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| Training: Zeiss SEM Part 1: Online training - Harvard Training Portal | | Trainer: Tim Cavanaugh | The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
| | | | Training: B15A online safety training - Harvard Training Portal | | Trainer: Jules Gardener | CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013222 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time.
Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one. | | | | Training: Sputter coater training (online) - Harvard Training Portal | | Trainer: Jules Gardener | This training is for the HAR-050 EMS dual head and HAR-053 EMS single head sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. The HAR-050 is equipped with Pt/Pd and Au targets, although Cr is available as an adhesion layer upon request. The HAR-053 is for Pt/Pd deposition only. We cannot accommodate other metal targets in this sputter coater, and this instrument is not suitable for depositing thick films.
Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013226 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.
| | | | Training: TEM Training Part 1: Online training - Harvard Training Portal | | Trainer: Jules Gardener | This is a new online training which is required as the first step of TEM training for the JEOL 2100 and FEI F20 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or FEI F20 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
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| Training: Thermo Scientific K-Alpha+ XPS Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | Surface analysis technique. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 3:00 pm
hylin@fas.harvard.edu | 4 | 1 | Register! | | |
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| Training: G05 room training - G05 | | Trainer: Sandra Nakasone | | This room training is required to get access to G05. Wear long pants and close toed shoes. In addition, you will be required to take the online training tilted "Biosafety Training" accessible on the EHS training website: https://www.ehs.harvard.edu/training | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 2:30 pm
| 6 | 4 | Register! | | | | Training: G06 room training - G06 | | Trainer: Sandra Nakasone | | This training is a requirement to gain access to G06. Wear long pants and close toed shoes. | | Time | Max Attendees | Available | CNS Users ONLY |
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2:30 pm - 3:00 pm
| 6 | 4 | Register! | | | | Training: Introduction to TEM using the JEOL 2100 - B15C | | Trainer: Adam Graham | | In this training you will learn to use the JEOL 2100. We will go over startup , alignment , HR imaging, and shut down. Access will be granted after successful completion of the Required TEM online training, completion of the training class and, successful demonstration of the TEM USe in an independant certification. | | Time | Max Attendees | Available | CNS Users ONLY |
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9:00 am - 3:30 pm
TEM Training part 1 Online training required | 4 | 2 | Register! | | | | Training: Nikon XTH 225 Micro-CT Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | Non-destructive 3D X-ray imaging technique.
Include software, Avizo and VGStudio MAX for the analysis and visualization of computed tomography (CT) data. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 12:00 pm
hylin@fas.harvard.edu | 4 | 3 | Register! | | | | Training: Plasma O2 stripper : RIE 09 and RIE 05 - In front of the tool , inside cleanroom. | | Trainer: Kenlin Huang | | Dry etching Intro Class is the prerequisite for taking training class of Plasma O2 stripper : RIE 09 and RIE 05 at 03:30 pm | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:30 pm - 4:00 pm
kenlnhuang@cns.fas.harvard.edu,617-495-1738 | 4 | 4 | Register! | | | | Training: Soft Materials Cleanroom (SMCR) Orientation - We meet in the ground floor couches (outside G07) | | Trainer: Sandra Nakasone | | This combined safety orientation and tool training is the complete training required for access to the Soft Materials CleanRoom (SMCR) located in LISE G07A. The SMCR is a cleanroom devoted to Soft Lithography with a focus on rapid prototyping of microfluidic devices using PDMS elastomer. Dr. Ilke Akartuna (akartuna at seas.harvard.edu) from the Weitz group will be providing technical training on the process equipment in the room immediately following the safety training | | Time | Max Attendees | Available | CNS Users ONLY |
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10:30 am - 12:00 pm
| 6 | 4 | Register! | | |
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| Training: Atomic Layer Deposition (ALD) Training ALD-1 and ALD-4 (Oxides) - Gowning Area - G-07 Cleanroom (Yes, we start in the GOWNING AREA) | | Trainer: Mac Hathaway | | Equipment and Process Engineering Training for ALD-1 and ALD4. PREREQUISITE - You must take the Thin Film Deposition Introductory class before taking ALD, CVD, Evaporator, and/or Sputtering System training. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
