutely no-metal mask or metal stop layers

Available Processes
• Micro Pillars
• Nano Pillars
• Micro Trenches
• Nano Trenches
• Via etch
• Through wafer via etch
• Wafer thinning
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 4:00 pm
42Register!
 
Training: SEM-10 Hitachi 8230 SEM User training - In the cleanroom, next to the SEM
Trainer: Christine Yi-Ju Wang
Pre-requisite: Previous SEM experience.
If not, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:30 am
2FULLRegistration Closed
 
Training: Soft Materials Cleanroom Training (SMCR) - We'll meet in the ground floor couches
Trainer: Sandra Nakasone
This orientation is required for access to the Soft Materials Cleanroom (SMCR). The SMCR is a cleanroom devoted to Soft Lithography with a focus on rapid prototyping of microfluidic devices using PDMS elastomer.

LONG PANTS & CLOSED-TOE SHOES ARE MANDATORY. Long hair must be tied up. Quiz to follow.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:30 am
6FULLRegistration Closed
 
Training: UV-VIS-NIR spectroscopy - LISE G04
Trainer: Arthur McClelland
learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 3:30 pm
3FULLRegistration Closed
 
Wednesday, May 29th, 2019
Training: Contact Angle Measurement Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
11:30 am - 12:00 pm
44Register!
 
Training: Cypher AFM General Training (attending the class - G12
Trainer: Antonio Ambrosio
This is the training event where the Cypher AFM is presented. The two hours class "Introduction to Scanning Probe Microscopy" is mandatory before attending this training event.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 3:00 pm
4FULLRegistration Closed
 
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
(check links in confirmation email for documents)
53Register!
 
Training: DOE-1 - ULVAC Deep Oxide Etcher - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
DOE-1 - ULVAC Deep Oxide Etcher
3:30 pm to 4:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:30 pm - 4:30 pm
kenlinhuang@cns.fas.harvard.edu
42Register!
 
Training: Freeze Dryer/Lyophilizer Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 1:30 pm
43Register!
 
Training: FTIR Spectroscopy and Microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Nicolet iS50 FTIR spectrometer and the Bruker Lumos FTIR microscope
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
32Register!
 
Training: Introduction to Dry Etching - LISE 311
Trainer: Ling Xie
This class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:00 am
61Register!
 
Training: Introduction to Lithography - LISE room 319
Trainer: Christine Yi-Ju Wang
The class describes the basic working principles of lithography techniques. It also gives an overview of tools that are available in CNS. This is a prerequisite for all lithography process trainings.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
109Register!
 
Training: Planetary Ball Mill Training - G06
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 2:00 pm
44Register!
 
Training: RAPID THERMAL PROCESSING RTP-2 - MEET INSIDE CLEANROOM, PVD BAY
Trainer: John Tsakirgis
TO UNDERSTAND THE SAFETY AND OPERATIONAL PROTOCOLS NEEDED FOR CNS
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:00 am
PLEASE BE PROMPT
31Register!
 
Training: RIE-11 Diamond RIE Training - LISE G07 CNS Cleanroom
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training!

PT RIE-11 is Plasma-Therm’s Versaline Inductive Coupled Plasma (ICP) etching system, a product resulting from decades of technology evolution. Its 2 MHz ICP RF for efficient coupling of power to plasma makes etching results stable and repeatable. Well designed thermal management components control chamber temperatures at desired values from beginning to the end during processes. Major features include:

• ICP RF up to 1,200 W
• RF bias up to 600 W
• Substrate temperatures from 10 °C to 180 °C
• Lid, ceramic spool, and metal liner temperatures from 20 °C to 180 °C

Applications
Diamond etch only

Available Processes
• Thorough O2 plasma chamber cleaning processes for NV center applications
• Nano-feature etch
• Diamond thinning
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:00 pm
43Register!
 
Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool inside cleanroom.
Trainer: Kenlin Huang
RIE-13 - Oxford PlasmaPro 100 Cobra 300
2:30 - 3:30 pm
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:30 pm
kenlinhuang@cns.fas.harvard.edu
4FULLRegistration Closed
 
Training: Spinner training - In the cleanroom, next to the spinners
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:00 pm
4FULLRegistration Closed
 
Training: Steady state PL (fluorescence) spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Cary Eclipse steady state PL (fluorescence) spectrometer
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 2:30 pm
22Register!
 
Training: Thermo Scientific K-Alpha+ XPS system training - LISE G27
Trainer: Hao-Yu (Greg) Lin
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:00 pm
42Register!
 
Training: Thermo Scientific Nexsa XPS/UPS/REELS/ISS training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Prerequisites: Thermo Scientific K-Alpha+ XPS system training
TimeMax AttendeesAvailableCNS Users ONLY
2:00 pm - 4:00 pm
hylin@fas.harvard.edu
41Register!
 
Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE
Trainer: Mac Hathaway
Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:30 pm
81Register!
 
Thursday, May 30th, 2019
Training: ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - G-07 Cleanroom
Trainer: Philippe de Rouffignac
Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This tool utilizes both ALD and pulsed CVD techniques to grow conductive, conformal thin films.
Currently those include Ni, NiNx and WNx. These films are the most conductive ALD films available at the CNS.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:00 am
prerequisite: Introduction to Thin Film Growth and Processing
44Register!
 
Training: CNS Cleanroom Orientation - Meet in front of G07
Trainer: John Tsakirgis
To understand our protocols and complete your registration
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:30 pm
PLease be prompt
52Register!
 
Training: Cypher AFM certification (attending the class - G12
Trainer: Antonio Ambrosio
This is a certification event for the Asylum Cypher AFM. Attending Part -1 "Asylum Cypher AFM - General Training" is mandatory for this training event.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 3:00 pm
2FULLRegistration Closed
 
Training: Discussion for nanofabrication related questions. - LISE G52
Trainer: Ling Xie
Discussion for nanofabrication related questions.
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
11Register!
 
Training: LIndberg Anneal furnace - meet in corridor in front of G27
Trainer: John Tsakirgis
To be comfortable with Safety and operation of the Lindbergh Furnace
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:00 am
PLEASE BE PROMPT
32Register!
 
Training: Raman, PL, and hyperspectral spectroscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba XploRa with 405 nm and 785 nm excitation lines for Raman and PL spectroscopy or mapping. The system also has a Cytoviva hyperspectral imaging system attached for reflection or transmission in bright field or dark field from 420-1000 nm.
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 3:30 pm
22Register!
 
Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 2:00 pm
32Register!
 
Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Lithography"
The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:30 pm - 3:00 pm
32Register!
 
Training: Synergy H1m Plate Reader - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
11:00 am - 12:00 pm
44Register!
 
Training: Zetasizer Nano ZS DLS Training - G05
Trainer: Sandra Nakasone
Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
44Register!
 
Friday, May 31st, 2019
Training: JAWoollam Spectroscopic Ellipsometer training - LISE-G07, in the main cleanroom
Trainer: Jiangdong Deng
this training will cover the basic principle and operation procedure of JAWoollam Spectroscopic Ellipsometer system for thin film optical measurement.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:30 pm - 3:30 pm
43Register!
 

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