All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page


(Important information - please read)
 
  • Open Events
  • CNS Users Only
  • LISE Cleanroom Users Only
  • Month
Date TBD - you can pre-register for this training session.
CNS staff will notify you when a date has been set.
Training: CNS Safety Training - Zoom
Trainer: Jim Reynolds
This training is required as part of the CNS User enrollment process (step 3 for HU Users, step 7 for non-HU Users).

How to sign-up for a CNS Safety Training:
The CNS Safety Training is currently held as a virtual event via Zoom on Wednesday mornings from 10:00 to 11:15. To attend an upcoming session, please send an email to: infoATcns.fas.harvard.edu (replace the word AT with the @ symbol) with the subject line: CNS Safety Training and include the date of the session you wish to attend in the body of the email. Please note that the cutoff for that weeks training signup is 2pm on the day before the training. Zoom link for the training will be sent by 5pm the afternoon before the training.
 
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs). This includes SEM-8, SEM-12, SEM-13, and SEM-14. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001

PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW

Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
 
Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.

Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421

Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.

Any CNS User with a HU Key is eligible to take this training
 
Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100, JEOL F200 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142

Any CNS User with a HU Key is eligible to take this training.
 
Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope, including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Electronic Characterization Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Keithley 4200A and Signatone probe station for electronic device characterization. Capacitor, resistor, transistor, and photovoltaic measurements, among others, are available. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Raman Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba LabRAM Soleil Raman microscope. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery HR 20 Rheometer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - Tensiometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.
 
Training: SEC - UV-Vis/Fluorescence Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba Duetta UV-vis absorbance/fluorescence (photoluminescence) spectrometer. Email colella@fas.harvard.edu to schedule.
 
Wednesday, April 24th, 2024
Training: CVD-14 Oxford ICP-CVD - Low Temp - CNS cleanroom - Dry processing bay at CVD-14
Trainer: Mughees Khan
Introduction to Thin Film Growth and Processing is required before you can sign up for training. This training will enable users to grow high quality SiO2, SiNx, and a-Si films. No doping or active cooling is available on this tool. All baseline processes are at 80C with the exception of a-Si, which runs at 200C. Full temperature range is from -20C to 400C.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
11:00 am - 12:30 pm
Prerequisite: Introduction to Thin Film Growth and Processing
3FULLRegister!
 
Training: CVD-3 STS PECVD - CNS Cleanroom - Dry processing bay
Trainer: Mughees Khan
This training will provide users the necessary protocol to deposit high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. a-Si films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:00 am - 11:00 am
Prerequisite: Introduction to Thin Film Growth and Processing
3FULLRegister!
 
Training: Heidelberg Maskless Aligners - LISE G07 Nanofabrication Cleanroom (Metrology Bay)
Trainer: Guixiong Zhong
This training covers the OL-10, OL-11, and OL-12 maskless aligners. The followings are the prerequisites for the training:

- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
- SC-5 Headway Spinner & VPO-1 HMDS Primer Oven (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
12:30 pm - 2:30 pm
42Register!
 
Training: OL-4 SUSS MA6 Mask Aligner - G07, Inside Cleanroom at the tool
Trainer: Bok Yeop Ahn
This is a training session for MA6 Mask Aligner in the cleanroom at CNS. As listed below, there are several prerequisites that you must finish before getting to MA6 mask aligner training.

- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)
- SC-5 Headway Spinner & VPO-1 HMDS Primer Oven (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)

Training location is inside the cleanroom.
Let's meet at the tool (OL-4 Mask aligner).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
33Register!
 
Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool, inside G07 cleanroom.
Trainer: Kenlin Huang
RIE-13 - Oxford PlasmaPro 100 Cobra 300
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
3:00 pm - 4:00 pm
617-495-1738
41Register!
 
Training: SC-5 Headway Spinner & VPO-1 HMDS Primer Oven - G07, Inside Cleanroom
Trainer: Bok Yeop Ahn
This training session covers the standard operation procedure (SOP) for spin coaters in the cleanroom at CNS. As listed below, there are several prerequisites. Please complete the prerequisite trainings before coming to the spin coater training.

- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu)
- Wet bench and Chemical Safety Training (Mac Hathaway: hathaway@cns.fas.harvard.edu)

Note, the training location is inside the cleanroom.
Let's meet at the first wet-bench you see in the cleanroom.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:00 pm
3FULLRegister!
 
Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements.
TimeMax AttendeesAvailableCNS Users ONLY
4:00 pm - 5:00 pm
21Register!
 
