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| Training: Zeiss SEM Part 1: Online training - Harvard Training Portal | | Trainer: Tim Cavanaugh | The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
| | | | Training: B15A online safety training - Harvard Training Portal | | Trainer: Jules Gardener | CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013222 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time.
Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one. | | | | Training: Basic Arctica Cryo-EM course, Day 1 - B58 control room | | Trainer: Svetla Stoilova-McPhie | | CNS users will be demonstrated the Basic operation of our Tecnai Arctica Cryo-TEM workflow and have their own area set up to practice. | | | | Training: Cryo-TEM sample preparation - GO5 | | Trainer: Svetla Stoilova-McPhie | CNS users will be trained to use the Vitorbot Mark IV to freeze their samples.
CNS users need to do the training for GO5 (2h) with Sandra Nacasone, (snakasone@cns.fas.harvard.edu) to use the equipment. | | | | Training: Intermediate Arctica Cryo-EM course Day 1 - B58 Control room | | Trainer: Svetla Stoilova-McPhie | The Intermediate Arctica Cryo-EM course has to be taken the week after the Basic Cryo-EM course.
It will consist of working with a standard Cryo-EM sample (vesicle and Apoferritin). | | | | Training: Intermediate Arctica Cryo-EM course Day 1 - B58 Control room | | Trainer: Svetla Stoilova-McPhie | The Intermediate Arctica Cryo-EM course has to be taken the week after the Basic Cryo-EM course.
It will consist of working with a standard Cryo-EM sample (vesicle and Apoferritin). | | | | Training: Sputter coater training (online) - Harvard Training Portal | | Trainer: Jules Gardener | This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.
Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013226 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one. | | | | Training: TEM Training Part 1: Online training - Harvard Training Portal | | Trainer: Jules Gardener | This is a new online training which is required as the first step of TEM training for the JEOL 2100 and FEI F20 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or FEI F20 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
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| Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B | | Trainer: Tim Cavanaugh | | This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available “Zeiss SEM Part 1: Online training” prior to registration. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 4:00 pm
| 4 | FULL | Registration Closed | | | | Training: Basic Arctica Cryo-EM course, Day 1 - B58 control room | | Trainer: Svetla Stoilova-McPhie | | CNS users will be demonstrated the Basic operations of our Tecnai Arctica Cryo-TEM workflow and have their own area set up to practice. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 5:00 pm
| 1 | FULL | Registration Closed | | | | Training: CVD-14 Oxford ICP-CVD - Low Temp - Cleanroom PVD Bay | | Trainer: Philippe de Rouffignac | Training session for the Oxford ICP-CVD system.
System capable of SiO2 and SiNx growth from RT to 350C. Optimized recipes at 80C. a:Si growth at 200C (optimal), full range also available. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 3:00 pm
| 5 | 2 | Register! | | | | Training: Helix Laser Cutter Training - G06 | | Trainer: Sandra Nakasone | Prereq 1: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located.
Prereq 2: You must complete the EH&S online training called "Enclosed Laser Instrument Safety" and email the certificate of completion to Sandra Nakasone (snakasone@cns.fas.harvard.edu). You can access the online training here: https://www.ehs.harvard.edu/training | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 4 | 4 | Register! | | | | Training: Hitachi TEM training 80-120kV - | | Trainer: Adam Graham | | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 2:00 pm
| 2 | FULL | Registration Closed | | | | Training: Intro to Metrology - LISE G07 Hallway | | Trainer: Jason Tresback | | This lecture is an informal discussion about the measurement tools and techniques available inside the nanofabrication cleanroom G07. The introduction serves as a pre-requisite for metrology for nanofabrication part 1 & 2 training events, however, metrology part-1 is not required to attend part-2. Please email jtresback@cns.fas.harvard.edu if you have any questions | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 4:30 pm
| 6 | 1 | Register! | | | | Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Dry Processing Bay in cleanroom | | Trainer: Philippe de Rouffignac | Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This is a general training for all of the LPCVD and APCVD furnaces. These Tystar furnaces can accommodate anything from a single 1cm substrate up to 50 6" wafers.
