All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page

(Important information - please read)

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: B15A online safety training - Harvard Training Portal
Trainer: Jules Gardener
CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/app/shared;spf-url=common%2Fledetail%2Fcours000000000008101 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. Any CNS User with a HU Key is eligible to take this training.

Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Any CNS User with a HU Key is eligible to take this training

Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Any CNS User with a HU Key is eligible to take this training.

Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope, including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.

Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.

Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery HR 20 Rheometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Monday, June 27th, 2022
Training: AJA SP-2 Sputtering System Training - LISE G07 (CNS Cleanroom)
Trainer: Ed Macomber
The SP-2 system is a 6-gun magnetron sputtering machine with (3) RF guns and (3) DC guns to cover a range of metals, semi-conductors, and dielectric materials, including Au, Pt, and magnetics. Sputtering materials are loaded into the system every other week on an "as-requested" basis. This means you may wait up to four weeks (or more) for your material depending on system demand at the time. Substrate pre-cleaning, heating, co-sputtering, and reactive sputtering are all available on this system.
1:00 pm - 2:30 pm Look in the confirmation email for important attachments including the S.O.P.	2	FULL	Registration Closed

Training: Introduction to Lithography - Zoom Online
Trainer: Bok Yeop Ahn
This class introduces the lithography capabilities at CNS, covers some basics for photolithography and e-beam lithography, and helps users the chose the proper tools for their projects. Users are encouraged to take this class before taking any other photo- or e-beam lithography trainings. As listed below, there are two prerequisites that you must finish before registering to this training: - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Orientation (Another name of this training is General Nanofabrication Facility Access, John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) Check the CNS website to see if there are open sessions available. If needed, contact the trainers to have them open sessions. Let me know if you may have any questions. Topic: Introduction to Lithography Time: Jun 27, 2022 09:30 AM Eastern Time (US and Canada) Join Zoom Meeting https://us06web.zoom.us/j/84754702136?pwd=SkM5a3FQMjM3MVdQdklzWEV0YWFPUT09 Meeting ID: 847 5470 2136 Passcode: 820960
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 10:30 am	10	8	Register!

Training: XeF2 Etcher training - CNS Cleanroom at the tool
Trainer: Ling Xie

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:00 pm	2	1	Register!

Time	Max Attendees	Available	CNS Users ONLY
Tuesday, June 28th, 2022
Training: Disco ADA-321 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G06
Trainer: Jason Tresback
This training event will cover the basic operation of the Disco ADA-321 Automatic Dicing Saw (SW-1). The tool uses a rotating, ultra-thin (300 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, and ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from the cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day and LISE G06 Room Orientation will be covered during part-1
2:00 pm - 3:00 pm	3	1	Register!

Training: FIB-4 FEI Helios Basic Training - B15F
Trainer: Stephan Kraemer
Introduction into the basic operation of the Helios Nanolab 660 Focused Ion Beam microscope, including general workflow, beam-assisted deposition, basics of ion-material interaction, preparation of cross sections and high-resolution imaging. More advanced tasks, such as TEM sample preparation or 3D serial sectioning, will build on the introduced concepts.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 5:00 pm Prior SEM training recommended but not necessary	4	1	Register!

Training: Intro to Metrology for Nanofabrication Lecture -
Trainer: Jason Tresback
This lecture is an informal discussion about the measurement tools and techniques available inside the nanofabrication cleanroom G07. The introduction serves as a tutorial and guidance for choosing metrology for nanofabrication training events, however, metrology part-1 is not required to attend part-2 (Optical Profiler (PL-6) and AFM (SPM-12). Please email jtresback@cns.fas.harvard.edu if you have any questions
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 12:00 pm	4	4	Register!

Training: Introduction to Dry Etching - Online, Zoom link: https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09 Or Meeting ID: 990 9681 5765, password: 315648
Trainer: Ling Xie
A online training, Zoom link: https://harvard.zoom.us/j/99096815765?pwd=NGo3N2xocTV5T0hIRXdWcW80Y1NzUT09 Or Meeting ID: 990 9681 5765, password: 315648 In this introduction class, the topics to be discussed include: 1. Dry Etch Methods 2. Plasma in Dry Etch Processes 3. Reactive Ion Etch i). Chemical etch ii). Physical etch iii). Etch direction control 4. Ion Beam Etch 5. Dry Etch Technologies & Capabilities at CNS 6. Open Discussion
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 12:00 pm	12	2	Register!

