CNS Training Events - Registration Page

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs) or the EVO SEM. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: B15A online safety training - Harvard Training Portal
Trainer: Jules Gardener
CNS users who wish to use the instruments inside room B15A must complete the B15A safety training before gaining access to this room. The LISE B15A room safety training is available in an online format from https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013222 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. You must pass this online training before room access can be granted. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.

Training: Sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the HAR-050 EMS dual head and HAR-053 EMS single head sputter coaters located in the CNS Imaging sample preparation room (LISE B15A). These tools are optimized for coating SEM samples with a thin conductive layer. The HAR-050 is equipped with Pt/Pd and Au targets, although Cr is available as an adhesion layer upon request. The HAR-053 is for Pt/Pd deposition only. We cannot accommodate other metal targets in this sputter coater, and this instrument is not suitable for depositing thick films. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (also available online), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to both sputter coaters. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/FAS-00013226 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Please note that our online trainings can only be taken by CNS users who have a Harvard Key. If you are an external user and do not yet have a Harvard Key, please contact info@cns.fas.harvard.edu for information on how to get one.

Training: TEM Training Part 1: Online training - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100 and FEI F20 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or FEI F20 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Time	Max Attendees	Available	CNS Users ONLY
Monday, September 24th, 2018
Training: FIB Helios - Basics - LISE B15 F
Trainer: Stephan Kraemer
Users will be introduced to the basic handling of the instrument and its capabilities. A brief introduction into the underlying interaction of the ion beam with the material is given. At the end of the session users will be able to run a basic cross section analysis. Specific topics are: bringing sample to eucentric height, electron and ion beam alignment, deposition of protection layers, preparation and cleaning of cross sections, recording of high-resolution SEM images. These form the basis for more advanced tasks such as TEM sample preparation or serial section 3D analysis.
1:00 pm - 5:00 pm Prior SEM experience recommended.	4	4	Register!

Training: LISE G05 Biomaterials Room Safety Orientation - Outside G05
Trainer: Sandra Nakasone
This safety orientation is mandatory for access to our biomaterials and cell culture BL2 laboratory (LISE G05). In order to gain access users must complete this safety orientation and at least one training for equipment inside G05. Long pants and closed toe shoes required! This training will provide the safety information, room orientation and basic guidelines for working in the Biological Materials Facility. This space houses our cell culture biohoods, incubators, plate reader, DLS system, Ultramicrotome, and fluorescence microscope.
Time	Max Attendees	Available	CNS Users ONLY
10:30 am - 11:00 am	6	2	Register!

Training: LISE G06 Chemical Nanotechnology Room Orientation - Outside G06
Trainer: Sandra Nakasone
This safety orientation is mandatory for access to our chemical nanotechnology room (LISE G06). In order to gain access users must complete this safety orientation and at least one training for equipment inside G06. Long pants and closed toe shoes required! This space houses Helix laser cutter, 3D printers, nanotechnology tools (sonicator, ball mill, weighing balances), Chemical process tools (acid & solvent benches), Disco wafer dicing saw, Stylus profiler and lithography tools (PDMS, mixer, spincoater, degassing chamber, oven).
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 11:30 am	6	FULL	Registration Closed

Training: Plasma O2 stripper : RIE 09 and RIE 05 - In front of the tool , inside cleanroom.
Trainer: Kenlin Huang
Dry etching Intro Class is the prerequisite for taking training class of Plasma O2 stripper : RIE 09 and RIE 05 at 03:30 pm
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:30 pm - 4:00 pm kenlnhuang@cns.fas.harvard.edu,617-495-1738	4	FULL	Registration Closed

Training: SP-3 AJA sputtering system training for 3-gun system - In the cleanroom, next to the tool
Trainer: Christine Yi-Ju Wang
Prerequisite: "Introduction to Thin Film Growth and Processing" The system has one RF source and two DC sources (DC power supply is switchable between the two sources). SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with 1 RF and 1 DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	2	FULL	Registration Closed

Time	Max Attendees	Available	CNS Users ONLY
Tuesday, September 25th, 2018
Training: Introduction to Metrology for Nanofabrication Lecture - LISE G07 Hallway
Trainer: Jason Tresback
This lecture is an informal discussion about the measurement tools and techniques available inside the nanofabrication cleanroom G07. The introduction serves as a pre-requisite for metrology for nanofabrication part 1 & 2 training events, however, metrology part-1 is not required to attend part-2. Please email jtresback@cns.fas.harvard.edu if you have any questions
3:00 pm - 4:00 pm	6	3	Register!

Training: Cleanroom Orientation - Meet in front of G07
Trainer: John Tsakirgis
To understand our protocols and complete registration.
Time	Max Attendees	Available	Open Event!
1:00 pm - 2:30 pm Please be prompt	10	2	Register!