| 5 | 5 | Register! | | | | Training: Cleanroom Orientation - in front of G07 | | Trainer: John Tsakirgis | | To understand our protocols and to be comfortable in starting your work here at CNS | | Time | Max Attendees | Available | Open Event! |
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1:00 pm - 2:30 pm
Please be prompt | 10 | 9 | Register! | | | | Training: Cleanroom Orientation - Meet in front of G07 | | Trainer: John Tsakirgis | | To understand our protocols and complete registration. | | Time | Max Attendees | Available | Open Event! |
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1:00 pm - 2:30 pm
Please be prompt | 10 | 9 | Register! | | | | Training: CVD-3 Training: STS PECVD Training Session - Dry processing bay in the cleanroom | | Trainer: Philippe de Rouffignac | Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This training will provide users with the tools necessary to grow high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. These films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 2:30 pm
prerequisite: Introduction to Thin Film Growth and Processing | 5 | FULL | Registration Closed | | | | Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay | | Trainer: Ed Macomber | | Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
(check links in confirmation email for documents) | 5 | FULL | Registration Closed | | | | Training: Form2 SLA 3D Printer Training - G06 | | Trainer: Sandra Nakasone | Pre-requisite: LISE G06 Room Safety Orientation
Build volume: 5.7” x 5.7” x 6.9” (145 x 145 x 175 mm)
Layer thickness: 25 – 100 microns
Laser spot size: 140 microns
Laser power: 250mW
Material/color: Clear Resin | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 3:30 pm
| 3 | 2 | Register! | | | | Training: Heidelberg MLA150 Maskless Aligner - Meet in the metrology bay | | Trainer: Guixiong Zhong | | Training on the Heidelberg MLA150 Maskless Aligner. This tool can be used to expose positive and negative photoresist without the need for a photomask. The MLA150 has 1 micron or better feature resolution, 0.5 micron alignment accuracy. The prerequisites for this training are the wet bench training, and photolithography training. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 4 | FULL | Registration Closed | | | | Training: Heidelberg uPG501 Direct Write Lithography Training - Meet at the metrology bay inside the cleanroom | | Trainer: Guixiong Zhong | | Training on the Heidelberg uPG501 direct-write lithography system. This tool can be used to expose positive and negative photoresist without the need for a photomask; it can also be used to write photomasks. uPG501 has 2 microns or better feature resolution, 1 micron alignment accuracy. The prerequisites for this training are the wet bench training, and spinner training. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
| 4 | 2 | Register! | | | | Training: Helix 75W Laser Cutter NEW USERS - G06 | | Trainer: Sandra Nakasone | This training is for new users. No experience necessary.
Requirement: Complete the “Enclosed Laser Instruments Safety” Online training https://www.ehs.harvard.edu/training
Send me the Certificate of Completion via email (snakasone@cns.fas.harvard.edu)
Laser Power: 75W
Working Surface area: 24" x 18" x 8.5" (610 x 457 x 215.9 mm)
Spot size: 0.003" - 0.005" (0.0762 - 0.127 mm)
Wavelength: 10.6 microns
Accuracy: +/- .01" (0.254 mm) over the entire table | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 4 | 3 | Register! | | | | Training: Horiba LabRam Raman and PL - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Horiba LabRam system with 532 and 633 nm excitation lines for Raman and PL spectroscopy and mapping. Full polarization control and cryostat options available. | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 3 | 2 | Register! | | | | Training: Introduction to Scanning Probe Microscopy - LISE 311 | | Trainer: Antonio Ambrosio | | This is an introduction to Scanning Probe Microscopy (SPM) aimed at providing general concept of AFM microscopy. It is also used as orientation for the potential users to the | | Time | Max Attendees | Available | CNS Users ONLY |
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4:00 pm - 6:00 pm
| 10 | 5 | Register! | | | | Training: Introduction to Thin Film Growth and Processing - Common area on G level of CNS, next to fixed white board. | | Trainer: Philippe de Rouffignac | | Provides an introduction to thin films and thin film growth mechanisms for CVD, PVD, and ALD. Users will also learn about the film processes and tools available at the CNS and be provided with feedback concerning the use of those techniques for your particular project/interests. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:30 am - 11:30 am
required prerequisite for all thin film tool trainings | 15 | 12 | Register! | | | | Training: JEOL 2010F training - for current CNS JEOL 2100 users only - LISE B15G | | Trainer: Jules Gardener | This training will cover TEM-mode operation of the JEOL 2010 instrument. We will image a CNS-provided sample.
