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| Training: Zeiss SEM Part 1: Online training - Harvard Training Portal | | Trainer: Tim Cavanaugh | The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001
PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW
Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
| | | | Training: B15A online safety training - Harvard Training Portal | | Trainer: Jules Gardener | CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/app/shared;spf-url=common%2Fledetail%2Fcours000000000008101
Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time.
Please note that only nominated and approved CNS Imaging Expert Users are eligible to gain access to this facility at this time. Any CNS User with a HU Key is eligible to take this training, but currently only designated Expert Users will gain access. Non-expert Users are still welcome to take this training, but access will not occur until CNS returns to normal operation. Any questions regarding the Covid-era Expert User program should be sent to: info@cns.fas.harvard.edu | | | | Training: HAR-053 sputter coater training (online) - Harvard Training Portal | | Trainer: Jules Gardener | This training is for the EMS sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. These coaters cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available.
Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421
Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer.
Please note that only nominated and approved CNS Imaging Expert Users are eligible to gain access to this facility at this time. Any CNS User with a HU Key is eligible to take this training, but currently only designated Expert Users will gain access. Non-expert Users are still welcome to take this training, but access will not occur until CNS returns to normal operation. Any questions regarding the Covid-era Expert User program should be sent to: info@cns.fas.harvard.edu | | | | Training: Online TEM training course - Harvard Training Portal | | Trainer: Jules Gardener | This is a new online training which is required as the first step of TEM training for the JEOL 2100 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link:
https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142
Please note that only nominated and approved CNS Imaging Expert Users are eligible to gain access to this facility at this time. Any CNS User with a HU Key is eligible to take this training, but currently only designated Expert Users will gain access. Non-expert Users are still welcome to take this training, but access will not occur until CNS returns to normal operation. Any questions regarding the Covid-era Expert User program should be sent to: info@cns.fas.harvard.edu | | |
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| Training: Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (last bay inside of LISE G07) | | Trainer: Ed Macomber | | E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). All materials are user supplied for EE-3 (pellets and crucible liners). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~2 hr for this training. This is a manually operated deposition system and will likely take most users a few times using it to become comfortable with the machine. We meet in the cleanroom PVD bay (last bay inside LISE G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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12:00 pm - 1:30 pm
(Please review document links in email confirmation) | 3 | 2 | Register! | | |
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| Training: AS200 i-line Stepper - Photolithography bay in the clean room | | Trainer: Guixiong Zhong | | Basic training For the AS200 i-line Stepper. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
| 3 | 2 | Register! | | | | Training: Introduction to Dry Etching - Online | | Trainer: Ling Xie | In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include:
1. Overview of Dry Etch Methods,
2. Plasma Used in Dry Etch Processes
3. Reactive Ion Etch
i) Chemical reactions
ii) Physical ion bombardments
iii) Combination of chemical reactions & physical ion bombardments
iv) Etch direction control
4. Ion Beam Etch
5. Dry Etch Technologies & Capabilities at CNS
6. Open Discussions
This introduction class is pre-required for taking trainings on any CNS dry etching tools. It is offered online: Zoom ID 990 9681 5765, passcode 315648. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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11:00 am - 12:00 pm
| 12 | 6 | Register! | | | | Training: Introduction to Lithography at CNS - On Zoom | | Trainer: Guixiong Zhong | This class introduces the lithography capabilities at CNS, covers some basics for photolithography and e-beam lithography, and helps users to choose the proper tools for their projects. Users are encouraged to take this class before any other photo or e-beam lithography trainings.