Training: WB-2 EVG 501 Wafer Bonder - G07, Inside Cleanroom
Trainer: Bok Yeop Ahn
This training covers the standard operation procedure for the WB-2 EVG 501 Wafer Bonder. Users will learn wafer bonding techniques:

1) Direct
2) Thermo-Compression
3) Adhesive

** Users may need Wet Bench/Acid/RCA Training

Training location is inside the cleanroom.
Let's meet at the tool.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:30 am
33Register!
 
Training: Wetbench and Chemical Safety Training - Outside Cleanroom, in CNS Training Area
Trainer: Mac Hathaway
Chemical Safety and Wetbench Operations, with an emphasis on Situational Awareness, and how to Live a Good Life.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 12:30 pm
104Register!
 
Thursday, April 25th, 2024
Training: 2D-Stacker-01 training - G-27
Trainer: Danial Haei
This training covers the the general operation of 2D-Stacker-01. Standard PC stacking process will be covered. Users are expected to bring their own stamp as described in SOP.
TimeMax AttendeesAvailableCNS Users ONLY
9:00 am - 10:00 am
Please email danial_haie@fas.harvard.edu to schedule training
1FULLRegister!
 
Training: ALD-2 GEMStar ALD Training - Wet Processing Bay - CNS cleanroom
Trainer: Mughees Khan
This training introduces users protocols needed to operate ALD-2. This system is primarily used for depositing conducting metal nitride and potentially pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 � per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable. Currently, only WNx is available. In addition, Al2O3 can also be deposited on this tool.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
9:00 am - 10:00 am
Prerequisite: Introduction to Thin Film Growth and Processing
22Register!
 
Training: B15A In Person Sample Prep Training - Grey couches outside of lab - Basement of the LISE Building
Trainer: Cathleen Hallinan
The B15A Sample Prep lab training will cover basic safety measures within the B15A space as well as protocols, policies and relevant resources of the space. Trainings will be conducted by the lab safety officer, Cathleen Hallinan. If you have any questions or concerns please reach out to Cathleen via email at cathleen_hallinan@fas.harvard.edu

TimeMax AttendeesAvailableCNS Users ONLY
11:30 am - 12:30 pm
1010Register!
 
Training: CNS Cleanroom orientation - meet in front of G07
Trainer: John Tsakirgis
To get familiar with CNS protocols and safety
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:00 am
please be prompt
1010Register!
 
Training: SP-3 AJA sputtering system training for 3-gun system - CNS cleanroom (G-07) Dry Bay
Trainer: Ed Macomber
Please read the training description all the way through.
If you need to deposit a film thicker than 500nm, please contact the staff before signing up.
This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources).The substrate holder can accommodate up to a 4” diameter wafer. SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:00 pm
(check document links in confirmation email)
31Register!
 
Training: Zeiss Gemini 360 New User Training - LISE B15i
Trainer: Tim Cavanaugh
This is a training session on the Zeiss Gemini 360 FESEM for users who have not previously used Zeiss SEM tools at CNS. The Gemini 360 offers high resolution secondary and backscatter imaging at high vacuum, as well as low vacuum capability. This will be an in depth training session covering all aspects of the hardware and software and the entire imaging process. Please attend this training for access to SEM-13 and/or SEM-14. Users should complete the pre-requisite Part 1 Online training prior to registering for this event.
TimeMax AttendeesAvailableCNS Users ONLY
1:00 pm - 4:00 pm
42Register!
 
Tuesday, April 30th, 2024
Training: Disco DAD-3221 Automatic Dicing Saw Training Part 1-Basic Operation - LISE G07
Trainer: Jason Tresback
This training event will cover the basic operation of the Disco DAD-3221 Automatic Dicing Saw (SW-5). The tool uses a rotating, ultra-thin (200 um Thick) diamond/resin composite blade, in a wet environment to cut materials such as silicon wafers, non-toxic semiconductors, glass sheets, quartz, and ceramics, etc. Your sample should be coating with a protective layer, such as photo resist to protect it from the cutting water. Full tool access will require attending part 1-Basic operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a user qualification on another day AND LISE G06 Room Orientation will be covered during part-1
TimeMax AttendeesAvailableCNS Users ONLY
11:00 am - 12:00 pm
32Register!
 
Training: FIB-4 Helios Basic Training - B15-F
Trainer: Stephan Kraemer
Introduction to basic workflow on the Helios FIB (Cross section analysis including high-resolution imaging in immersion mode).
TimeMax AttendeesAvailableCNS Users ONLY
9:00 am - 1:00 pm
Prior SEM knowledge recommended but not necessary
43Register!
 
