All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page


(Important information - please read)
 
  • Open Events
  • CNS Users Only
  • LISE Cleanroom Users Only
  • Month
Date TBD - you can pre-register for this training session.
CNS staff will notify you when a date has been set.
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001

PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW

Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
 
Training: B15A online safety training - Harvard Training Portal
Trainer: Jules Gardener
CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/app/shared;spf-url=common%2Fledetail%2Fcours000000000008101
Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time.

Please note that only nominated and approved CNS Imaging Expert Users are eligible to gain access to this facility at this time. Any CNS User with a HU Key is eligible to take this training, but currently only designated Expert Users will gain access. Non-expert Users are still welcome to take this training, but access will not occur until CNS returns to normal operation. Any questions regarding the Covid-era Expert User program should be sent to: info@cns.fas.harvard.edu
 
Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.

Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421

Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

Please note that only nominated and approved CNS Imaging Expert Users are eligible to gain access to this facility at this time. Any CNS User with a HU Key is eligible to take this training, but currently only designated Expert Users will gain access. Non-expert Users are still welcome to take this training, but access will not occur until CNS returns to normal operation. Any questions regarding the Covid-era Expert User program should be sent to: info@cns.fas.harvard.edu
 
Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142

Please note that only nominated and approved CNS Imaging Expert Users are eligible to gain access to this facility at this time. Any CNS User with a HU Key is eligible to take this training, but currently only designated Expert Users will gain access. Non-expert Users are still welcome to take this training, but access will not occur until CNS returns to normal operation. Any questions regarding the Covid-era Expert User program should be sent to: info@cns.fas.harvard.edu
 
Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope, including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery HR 20 Rheometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.
 
Tuesday, January 25th, 2022
Training: FIB-6 Zeiss Crossbeam Basic Training - B15E
Trainer: Stephan Kraemer
Introductions into the basic operation of the Zeiss Crossbeam 550 Focused Ion Beam microscope, including general workflow, beam-assisted deposition, basics of ion-material interaction, preparation of cross sections and high-resolution imaging. More advanced tasks, such as TEM sample preparation, 3D serial sectioning or cryo-FIB, will build on the introduced concepts.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 5:00 pm
SEM training recommended but not necessary
44Register!
 
Training: Introduction to Dry Etching - Online
Trainer: Ling Xie
In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include:
1. Overview of Dry Etch Methods,
2. Plasma Used in Dry Etch Processes
3. Reactive Ion Etch
i) Chemical reactions
ii) Physical ion bombardments
iii) Combination of chemical reactions & physical ion bombardments
iv) Etch direction control
4. Ion Beam Etch
5. Dry Etch Technologies & Capabilities at CNS
6. Open Discussions

This introduction class is pre-required for taking trainings on any CNS dry etching tools. It is offered online: Zoom ID 990 9681 5765, passcode 315648.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
11:00 am - 12:00 pm
129Register!
 
Training: Office hour for RIE and other Nanofabrication processes - Online
Trainer: Ling Xie
Discuss issues and questions related to RIE and other nano-fabrication processes. Please note that you will be charged on-site assisted usage for this session.



Topic: Zoom Meeting for training
Time: This is a recurring meeting Meet anytime

Join Zoom meeting
https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09

Password: 315648

Join by telephone (use any number to dial in)
+1 312 626 6799
+1 929 436 2866
+1 301 715 8592
+1 346 248 7799
+1 669 900 6833
+1 253 215 8782

International numbers available: https://harvard.zoom.us/u/abwNsmaaBL

One tap mobile: +13126266799,,99096815765# US (Chicago)

Join by SIP conference room system
Meeting ID: 990 9681 5765
99096815765@zoomcrc.com
TimeMax AttendeesAvailableCNS Users ONLY
3:00 pm - 3:30 pm
11Register!
 
Training: Resist Spinner training - Photo Bay
Trainer: Malcolm Tse
The training covers the use and programming of the spinner. This training is required for all lithography processes (EBL, MLA150, uPG501, mask aligners, etc).
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 11:00 am
2FULLRegistration Closed
 
Training: SEC - Nanoindenter training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter.
TimeMax AttendeesAvailableCNS Users ONLY
12:30 pm - 2:30 pm
32Register!
 
Training: Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (last bay inside of LISE G07)
Trainer: Ed Macomber
E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). All materials are user supplied for EE-3 (pellets and crucible liners). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. This is a manually operated deposition system and will likely take most users a few times using it to become comfortable with the machine. We meet in the cleanroom PVD bay (last bay inside LISE G07).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:30 pm
(Please review document links in email confirmation)
31Register!
 
Training: SUSS MA6 Mask Aligner - Meet at the photo bay
Trainer: Guixiong Zhong
Training for experienced users on the SUSS MA6 Mask Aligner. Starts at 2:15PM instead of 2PM in the photo bay of the cleanroom.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
2FULLRegistration Closed
 
Training: Wire Bonder - Meet in front of the iris scan at LISE G27
Trainer: Guixiong Zhong
Basic training to use the wire bonder. The bonder is configured to bond Al wire to gold pad.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 2:00 pm
2FULLRegistration Closed
 
Wednesday, January 26th, 2022
Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom Bay 2
Trainer: Jason Tresback
It is strongly recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), multi-wavelength scanning Ellipsometer (FS-150XY) (ES-3), Thick film Reflectometer (MET-35), sheet resistance Rs mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 12:00 pm
32Register!
 
Training: RIE 10 SPTS Rapier DRIE System - The first hour training is held outside the cleanroom and the rest of time is inside the cleanroom
Trainer: Ling Xie
It is required to take the "Introduction to Dry Etching" before this training.

The SPTS Rapier system is for deep silicon etch only, it is configured with dual plasma sources, dual gas inlets, electro-static clamping chuck, AMS chiller to control the chuck temperature from -15C to + 40C, and Claritas end-point detector.

Specifications
Etch rate: 1.0 10 m/min
Aspect ratio: 5 50
Etch depth: 5m several hundreds of microns
Feature size: nm mm scales in lateral dimension
Sider wall roughness (scallop depth): 6nm 700nm
Sample size ≤ 6
Etch mask: only resists and SiO2 allowed

The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 3:30 pm
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
1FULLRegistration Closed
 
Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope, including mechanical and fluorescence-correlated measurements.
TimeMax AttendeesAvailableCNS Users ONLY
1:30 pm - 4:30 pm
32Register!
 
Thursday, January 27th, 2022
Training: SEC - DLS/Zetasizer Training -
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements.
TimeMax AttendeesAvailableCNS Users ONLY
3:30 pm - 4:30 pm
32Register!
 
Friday, January 28th, 2022
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:00 pm
(check links in confirmation email for documents)
32Register!
 

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