The various furnaces encompass the following processes:
- Anneals non metal containing samples from 250 to 1100C under O2, N2, and H2/He
- Anneals of metal containing samples from 250 to 1100C under N2 and H2/He
- Low stress and stoichiometric silicon nitride
- Amorphous and polycrystalline silicon (doped with P or B or undoped)
- SiO2 from TEOS (conformal, additive SiO2 process)
- SiO2 from oxidation of silicon using H2O or O2 | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:00 am - 11:30 am
prerequisite: Introduction to Thin Film Growth and Processing | 4 | 3 | Register! | | | | Training: Makerbot 3D Printer Training - G06 | | Trainer: Sandra Nakasone | | Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:00 pm
| 4 | 4 | Register! | | | | Training: MLA150 Maskless Aligner - Metrology bay in the cleanroom | | Trainer: Guixiong Zhong | | Training on the Heidelberg MLA150 Maskless Aligner. This tool can be used to expose positive and negative photoresist without the need for a photomask. The tool has 1 micron or better feature resolution, 0.5 micron alignment accuracy. The prerequisites for this training are the wet bench training, and Spinner/developing training. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 4 | 3 | Register! | | | | Training: Orientaion for Cleanroonm Access - meet in front of G07 | | Trainer: John Tsakirgis | | To understand protocols, safety, gowning and tools | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:30 pm
| 8 | 3 | Register! | | | | Training: RIE 10 DRIE Training - Meet in LISE 311 for the first hour then CNS cleanroom | | Trainer: Ling Xie | You have to finish NF-Training "Dry Etching Intro" first and then take this training!
SPTS RIE-10, a state-of-the-art deep silicon etching system, is furnished with dual plasma sources and dual gas inlets. The tool is characterized with high etch rate 6-10 µm/min; high aspect ratio 50:1; good selectivity > 50:1 to resist and >100:1 to silicon oxide; and a good uniformity < 5% cross 6†wafers. Its fixed RF matching technology reduces the step-process time to 1 second, which leads to a controllable side wall roughness < 6nm for nanoscale features. Major features include:
• Primary rf power up to 3,000W
• Secondary rf power up to 3,000W
• Substrate power up to 300W
• Chuck temperatures from -15°C to +40°C
• Handling 6″ or smaller samples
• Claritas End Point Detector
Applications
• Si etch only
• High aspect ratio etch: 5 – 50
• Deep etch: 5µm – through Si wafer etch
• Broad feature sizes: from nano- to mm- scales in lateral dimension
• Side wall roughness (scallop depth): 6nm – 700nm
• Only resists and SiO2 or Si3N4 allowed as etching mask
• Handling 6″ or smaller samples
• Absolutely no-metal mask or metal stop layers
Available Processes
• Micro Pillars
• Nano Pillars
• Micro Trenches
• Nano Trenches
• Via etch
• Through wafer via etch
• Wafer thinning | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 4:00 pm
| 4 | 2 | Register! | | | | Training: SEM-10 Hitachi 8230 SEM User training - in the cleanroom, next to the SEM | | Trainer: Christine Yi-Ju Wang | Pre-requisite: Previous SEM experience.
If not, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 11:30 am
| 2 | FULL | Registration Closed | | | | Training: Spinner training - In the cleanroom, next to the spinners | | Trainer: Christine Yi-Ju Wang | | The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 1:30 pm
| 4 | FULL | Registration Closed | | | | Training: UV-VIS-NIR spectroscopy - LISE G04 | | Trainer: Arthur McClelland | | learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:30 pm
| 3 | 1 | Register! | | |
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| Training: Contact Angle Measurement Training - G06 | | Trainer: Sandra Nakasone | | Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. | | Time | Max Attendees | Available | CNS Users ONLY |
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11:30 am - 12:00 pm
| 4 | 4 | Register! | | | | Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay | | Trainer: Ed Macomber | | Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
(check links in confirmation email for documents) | 5 | FULL | Registration Closed | | | | Training: EVG 501 Wafer bonder - In the cleanroom, next to the tool | | Trainer: Christine Yi-Ju Wang | | Training for EVG501 wafer bonder | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 3:30 pm
| 2 | FULL | Registration Closed | | | | Training: Freeze Dryer/Lyophilizer Training - G06 | | Trainer: Sandra Nakasone | | Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 1:30 pm
| 4 | 4 | Register! | | | | Training: FTIR Spectroscopy and Microscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Nicolet iS50 FTIR spectrometer and the Bruker Lumos FTIR microscope | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 3 | 2 | Register! | | | | Training: Introduction to Dry Etching - LISE 311 | | Trainer: Ling Xie | | This class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:00 am
| 12 | 6 | Register! | | | | Training: Introduction to Lithography - LISE room 319 | | Trainer: Christine Yi-Ju Wang | | The class describes the basic working principles of lithography techniques. It also gives an overview of tools that are available in CNS. This is a prerequisite for all lithography process trainings. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 10 | 7 | Register! | | | | Training: LSD-100 Scriber/Cleaver - LISE G27 | | Trainer: Guixiong Zhong | | Basic training to use the LSD-100 Scriber/Cleaver. | | Time | Max Attendees | Available | CNS Users ONLY |