Training: Introduction to Dry Etching - Online, Zoom ID 990 9681 5765, passcode 315648
Trainer: Ling Xie
In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include:
i) What is the plasma used in dry etching processes?
ii) Chemical etching,
iii) Physical etching,
iv) Etch profile control, and
v) Dry etch technologies and capabilities in CNS Cleanroom.

This introduction class is pre-required for taking trainings on any CNS dry etching systems.

At current time, the class is offered online with Zoom: ID 990 9681 5765, passcode 315648.
TimeMax AttendeesAvailableCNS Users ONLY
11:00 am - 12:00 pm
1413Register!
 
Training: NF-Training Litho. Intro. - Online by Zoom
Trainer: Bok Yeop Ahn
This is an online training Introduction to Lithography at CNS, covering basics of photolithography, e-beam lithography, and 3D laser lithography. Users are encouraged to take this class before taking any other photo- or e-beam lithography trainings. As listed below, there are two prerequisites that you must finish before registering to this training session:

- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)

Bok is inviting you to a scheduled Zoom meeting.

Topic: Introduction to Lithography
Time: Apr 30, 2024 10:30 AM Eastern Time (US and Canada)

Join Zoom meeting
https://harvard.zoom.us/j/92449804037?pwd=eWpJUHZSZVozR0sxVWhIZXp0dVM0QT09

Meeting ID: 924 4980 4037
Password: 623312
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:30 am - 11:30 am
2017Register!
 
Training: Office Hours -
Trainer: Mughees Khan
Nanofab process development related discussion hour
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
10:00 am - 11:00 am
22Register!
 
Training: RIE 8 STS ICP RIE - CNS Cleanroom
Trainer: Ling Xie
It is required to take the "Introduction to Dry Etching" before this training.

The RIE 8 is used to etch silicon, silicon oxide, silicon nitride, silicon carbide, and 2D materials.
Chamber Pre-Cleaning and Conditioning are Required: Before etching any samples, users must run the �O2-Clean� recipe for 20 minutes and the recipe to be used for 5-10 minutes.

The STS MPX/LPX RIE system is an Inductively Coupled Plasma (ICP) etching system. Using the ICP technology, this RIE is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Available etching gases on this system include SF6, C4F8, O2, H2, Ar, Cl2, BCl3, and HBr. The maximum coil and platen powers are 1200W and 250W, respectively. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15�C to 30�C.
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
1:00 pm - 2:30 pm
43Register!
 
Training: SEM-10, Hitachi SU8230 SEM - G07, Inside Cleanroom
Trainer: Bok Yeop Ahn
This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. As listed below, there are several prerequisites that you must complete before coming to this SEM-10 training session.

- LISE Safety Training (John Sweeney: john_sweeney@harvard.edu)
- CNS Cleanroom Access Orientation (John Tsakirgis: johntsakirgis@cns.fas.harvard.edu)
- CNS Online SEM Training Module (Online course) https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486

Training location is inside the cleanroom.
Let's meet at the tool (SEM-10).
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
33Register!
 
Training: Thermo Scientific XPS Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
One Training Prerequisite
TimeMax AttendeesAvailableCNS Users ONLY
9:30 am - 11:30 am
43Register!
 
Training: Woollam RC2 Spectroscopic Ellipsometer Training (ES-4) - Inside LISE G07 Nanofabrication CLeanroom
Trainer: Jason Tresback
This training event will cover the basic operation of RC2 spectroscopic ellipsometer including sample mounting, auto-alignment, model selection/development, and mapping using small spot size (125um) with wavelength range of 200-2500nm. Wafer mapping will also be covered. We will meet inside the Nanofabrication cleanroom along the windows
TimeMax AttendeesAvailableLISE Cleanroom Users ONLY
2:00 pm - 3:00 pm
33Register!
 
Training: Zeiss Gemini 560 SEM Training - LISE B15i
Trainer: Tim Cavanaugh
This is a training session on the Zeiss Gemini 560 FESEM for users who have not previously used Zeiss SEM tools at CNS. The Gemini 560 offers the capability for ultra high resolution imaging at low beam energy. This will be an in-depth training session covering all aspects of the hardware and software and the entire imaging process. Please attend this training for access to SEM-13 and/or SEM-14. Users should complete the pre-requisite Part 1 Online training prior to registering for this event.
TimeMax AttendeesAvailableCNS Users ONLY
10:00 am - 1:00 pm
42Register!
 

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