*You must be a certified user of our JEOL 2100 instrument to attend this training*
| | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:30 pm
| 4 | 3 | Register! | | | | Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Dry Processing Bay in cleanroom | | Trainer: Philippe de Rouffignac | Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This is a general training for all of the LPCVD and APCVD furnaces. These Tystar furnaces can accommodate anything from a single 1cm substrate up to 50 6" wafers.
The various furnaces encompass the following processes:
- Anneals non metal containing samples from 250 to 1100C under O2, N2, and H2/He
- Anneals of metal containing samples from 250 to 1100C under N2 and H2/He
- Low stress and stoichiometric silicon nitride
- Amorphous and polycrystalline silicon (doped with P or B or undoped)
- SiO2 from TEOS (conformal, additive SiO2 process)
- SiO2 from oxidation of silicon using H2O or O2 | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:00 am - 11:30 am
prerequisite: Introduction to Thin Film Growth and Processing | 4 | 1 | Register! | | | | Training: MakerBot 3D Printer Training - G06 | | Trainer: Sandra Nakasone | Pre-requisite: LISE G06 Room Safety Orientation
Build volume: 11.6” x 7.6” x 6.5” (29.5 x 19.5 x 16.5 cm)
Layer thickness: 100 – 300 microns
Material/color: Black PLA filament | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:00 pm
| 3 | 3 | Register! | | | | Training: Transparency Photomask Printer Training - hylin@fas.harvard.edu | | Trainer: Hao-Yu (Greg) Lin | | Minimum 10 um resolution | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:00 pm
| 4 | 4 | Register! | | |
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| Training: Contact Angle Measuring Tool Training - G06 | | Trainer: Sandra Nakasone | | Pre-requisite: LISE G06 Room Safety Orientation | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Cypher AFM General Training (attending the class - G12 | | Trainer: Antonio Ambrosio | | This is the training event where the Cypher AFM is presented. The two hours class "Introduction to Scanning Probe Microscopy" is mandatory before attending this training event. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 3:00 pm
| 4 | 2 | Register! | | | | Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay | | Trainer: Ed Macomber | | Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Ge, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
(check links in confirmation email for documents) | 5 | 2 | Register! | | | | Training: FTIR spectroscopy and microscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Nicolet iS50 with midIR and farIR spectral ranges and the Bruker Lumos with midIR mapping capabilities. | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:00 am
| 3 | FULL | Registration Closed | | | | Training: Introduction to Dry Etching - LISE 311 | | Trainer: Ling Xie | | This class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:00 am
This class is pre-requested for accessing any RIEs and IBE trainings | 6 | 4 | Register! | | | | Training: Introduction to Lithography - LISE 303 | | Trainer: Guixiong Zhong | | This class introduces the lithography techniques at CNS which include Photolithography, Electron Beam Lithography (EBL), and Nanoscribe 3D lithography. The class is a prerequisite to all lithography tools in the cleanroom. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 10 | 9 | Register! | | | | Training: Lyophilizer/Freeze Dryer Training - G06 | | Trainer: Sandra Nakasone | | Pre-requisite: LISE G06 Room Safety Orientation | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 1:30 pm
| 3 | 3 | Register! | | | | Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 (Inside Nanofabrication Cleanroom-Metrology Bay) | | Trainer: Jason Tresback | | Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:30 pm
| 4 | 4 | Register! | | | | Training: Metrology for Nanofabrication-Part 2 (Optical Profilometry and Veeco AFM) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This training event covers some advanced metrology techniques, such as the Optical Profiler (CCI HD) (PL-6) and the Atomic Force Microscope (Veeco NanoMan AFM) (SPM-5). Training on each tool may take up to 1 hour and after signing up for the training, users should also send an email to the CNS staff (jtresback@cns.fas.harvard.edu) to identify the tool they would like to learn and a brief description of the sample and measurement goal. Full independent access to the AFM (SPM-5) requires at least one individual user assisted session that serves as a qualification for independent use and scheduled on another day. AFM probes are provided for training; however users must supply their own probes during independent use. We meet inside the cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 4:30 pm