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2:30 pm - 3:00 pm
| 4 | 2 | Register! | | | | Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:00 pm
| 3 | FULL | Registration Closed | | | | Training: Metrology for Nanofabrication-Part 2 (Optical Profilometry (PL-6) and Veeco AFM (SPM-5)) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Full independent access to the AFM (SPM-5) requires at least one individual user assisted session that serves as a qualification for independent use and scheduled on another day. AFM probes are provided for training; however, users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 4:30 pm
| 3 | FULL | Registration Closed | | | | Training: Planetary Ball Mill Training - G06 | | Trainer: Sandra Nakasone | | Prereq: You must have taken the "LISE G06 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 2:00 pm
| 4 | 4 | Register! | | | | Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner | | Trainer: Christine Yi-Ju Wang | Prerequisite: "Introduction to Lithography"
The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 11:00 am
| 3 | 2 | Register! | | | | Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner | | Trainer: Christine Yi-Ju Wang | Prerequisite: "Introduction to Lithography"
The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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11:00 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Thermo Scientific K-Alpha+ XPS system training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 12:00 pm
| 4 | FULL | Registration Closed | | | | Training: Thermo Scientific Nexsa XPS/UPS/REELS/ISS training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | Prerequisites: Thermo Scientific K-Alpha+ XPS system training | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 4:00 pm
hylin@fas.harvard.edu | 4 | 2 | Register! | | | | Training: Wedge and Ball Bonder - LISE G27 | | Trainer: Guixiong Zhong | | Basic training to use the Wedge and Ball Bonder. The prerequisite of this training is the WB-1 Wire Bonder training. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 2:30 pm
| 4 | 4 | Register! | | |
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| Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B | | Trainer: Tim Cavanaugh | | This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available “Zeiss SEM Part 1: Online training” prior to registration. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 1:00 pm
| 4 | 1 | Register! | | | | Training: ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - G-07 Cleanroom | | Trainer: Philippe de Rouffignac | Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This tool utilizes both ALD and pulsed CVD techniques to grow conductive, conformal thin films.
Currently those include Ni, NiNx and WNx. These films are the most conductive ALD films available at the CNS. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:00 am
prerequisite: Introduction to Thin Film Growth and Processing | 4 | 4 | Register! | | | | Training: Basic Arctica Cryo-EM course, Day 1 - B58 control room | | Trainer: Svetla Stoilova-McPhie | | CNS users will be demonstrated the Basic operation of our Tecnai Arctica Cryo-TEM microscope and have their own area set up to practice. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 5:00 pm
| 1 | FULL | Registration Closed | | | | Training: Discussion for nanofabrication related questions. - LISE G52 | | Trainer: Ling Xie | | Discussion for nanofabrication related questions. | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 3:30 pm
| 1 | FULL | Registration Closed | | | | Training: Raman, PL, and hyperspectral spectroscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Horiba XploRa with 405 nm and 785 nm excitation lines for Raman and PL spectroscopy or mapping. The system also has a Cytoviva hyperspectral imaging system attached for reflection or transmission in bright field or dark field from 420-1000 nm. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:30 pm
| 2 | 2 | Register! | | | | Training: Synergy H1m Plate Reader - G05 | | Trainer: Sandra Nakasone | | Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 12:00 pm
| 4 | 4 | Register! | | | | Training: Zetasizer Nano ZS DLS Training - G05 | | Trainer: Sandra Nakasone | | Prereq: You must have taken the "LISE G05 room orientation" given every other Monday by Sandra Nakasone. This training is mandatory, it will allow you to get into the room where this tool is located. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 4 | 4 | Register! | | |
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| Training: JAWoollam Spectroscopic Ellipsometer training - LISE-G07, in the main cleanroom | | Trainer: Jiangdong Deng | | this training will cover the basic principle and operation procedure of JAWoollam Spectroscopic Ellipsometer system for thin film optical measurement. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 3:30 pm
| 4 | 3 | Register! | | |