The class is offered online with Zoom Meeting ID: 991 7252 0210 Password: 021981. | | Time | Max Attendees | Available | CNS Users ONLY |
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12:00 pm - 1:00 pm
| 10 | 9 | Register! | | | | Training: Introduction to Metrology for Nanofabrication Lecture - LISE G07 Hallway | | Trainer: Jason Tresback | | This lecture is an informal discussion about the measurement tools and techniques available inside the nanofabrication cleanroom G07. The introduction serves as a guide for selecting tools offered during metrology for nanofabrication part 1 & 2 training events. Please email jtresback@cns.fas.harvard.edu if you have any questions | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:00 pm
| 4 | 3 | Register! | | | | Training: Magritek NMR Training - SEC LL2.226 | | Trainer: Nicholas Colella | | Training for the Magritek 80 MHz NMR spectrometer in the SEC | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:00 pm
| 2 | FULL | Registration Closed | | | | Training: Spinner training - Poto Bay | | Trainer: Malcolm Tse | | The training covers the use and programming of the spinner. This training is required for all lithography processes (EBL, MLA150, uPG501, mask aligners, etc). | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:00 am
| 2 | FULL | Registration Closed | | |
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| Training: Cypher S/ES and MFP3d BiO Atomic Force Microscopy (AFM) Training Part-1 (SPM-2 & 6) - LISE B58 | | Trainer: Jason Tresback | | This training event will focus on the basic imaging and operation of the Cypher S/ES and MFP3D BiO AFM’s available at CNS (SPM- 2 and 6). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. Please register for each event and meet in hallway outside LISE B58 | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 2:30 pm
| 3 | 2 | Register! | | | | Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), multi-wavelength scanning Ellipsometer (FS-150XY) (ES-3), sheet resistance Rs mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:00 pm
| 3 | 2 | Register! | | | | Training: Micro-CT Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | Training on our Nikon Micro-CT system (XRA-002) | | Time | Max Attendees | Available | CNS Users ONLY |
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8:30 am - 10:30 am
| 2 | FULL | Registration Closed | | | | Training: MLA150 Maskless Aligner - Metrology bay in the cleanroom | | Trainer: Guixiong Zhong | | Basic training to use the MLA150 Maskless Aligner. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
| 3 | FULL | Registration Closed | | | | Training: RIE 10 SPTS Rapier DRIE System - The first hour training is held outside the cleanroom and the rest of time is inside the cleanroom | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
The SPTS Rapier system is for deep silicon etch only, it is configured with dual plasma sources, dual gas inlets, electro-static clamping chuck, AMS chiller to control the chuck temperature from -15°C to + 40°C, and Claritas end-point detector.
Specifications
• Etch rate: 1.0 – 10 µm/min
• Aspect ratio: 5 – 50
• Etch depth: 5µm – several hundreds of microns
• Feature size: nm – mm scales in lateral dimension
• Sider wall roughness (scallop depth): 6nm – 700nm
• Sample size ≤ 6”
• Etch mask: only resists and SiO2 allowed
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 4:00 pm
The first hour training is online, Zoom ID 990 9681 5765, passcode 315648. | 2 | FULL | Registration Closed | | | | Training: SEC-LL2.301 IMAGING TRAINING - Imaging Suite Safety Training - SEC 150 Western AVE Allston Meet on couches in Atrium LL2 | | Trainer: Adam Graham | | We will show you the new lab space and go over the safety features and general rules of the room. Access will be granted after completion of this training. Access to equipment will require additional training. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 10:30 am
meet at Atrium of LL2 by couches | 10 | 6 | Register! | | |
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| Training: RIE-9 - Anatech Barrel Plasma System - In front of the tool, inside the G7 cleanroom. | | Trainer: Kenlin Huang | | RIE-9 - Anatech Barrel Plasma System | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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4:00 pm - 4:30 pm
617-495-1738 | 2 | 1 | Register! | | | | Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool, inside the G7 cleanroom. | | Trainer: Kenlin Huang | RIE-13 - Oxford PlasmaPro 100 Cobra 300
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
617-495-1738 | 2 | FULL | Registration Closed | | | | Training: SEC LL2.301 Imaging and Analysis Safety and room orientation - SEC 150 Western AVE Allston Meet on couches in Atrium LL2 | | Trainer: Adam Graham | | We will show you the new lab space and go over the safety features and general rules of the room. Access will be granted after completion of this training. Access to equipment will require additional training. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 10:30 am
meet at Atrium of LL2 by couches | 10 | 8 | Register! | | | | Training: XeF2 Etcher training - CNS Cleanroom | | Trainer: Ling Xie | | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:30 pm - 4:30 pm
| 2 | FULL | Registration Closed | | |
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| Training: AJA SP-2 Sputtering System Training - LISE G07 (CNS Cleanroom) | | Trainer: Ed Macomber | The SP-2 system is a 6-gun magnetron sputtering machine with (3) RF guns and (3) DC guns to cover a range of metals, semi-conductors, and dielectric materials, including Au, Pt, and magnetics. Sputtering materials are loaded into the system every other week on an "as-requested" basis. This means you may wait up to four weeks (or more) for your material depending on system demand at the time. Substrate pre-cleaning, heating, co-sputtering, and reactive sputtering are all available on this system.
Look in the confirmation email for important attachments including the S.O.P.