| 3 | 2 | Register! | | | | Training: Neaspec nano-FTIR training - G12 | | Trainer: Antonio Ambrosio | | | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 1:00 pm
| 1 | FULL | Registration Closed | | | | Training: Planetary Ball Mill Training - G06 | | Trainer: Sandra Nakasone | Pre-requisite: LISE G06 Room Safety Orientation
| | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 2:00 pm
| 3 | 3 | Register! | | | | Training: RIE-13 - Oxford PlasmaPro 100 Cobra - in front of the tool , inside cleanroom. | | Trainer: Kenlin Huang | Dry etching Intro Class is the prerequisite for taking RIE-13 - Oxford PlasmaPro 100 Cobra 300 training
(2:30 - 3:30 pm Wednesday) | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 3:30 pm
kenlinhuang@cns.fas.harvard.edu, 617-495-1738 | 3 | 3 | Register! | | | | Training: Thermo Scienitifc Nexsa surface analysis training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | Capable to do XPS, UPS, ISS and REELS
Pre-requisite: Thermo Scientific K-Alpha+ XPS Training | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 4:00 pm
Pre-requisite: Thermo Scientific K-Alpha+ XPS Training | 4 | 3 | Register! | | | | Training: UV-VIS-NIR spectroscopy - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Cary 7000 UV-VIS-NIR system for reflection or transmission measurements from 200-2700 nm with angle and polarization control. Integrating sphere also available. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:30 pm
| 3 | 2 | Register! | | | | Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE | | Trainer: Mac Hathaway | | Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 12:30 pm
| 8 | 5 | Register! | | | | Training: Wire Bonder Training - Meet in front of the iris scan at LISE G27 | | Trainer: Guixiong Zhong | | Basic training to use the West-Bond wire bonder. The tool is optimized to bonder 1mil aluminum wire to gold pad. | | Time | Max Attendees | Available | CNS Users ONLY |
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2:30 pm - 3:30 pm
| 4 | 3 | Register! | | | | Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B | | Trainer: Tim Cavanaugh | | This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available “Zeiss SEM Part 1: Online training” prior to registration. | | Time | Max Attendees | Available | CNS Users ONLY |
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12:00 pm - 3:00 pm
| 4 | 2 | Register! | | |
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| Training: ALD-2 Arradiance GEMStar ALD and Pulsed CVD Training - G-07 Cleanroom | | Trainer: Philippe de Rouffignac | Introduction to Thin Film Growth and Processing is required before you can sign up for this training:
This tool utilizes both ALD and pulsed CVD techniques to grow conductive, conformal thin films.
Currently those include Ni, NiNx and WNx. These films are the most conductive ALD films available at the CNS. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:00 am
prerequisite: Introduction to Thin Film Growth and Processing | 4 | 4 | Register! | | | | Training: Cleanroom orientation - Meet in front of G07 | | Trainer: John Tsakirgis | | To understand our protocols and complete your registration | | Time | Max Attendees | Available | Open Event! |
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1:00 pm - 2:30 pm
Please be prompt | 10 | 10 | Register! | | | | Training: Cypher AFM certification (attending the class - G12 | | Trainer: Antonio Ambrosio | | This is a certification event for the Asylum Cypher AFM. Attending Part -1 "Asylum Cypher AFM - General Training" is mandatory for this training event. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 3:00 pm
| 2 | 1 | Register! | | | | Training: DelsaNano DLS System Training - G05 | | Trainer: Sandra Nakasone | Pre-requisite: LISE G05 Room Safety Orientation
Model: DelsaNano C
Make: Beckman Coulter
Sample volume: 1mL (for size) and 2.5mL (for zeta potential)
| | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 2:00 pm
| 3 | 2 | Register! | | | | Training: PAO XeF2 Etcher - Nano Fabrication Lab - G07 | | Trainer: Malcolm Tse | | XeF2 etching - isotropic process widely used for releasing MEMS structures including switches, cantilevers, bridges, mirrors, membranes, channels, and thermal isolation cavities. | | Time | Max Attendees | Available | CNS Users ONLY |
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3:00 pm - 3:30 pm
| 4 | 4 | Register! | | | | Training: Plate Reader Training - G05 | | Trainer: Sandra Nakasone | Pre-requisite: LISE G05 Room Safety Orientation
Model: Synergy H1m
Make: BioTek
| | Time | Max Attendees | Available | CNS Users ONLY |
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11:00 am - 12:00 pm