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| Training: G05 Cell Culture and Cryo-Prep Room Orientation - Meet outside of G05 | | Trainer: Sandra Nakasone | | This safety orientation is mandatory for access to our biomaterials, cryo-prep, and cell culture BL2 laboratory (LISE G05). In order to gain access users must attend this orientation, complete at least one training for equipment inside G05, and take the "Laboratory Biosafety" online training from the Harvard EH&S website (https://www.ehs.harvard.edu/training). Email Sandra Nakasone (snakasone@cns.fas.harvard.edu) the certificate of completion once you are done. LONG PANTS and CLOSED-TOE SHOES MANDATORY. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:30 am - 11:00 am
LONG PANTS and CLOSED-TOE SHOES MANDATORY. Long hair must be tied up. | 6 | 3 | Register! | | | | Training: G06 Nanotechnology and Rapid Prototyping Room Orientation - Meet outside of G06 | | Trainer: Sandra Nakasone | | This safety orientation is mandatory for access to our chemical nanotechnology and rapid prototyping room (LISE G06). In order to gain access users must complete this safety orientation and at least one training for equipment inside G06. LONG PANTS AND CLOSED-TOE SHOES ARE MANDATORY. | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 11:30 am
LONG PANTS and CLOSED-TOE SHOES are MANDATORY. Long hair must be tied up. | 6 | 4 | Register! | | | | Training: SP-3 AJA 3-gun sputtering system - In the cleanroom, next to the sputtering tools | | Trainer: Christine Yi-Ju Wang | Prerequisite: "Introduction to Thin Film deposition processes"
The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 2:30 pm
| 3 | 3 | Register! | | |
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| Training: RIE-8 - STS ICP RIE - LISE CNS Cleanroom at the tool | | Trainer: Ling Xie | You have to finish NF-Training "Dry Etching Intro" first and then take this training!
STS RIE - 8 is an Inductively Coupled Plasma etching system and characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Major features include:
1. ICP power up to 1,500 W
2. RF bias up to 300 W
3. Available gases: SF6, C4F8, CHF3, CF4, H2, Cl2, HBr, BCl3, Ar, O2, and N2
4. Substrate temperatures from 10 °C to 30 °C
5. Handling 6″ or smaller samples
Applications
Etching silicon-based materials, boron nitride, and other compatible 2-D materials
Available Processes
1. High aspect ratio Si pillars
2. Si nano-wires and nano-needles
3. Si micro holes
4. Si trenches
5. SiO2 and Si3N4 trenches
6. Graphene and boron nitride etch | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
| 4 | FULL | Registration Closed | | | | Training: Basic Arctica Cryo-EM course Day 2 - B58 Control room | | Trainer: Svetla Stoilova-McPhie | | Practicing of the Arctica Cryo-EM workflow. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 5:00 pm
| 1 | FULL | Registration Closed | | | | Training: Heidelberg uPG501 - Metrology bay in the cleanroom | | Trainer: Guixiong Zhong | | Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. The tool has 2 micron or better feature resolution, 1 micron alignment accuracy. The prerequisites for this training are the wet bench training, spinner/developing training, and the Introduction to Lithography class. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
| 4 | 3 | Register! | | | | Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom | | Trainer: Mac Hathaway | | Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:30 am
| 10 | 9 | Register! | | | | Training: MLA150 Maskless Aligner - Metrology bay in the cleanroom | | Trainer: Guixiong Zhong | | Training on the Heidelberg MLA150 Maskless Aligner. This tool can be used to expose positive and negative photoresist without the need for a photomask. The tool has 1 micron or better feature resolution, 0.5 micron alignment accuracy. The prerequisites for this training are the wet bench training, and Spinner/developing training. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 4 | 2 | Register! | | | | Training: Raman and PL spectroscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Horiba LabRam HR Evolution with 532 nm and 633 nm excitation lines for Raman and PL spectroscopy or mapping | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 3 | 3 | Register! | | | | Training: RIE-7 - Unaxis Shuttleline ICP RIE - in front of the tool inside clearoom. | | Trainer: Kenlin Huang | RIE-7 - Unaxis Shuttleline ICP RIE training
3:30 - 4:30 pm | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:30 pm - 4:30 pm
kenlinhuang@cns.fas.harvard.edu | 4 | 3 | Register! | | | | Training: RTP3 training - meet inside in PVD bay | | Trainer: John Tsakirgis | | To understand safety and operations of RTP | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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9:30 am - 10:30 am
please bring a cleanroom notebook | 2 | FULL | Registration Closed | | | | Training: Spinner training - In the cleanroom, next to the spinners | | Trainer: Christine Yi-Ju Wang | | The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 1:30 pm
| 4 | 3 | Register! | | | | Training: UV-VIS-NIR spectroscopy - LISE G04 | | Trainer: Arthur McClelland | | learn to use the CARY 7000 for transmission or reflection measurements from 200-2500 nm | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:30 pm
| 3 | 3 | Register! | | |
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| Training: Basic Arctica Cryo-EM course Day 2 - B58 control room | | Trainer: Svetla Stoilova-McPhie | | Practicing of the Arctica Cryo-EM workflow. | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 5:00 pm