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:30 pm
Check the links in the confirmation email | 2 | 1 | Register! | | |
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| Training: Introduction to Metrology for Nanofabrication Lecture - LISE G07 Hallway | | Trainer: Jason Tresback | | This lecture is an informal discussion about the measurement tools and techniques available inside the nanofabrication cleanroom G07. The introduction serves as a guide for selecting tools offered during metrology for nanofabrication part 1 & 2 training events. Please email jtresback@cns.fas.harvard.edu if you have any questions | | Time | Max Attendees | Available | CNS Users ONLY |
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1:30 pm - 3:00 pm
| 4 | 3 | Register! | | | | Training: Introduction to Thin Film Processes - Outside Cleanroom (at the CNS Pedagogical Area!) | | Trainer: Mac Hathaway | All About Thin Films, with an emphasis on Practical Uses and Important Process Variables
Prerequisite for ALL Thin Film Equipment training | | Time | Max Attendees | Available | CNS Users ONLY |
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10:30 am - 12:00 pm
| 10 | 9 | Register! | | | | Training: LPCVD and APCVD Training (CVD 5,6,7,9,10,11) - Dry Processing Bay in cleanroom | | Trainer: Mughees Khan | Introduction to Thin Film Growth and Processing is required before you can sign up for this training.
This is a general training for all of the LPCVD and APCVD furnaces. These Tystar furnaces can accommodate anything from a single 1cm substrate up to two full cassettes (50) of 6" wafers.
The various furnaces encompass the following processes:
- Anneals of non-metal containing samples from 250 to 1100C under O2, N2, and H2/He
- Anneals of metal containing samples from 250 to 1100C under N2 and H2/He
- Low stress and stoichiometric silicon nitride
- Amorphous and polycrystalline silicon (doped with P or B or undoped)
- SiO2 from TEOS (conformal, additive SiO2 process)
- SiO2 from oxidation of silicon using H2O or O2
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:00 am - 12:00 pm
Prerequisite: Introduction to Thin Film Growth and Processing | 2 | 1 | Register! | | | | Training: Orientation of CNS Nanofabrication Facility - Please meet in front of Cleanroom G07 This is located on G level of LISE BLDG | | Trainer: John Tsakirgis | | To have an understanding of our Safety and Cleanroom protocols | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:00 am
Please be prompt | 5 | FULL | Registration Closed | | | | Training: RIE 8 STS ICP Etch System Training - CNS Cleanroom, Dry Process Bay | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
The RIE 8 is used to etch silicon, silicon oxide, silicon nitride, silicon carbide, and 2D materials.
Chamber Pre-Cleaning and Conditioning are Required: Before etching any samples, users must run the “O2-Clean” recipe for 20 minutes and the recipe to be used for 5-10 minutes.
The STS MPX/LPX RIE system is an Inductively Coupled Plasma (ICP) etching system. Using the ICP technology, this RIE is characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Available etching gases on this system include SF6, C4F8, O2, H2, Ar, Cl2, BCl3, and HBr. The maximum coil and platen powers are 1200W and 250W, respectively. Equipped with a chiller, the MPX/LPX system allows the substrate temperature to be controlled from 15°C to 30°C.
| | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:30 pm
| 2 | FULL | Registration Closed | | | | Training: Sharon TE-3, 4, and 5 Thermal Evaporator Training - LISE G07 (CNS Cleanroom), PVD Bay | | Trainer: Ed Macomber | | Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, Ni, etc. Check the links in the confirmation email for important attachments including the S.O.P. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
(Please review document links in email confirmation) | 3 | 1 | Register! | | | | Training: Spinner training - Poto Bay | | Trainer: Malcolm Tse | | The training covers the use and programming of the spinner. This training is required for all lithography processes (EBL, MLA150, uPG501, mask aligners, etc). | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:00 am
| 2 | 1 | Register! | | | | Training: Thermo Scientific K-Alpha+ XPS Training - LISE G27 | | Trainer: Hao-Yu (Greg) Lin | | | Time | Max Attendees | Available | CNS Users ONLY |
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9:30 am - 11:30 am
| 2 | FULL | Registration Closed | | |
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| Training: CVD-14 Oxford ICP-CVD - Low Temp - CNS cleanroom - Dry processing bay at CVD-14 | | Trainer: Mughees Khan | | Introduction to Thin Film Growth and Processing is required before you can sign up for training. This training will enable users to grow high quality SiO2, SiNx, and a-Si films. No doping or active cooling is available on this tool. All baseline processes are at 80C with the exception of a-Si, which runs at 200C. Full temperature range is from -20C to 400C. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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11:00 am - 12:30 pm
Prerequisite: Introduction to Thin Film Growth and Processing | 3 | FULL | Registration Closed | | | | Training: CVD-3 – STS PECVD - CNS Cleanroom - Dry processing bay | | Trainer: Mughees Khan | This training will provide users with the tools necessary to grow high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. a-Si films can also be doped with B or P.