| 3 | 3 | Register! | | | | Training: Spinner and resist development training - In the cleanroom, lithography bay | | Trainer: Christine Yi-Ju Wang | | The training covers the use and programming of the spinner, plus resist development (photo, e-beam, mask..etc). This training is required for all lithography processes. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:30 pm - 3:00 pm
| 4 | 3 | Register! | | |
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| Training: JAWoollam Spectroscopic Ellipsometer training - LISE-G07, in the main cleanroom | | Trainer: Jiangdong Deng | | In this advanced spectroscopic ellipsometer training, the basic ellipsometry principle, operation procedure, and basic data analysis skills will be covered. Some advanced thin film measurement strategies will be discussed. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 3:30 pm
| 4 | 2 | Register! | | |
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| Training: FIB Helios - Basics - LISE B15 F | | Trainer: Stephan Kraemer | | Users will be introduced to the basic handling of the instrument and its capabilities. A brief introduction into the underlying interaction of the ion beam with the material is given. At the end of the session users will be able to run a basic cross section analysis. Specific topics are: bringing sample to eucentric height, electron and ion beam alignment, deposition of protection layers, preparation and cleaning of cross sections, recording of high-resolution SEM images. These form the basis for more advanced tasks such as TEM sample preparation or serial section 3D analysis. | | Time | Max Attendees | Available | CNS Users ONLY |
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1:00 pm - 5:00 pm
Prior SEM experience recommended. | 4 | 4 | Register! | | | | Training: SP-3 AJA sputtering system training for 3-gun system - In the cleanroom, next to the tool | | Trainer: Christine Yi-Ju Wang | Prerequisite: "Introduction to Thin Film Growth and Processing"
The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 2 | 1 | Register! | | |
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| Training: Cleanroom Orientation - Meet in front of G07 | | Trainer: John Tsakirgis | | To understand our protocols and complete registration. | | Time | Max Attendees | Available | Open Event! |
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1:00 pm - 2:30 pm
Please be prompt | 10 | 10 | Register! | | | | Training: Horiba LabRam Raman and PL - LISE G04 | | Trainer: Arthur McClelland | | Learn to use the Horiba LabRam system with 532 and 633 nm excitation lines for Raman and PL spectroscopy and mapping. Full polarization control and cryostat options available. | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 3 | 3 | Register! | | | | Training: Introduction to Thin Film Growth and Processing - Common area on G level of CNS, next to fixed white board. | | Trainer: Philippe de Rouffignac | | Provides an introduction to thin films and thin film growth mechanisms for CVD, PVD, and ALD. Users will also learn about the film processes and tools available at the CNS and be provided with feedback concerning the use of those techniques for your particular project/interests. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:30 am - 11:30 am
required prerequisite for all thin film tool trainings | 15 | 15 | Register! | | | | Training: SEM-10 - Hitachi SU8230 SEM user training - In the cleanroom, next to the SEM | | Trainer: Christine Yi-Ju Wang | Previous SEM experience preferred.
For users who are new to SEM, please complete the Harvard SEM on-line training-
There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 11:30 am
| 2 | 2 | Register! | | | | Training: SPECTRO XEPOS XRF Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | Energy dispersive X-ray fluorescence (ED-XRF) spectrometer for elemental analysis of liquid, solid, powder and thin film samples. | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:30 pm
hylin@fas.harvard.edu | 4 | 3 | Register! | | | | Training: STS RIE-8 - LISE CNS Cleanroom | | Trainer: Ling Xie | You have to finish NF-Training "Dry Etching Intro" first and then take this training!
STS RIE - 8 is an Inductively Coupled Plasma etching system and characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Major features include:
• ICP power up to 1,500 W
• RF bias up to 300 W
• Available gases: SF6, C4F8, CHF3, CF4, H2, Cl2, HBr, BCl3, Ar, O2, and N2
• Substrate temperatures from 10 °C to 30 °C
• Handling 6″ or smaller samples
Applications
Etching silicon-based materials, boron nitride, and other compatible 2-D materials
Available Processes
• High aspect ratio Si pillars
• Si nano-wires and nano-needles
• Si micro holes
• Si trenches
• SiO2 and Si3N4 trenches
• Graphene and boron nitride etch
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:30 pm - 3:00 pm
| 4 | FULL | Registration Closed | | |
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