| 1 | FULL | Registration Closed | | | | Training: Cypher AFM General Training (attending the class - B58 | | Trainer: Antonio Ambrosio | | This is the training event where the Cypher AFM is presented. The two hours class "Introduction to Scanning Probe Microscopy" is mandatory before attending this training event. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 3:00 pm
| 4 | 2 | Register! | | | | Training: FTIR Spectroscopy and Microscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Nicolet iS50 FTIR spectrometer and the Bruker Lumos FTIR microscope | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Introduction to Lithography - LISE room 319 | | Trainer: Guixiong Zhong | | The class describes the basic working principles of lithography techniques. It also gives an overview of tools that are available in CNS. This is a prerequisite for all lithography process trainings. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 10 | 10 | Register! | | | | Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:00 pm
| 3 | 1 | Register! | | | | Training: Metrology for Nanofabrication-Part 2 (Optical Profilometry (PL-6) and Veeco AFM (SPM-5)) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Full independent access to the AFM (SPM-5) requires at least one individual user assisted session that serves as a qualification for independent use and scheduled on another day. AFM probes are provided for training; however, users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 4:30 pm
| 3 | 3 | Register! | | | | Training: Nikon Micro-CT system training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 12:00 pm
hylin@fas.harvard.edu | 4 | 4 | Register! | | | | Training: RCA training - meet in wet bay | | Trainer: John Tsakirgis | | To understand safety and operations of RCA | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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9:30 am - 10:30 am
please bring a cleanroom notebook | 3 | 3 | Register! | | | | Training: RIE-11 Diamond RIE Training - LISE G07 CNS Cleanroom | | Trainer: Ling Xie | You have to finish NF-Training "Dry Etching Intro" first and then take this training!
PT RIE-11 is Plasma-Therm’s Versaline Inductive Coupled Plasma (ICP) etching system, a product resulting from decades of technology evolution. Its 2 MHz ICP RF for efficient coupling of power to plasma makes etching results stable and repeatable. Well designed thermal management components control chamber temperatures at desired values from beginning to the end during processes. Major features include:
• ICP RF up to 1,200 W
• RF bias up to 600 W
• Substrate temperatures from 10 °C to 180 °C
• Lid, ceramic spool, and metal liner temperatures from 20 °C to 180 °C
Applications
Diamond etch only
Available Processes
• Thorough O2 plasma chamber cleaning processes for NV center applications
• Nano-feature etch
• Diamond thinning
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
| 4 | 2 | Register! | | | | Training: SEM-10 Hitachi 8230 SEM User training - in the cleanroom, next to the SEM | | Trainer: Christine Yi-Ju Wang | Pre-requisite: Previous SEM experience.
If not, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 2:30 pm
| 2 | 2 | Register! | | | | Training: Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (last bay inside of LISE G07) | | Trainer: Ed Macomber | | E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). All materials are user supplied for EE-3 (pellets and crucible liners). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. This is a manually operated deposition system and will likely take most users a few times using it to become comfortable with the machine. We meet in the cleanroom PVD bay (last bay inside LISE G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
(Please review document links in email confirmation) | 4 | 4 | Register! | | | | Training: Steady state PL (fluorescence) spectroscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Cary Eclipse steady state PL (fluorescence) spectrometer | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 2:30 pm
| 2 | 2 | Register! | | | | Training: Suss MA6 mask aligner - In the cleanroom, next to the mask aligner | | Trainer: Christine Yi-Ju Wang | Prerequisite: "Introduction to Lithography"
The MA6 mask aligner is good for 3-6" substrates, 4-7" photomasks, with bask side alignment capability. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 11:00 am
| 3 | 3 | Register! | | | | Training: Suss MJB4 mask aligner - In the cleanroom, next to the mask aligner | | Trainer: Christine Yi-Ju Wang | Prerequisite: "Introduction to Lithography"
The MJB4 mask aligner is good for up to 4" substrates, 4" and 5" photomasks. Fast troughput with optimum resolution of 2um. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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11:00 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Test - | | Trainer: Ling Xie | | | Time | Max Attendees | Available | Open Event! |
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9:00 am - 4:00 pm
| 100 | 99 | Register! | | | | Training: Transparency photomask printer training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:00 pm
hylin@fas.harvard.edu | 4 | 4 | Register! | | | | Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE | | Trainer: Mac Hathaway | | Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 12:30 pm
| 8 | 2 | Register! | | |
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