This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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9:30 am - 11:00 am
prerequisite: Introduction to Thin Film Growth and Processing | 3 | FULL | Registration Closed | | | | Training: DOE-1 - ULVAC Deep Oxide Etcher - In front of the tool, inside the G7 cleanroom. | | Trainer: Kenlin Huang | | DOE-1 - ULVAC Deep Oxide Etcher | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
617-495-1738 | 2 | FULL | Registration Closed | | | | Training: Jupiter XR Atomic Force Microscopy (AFM) Training Part-1 (SPM-12) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | This training event will focus on the basic imaging and operation of the Jupiter XR AFM available inside the Nanofabrication Cleanroom (SPM-12). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. SPM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
| 2 | 2 | Register! | | | | Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07 Nanofabrication Cleanroom | | Trainer: Jason Tresback | | This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), multi-wavelength scanning Ellipsometer (FS-150XY) (ES-3), sheet resistance Rs mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07). | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:30 am - 12:00 pm
| 3 | 2 | Register! | | | | Training: MLA150 Maskless Aligner - Metrology bay in the cleanroom | | Trainer: Guixiong Zhong | | Basic training to use the MLA150 Maskless Aligner. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:00 pm
| 3 | 2 | Register! | | | | Training: Optical Profilometer Training (PL-6) - | | Trainer: Jason Tresback | | This training event basic operation of the Optical Profiler (CCI HD) (PL-6) which uses white light interferometry (WLI) to measure roughness, step-heights, and topography with sub-nm vertical resolution and 1um lateral resolution. This is a rapid, non-contact, and non-destructive technique to analyze small areas (80x80 um) and large areas (100x100 mm). Limitations include thin, transparent films and dissimilar materials. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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2:00 pm - 3:00 pm
| 2 | 1 | Register! | | | | Training: RIE 11 Plasma-Therm Versaline Diamond Etcher - CNS Cleanroom, Wet Process Bay | | Trainer: Ling Xie | It is required to take the "Introduction to Dry Etching" before this training.
RIE 11 is used for diamond etch only!
The Versaline RIE is an Inductive Coupled Plasma Etching System with a maximum ICP source power of 1,200W and a maximum substrate bias power of 600W. The system is configured to handle 4” wafers and equipped with mechanical clamping and backside helium heat-conducting features. Its substrate temperature can be controlled from 10°C to180°C. In addition, temperatures of three other components inside the chamber can also be controlled from room temperature to 120°C, including Lid, Ceramic Spool, and Metal Liner. Setting these components at elevated temperatures before processing will reduce by-product coating speed on chamber walls and stabilize chamber conditions for the first couple of runs after the tool was at a stand-by state for a long time. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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1:00 pm - 2:30 pm
| 2 | 2 | Register! | | | | Training: RIE-7 - Unaxis Shuttleline ICP RIE - In front of the tool, inside the G7 cleanroom. | | Trainer: Kenlin Huang | | RIE-7 - Unaxis Shuttleline ICP RIE | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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3:00 pm - 4:00 pm
617-495-1738 | 2 | 1 | Register! | | | | Training: SEC-LL2.301 IMAGING TRAINING - Imaging Suite Safety Training - SEC 150 Western AVE Allston Meet on couches in Atrium LL2 | | Trainer: Adam Graham | | We will show you the new lab space and go over the safety features and general rules of the room. Access will be granted after completion of this training. Access to equipment will require additional training. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 10:30 am
meet at Atrium of LL2 by couches | 10 | 10 | Register! | | | | Training: Wetbench and Chemical Safety Training Part I and II (IN PERSON!!) - Outside Cleanroom (at the CNS Pedagogical Area!) | | Trainer: Mac Hathaway | | Training for Wetbenches and Chemical Safety. Prerequisite for all photolithography training. | | Time | Max Attendees | Available | LISE Cleanroom Users ONLY |
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10:00 am - 12:30 pm
| 10 | 9 | Register! | | | | Training: Wire Bonder Training - LISE G27, meet in front of the iris scan. | | Trainer: Guixiong Zhong | | Basic training for the wire bonder. The bonder is configured to bond Al wire to gold pad. | | Time | Max Attendees | Available | CNS Users ONLY |
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2:00 pm - 3:00 pm
| 3 | FULL | Registration Closed | | |
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| Training: SEC LL2.301 Imaging and Analysis Safety and room orientation - SEC 150 Western AVE Allston Meet on couches in Atrium LL2 | | Trainer: Adam Graham | | We will show you the new lab space and go over the safety features and general rules of the room. Access will be granted after completion of this training. Access to equipment will require additional training. | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 10:30 am
meet at Atrium of LL2 by couches | 10 | 10 | Register! | | | | Training: SMCR orientation - meet outside G07 | | Trainer: Sandra Nakasone | | | Time | Max Attendees | Available | CNS Users ONLY |
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10:00 am - 11:30 am
| 3 | 2 | Register! | | |
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