Training: Introduction to Scan Probe Microscopy Lecture - LISE Ground Floor
Trainer: Jason Tresback
This lecture is an informal discussion about the scan probe microscopy capabilities available at CNS. The introduction serves as a pre-requisite for individual AFM tool trainings. We recommend and strongly encourage you to attend before registering for individual AFM tool trainings. Please email jtresback@cns.fas.harvard.edu if you have any questions
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 11:00 am	5	3	Register!

Training: SP-3 AJA sputtering system training for 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources).The substrate holder can accommodate up to a 4� diameter wafer. SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:00 pm (check document links in confirmation email)	3	FULL	Registration Closed

Training: Thermo Scientific K-Alpha+ XPS training - LISE G27
Trainer: Hao-Yu (Greg) Lin
training on Thermo Scientific K-Alpha+ XPS system
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	2	FULL	Registration Closed

Training: User training for Hitachi SU8230 SEM in Cleanroom - G07, Inside Cleanroom at the tool
Trainer: Bok Yeop Ahn
This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequired trainings that you must finish before getting to this tool. - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Orientation (Another name of this training is General Nanofabrication Facility Access, John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) - CNS Online SEM Training Module (Online course) Please make sure that you finish all the prerequisites before registering to the Hitachi SU8230 SEM training. Let me know if you may have any questions.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:30 pm - 5:00 pm	3	1	Register!

Training: User training for Hitachi SU8230 SEM in Cleanroom - G07, Inside Cleanroom
Trainer: Bok Yeop Ahn
This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequired trainings that you must finish before getting to this tool. - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Orientation (Another name of this training is General Nanofabrication Facility Access, John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) - CNS Online SEM Training Module (Online course) Please make sure that you finish all the prerequisites before registering to the Hitachi SU8230 SEM training. Let me know if you may have any questions.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:30 pm	3	FULL	Registration Closed

Time	Max Attendees	Available	CNS Users ONLY
Wednesday, June 29th, 2022
Training: Cypher S/ES and MFP3d BiO Atomic Force Microscopy (AFM) Training Part-1 (SPM-2 & 6) - LISE B58
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of the Cypher S/ES and/or MFP3D BiO AFM�s available at CNS (SPM- 2 and 6). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. Please register for each event and meet in hallway outside LISE B58
2:00 pm - 3:30 pm	4	2	Register!

Training: Jupiter XR Atomic Force Microscopy (AFM) Training Part-1 (SPM-12) - LISE G07 Nanofabrication Cleanroom Metrology Bay
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of the Jupiter XR AFM available inside the Nanofabrication Cleanroom (SPM-12). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 4:00 pm	3	1	Register!

Training: Maskless Aligner MLA-2 -
Trainer: Guixiong Zhong
Basic training to use the Maskless Aligner MLA-2. The pre-requisite for the training is the OL-10 MLA150.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 2:30 pm	3	1	Register!

Training: Metrology for Nanofabrication Part-1 in Cleanroom (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) -
Trainer: Jason Tresback
It is recommended that you register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), multi-wavelength scanning Ellipsometer (FS-150XY) (ES-3), Thick film Reflectometer (MET-35), sheet resistance Rs mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:30 am	3	FULL	Registration Closed

Training: MLA150 Maskless Aligners - Metrology bay in the cleanroom
Trainer: Guixiong Zhong
Basic training to use both MLA150 aligners, the MLA150 and the MLA-2.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm	4	2	Register!

Training: Optical Profiler Training (PL-6) -
Trainer: Jason Tresback
This training event basic operation of the Optical Profiler (CCI HD) (PL-6) located in LISE G07 Nanofabrication Cleanroom which uses white light interferometry (WLI) to measure roughness, step-heights, and topography with sub-nm vertical resolution and 1um lateral resolution. This is a rapid, non-contact, and non-destructive technique to analyze small areas (80x80 um) and large areas (100x100 mm). Limitations include thin, transparent films and dissimilar materials.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
11:30 am - 12:30 pm	3	2	Register!

Training: RIE 10 SPTS Rapier DRIE System - The first hour training is held outside the cleanroom and the rest of time is inside the cleanroom
Trainer: Ling Xie
It is required to take the "Introduction to Dry Etching" before this training. The first hour training is online, Zoom ID 990 9681 5765, passcode 315648. The SPTS Rapier system is for deep silicon etch only, it is configured with dual plasma sources, dual gas inlets, electro-static clamping chuck, AMS chiller to control the chuck temperature from -15�C to + 40�C, and Claritas end-point detector. Specifications � Etch rate: 1.0 � 10 �m/min � Aspect ratio: 5 � 50 � Etch depth: 5�m � several hundreds of microns � Feature size: nm � mm scales in lateral dimension � Sider wall roughness (scallop depth): 6nm � 700nm � Sample size ≤ 6� � Etch mask: only resists and SiO2 allowed The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 3:30 pm The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.	2	FULL	Registration Closed

Training: SC-5 - Cleanroom Headway Spinner Training - Cleanroom - Photo Bay
Trainer: Malcolm Tse
The training covers the use and programming of the spinner. This training is required for all lithography processes (EBL, MLA150, uPG501, mask aligners, etc).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
9:30 am - 10:30 am	3	1	Register!

Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer.
Time	Max Attendees	Available	CNS Users ONLY
1:30 pm - 2:30 pm	2	1	Register!

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella

Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 5:00 pm	2	FULL	Registration Closed

Training: Sharon TE-3, 4, and 5 Thermal Evaporator Training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, Ni, etc. Check the links in the confirmation email for important attachments including the S.O.P.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm (Please review document links in email confirmation)	3	FULL	Registration Closed

Training: User training for MA6 mask aligner -
Trainer: Bok Yeop Ahn
This is a training session for MA6 Mask Aligner. In cleanroom. As listed below, there are several prerequired trainings that you must finish before getting to MA6 mask aligner training. - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Orientation (Another name of this training is General Nanofabrication Facility Access, John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) - Introduction to Lithography at CNS (Bok Yeop Ahn: byahn@cns.fas.harvard.edu) - Wet bench and Chemical Safety Training Part I and II (Mac Hathaway: hathway@cns.fas.harvard.edu) - Resister Spinner Training (Malcolm Tse: mtse@cns.fas.harvard.edu) Check the CNS website to see if there are open sessions available. If needed, contact the trainers to have them open sessions. Please make sure that you finish all the prerequisites before registering to the MA6 mask aligner training. Let me know if you may have any questions.
Time	Max Attendees	Available	CNS Users ONLY
3:30 pm - 5:00 pm	3	2	Register!

Training: User training for MA6 mask aligner - LISE G07, Inside cleanroom at the tool
Trainer: Bok Yeop Ahn
This is a training session for MA6 Mask Aligner. In cleanroom. As listed below, there are several prerequired trainings that you must finish before getting to MA6 mask aligner training. - LISE Safety Training (John Sweeney: john_sweeney@harvard.edu) - CNS Cleanroom Orientation (Another name of this training is General Nanofabrication Facility Access, John Tsakirgis: johntsakirgis@cns.fas.harvard.edu) - Introduction to Lithography at CNS (Bok Yeop Ahn: byahn@cns.fas.harvard.edu) - Wet bench and Chemical Safety Training Part I and II (Mac Hathaway: hathway@cns.fas.harvard.edu) - Resister Spinner Training (Malcolm Tse: mtse@cns.fas.harvard.edu) Check the CNS website to see if there are open sessions available. If needed, contact the trainers to have them open sessions. Please make sure that you finish all the prerequisites before registering to the MA6 mask aligner training. Let me know if you may have any questions.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:30 pm	3	FULL	Registration Closed

Training: Woollam RC2 Spectroscopic Ellipsometer Training (ES-4) - Inside LISE G07 Nanofabrication Cleanroom
Trainer: Jason Tresback
This training event will cover the basic operation of RC2 spectroscopic ellipsometer including sample mounting, auto-alignment, model selection/development, and mapping using small spot size (125um) with wavelength range of 200-2500nm. Wafer mapping will also be covered. We will meet inside the Nanofabrication cleanroom along the windows
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
4:30 pm - 5:00 pm	3	FULL	Registration Closed

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Thursday, June 30th, 2022
Training: DOE-1 - ULVAC Deep Oxide Etcher - in front of the tool, inside the G7 cleanroom.
Trainer: Kenlin Huang
DOE-1 - ULVAC Deep Oxide Etcher training
3:30 pm - 4:30 pm 617-495-1738	2	1	Register!

Training: RIE-09 Anatech Barrel Plasma system and RIE-14 - In front of the tool inside the cleanroom
Trainer: Kenlin Huang
RIE-09 Anatech Barrel Plasma system and RIE-14 tool training
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 3:30 pm 617-495-1738	5	1	Register!

Training: RIE-12 - Matrix Plasma Asher - In front of the tool, inside the G7 cleanroom.
Trainer: Kenlin Huang
RIE-12 - Matrix Plasma Asher
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
4:30 pm - 5:00 pm 617-495-1738	4	FULL	Registration Closed