Training: CVD-3 makeup Training - cleanroom dry processing bay
Trainer: Philippe de Rouffignac
General CVD-3 training for those that were registered for last week's cancelled training session.
Time	Max Attendees	Available	CNS Users ONLY
12:30 pm - 1:30 pm	5	2	Register!

Training: Cypher General Training Part-1 - LISE G12
Trainer: Jason Tresback
Asylum Cypher general training part-1 demonstration
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 12:00 pm	4	FULL	Registration Closed

Training: DOE01-ULVAC Deep Oxide Etcher Training - in front of the tool ,inside the G7 cleanroom
Trainer: Kenlin Huang
Dry etching Intro Class is the prerequisite for taking DOE01-ULVAC Deep Oxide Etcher Training 10:30 t0 11:30 am Tuesday
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:30 am kenlinhuang@cns.fas.harvard.edu, 617-495-1738	4	FULL	Registration Closed

Training: Form2 SLA 3D Printer Training - G06
Trainer: Sandra Nakasone
Pre-requisite: LISE G06 Room Safety Orientation Build volume: 5.7” x 5.7” x 6.9” (145 x 145 x 175 mm) Layer thickness: 25 – 100 microns Laser spot size: 140 microns Laser power: 250mW Material/color: Clear Resin
Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 3:30 pm	3	1	Register!

Training: Helix 75W Laser Cutter NEW USERS - G06
Trainer: Sandra Nakasone
This training is for new users. No experience necessary. Requirement: Complete the “Enclosed Laser Instruments Safety” Online training https://www.ehs.harvard.edu/training Send me the Certificate of Completion via email (snakasone@cns.fas.harvard.edu) Laser Power: 75W Working Surface area: 24" x 18" x 8.5" (610 x 457 x 215.9 mm) Spot size: 0.003" - 0.005" (0.0762 - 0.127 mm) Wavelength: 10.6 microns Accuracy: +/- .01" (0.254 mm) over the entire table
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:00 pm	4	2	Register!

Training: Horiba LabRam Raman and PL - LISE G04
Trainer: Arthur McClelland
Learn to use the Horiba LabRam system with 532 and 633 nm excitation lines for Raman and PL spectroscopy and mapping. Full polarization control and cryostat options available.
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	3	2	Register!

Training: Introduction to Dry Etching - LISE room 311
Trainer: Ling Xie
This class teaches basic working principles of dry etching technologies, especially focusing on reactive ion etch (RIE) and ion beam etching (IBE). Dry etching capabilities at CNS Cleanroom will be introduced and etching system selection for your etching project will be discussed.
Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 4:00 pm	6	FULL	Registration Closed

Training: Introduction to TEM using the JEOL 2100 part 2 - B15C
Trainer: Adam Graham
In this hands on training you will learn to use the JEOL 2100. This will include start up, alignment, imaging, and shut down procedures. access will be granted after completion of online course, tool training and successful completion of a certification.
Time	Max Attendees	Available	CNS Users ONLY
9:00 am - 3:30 pm Prerequisite online TEM training	4	3	Register!

Training: Introduction to Thin Film Deposition Processes - Training area, outside CNS G-07 Cleanroom
Trainer: Mac Hathaway
Introduction to Thin Film Deposition processes and techniques, with an emphasis on process control and overall integration into your process flow. This is a PREREQUISITE for all deposition process training.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 11:30 am	10	5	Register!

Training: MakerBot 3D Printer Training - G06
Trainer: Sandra Nakasone
Pre-requisite: LISE G06 Room Safety Orientation Build volume: 11.6” x 7.6” x 6.5” (29.5 x 19.5 x 16.5 cm) Layer thickness: 100 – 300 microns Material/color: Black PLA filament
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:00 pm	3	2	Register!

Training: RIE-7 - Unaxis Shuttleline ICP RIE - in front of the tool inside clearoom.
Trainer: Kenlin Huang
RIE-7 - Unaxis Shuttleline ICP RIE training 11:30 am
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
11:30 am - 12:30 pm kenlinuang@cns.fas.harvard.edu	4	2	Register!

Training: SEM-10 - Hitachi SU8230 SEM user training - In the cleanroom, next to the SEM
Trainer: Christine Yi-Ju Wang
Previous SEM experience preferred. For users who are new to SEM, please complete the Harvard SEM on-line training- There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:30 am	2	FULL	Registration Closed

Training: SPECTRO XEPOS XRF Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Energy dispersive X-ray fluorescence (ED-XRF) spectrometer for elemental analysis of liquid, solid, powder and thin film samples.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:30 pm hylin@fas.harvard.edu	4	4	Register!

Training: STS RIE-8 - LISE CNS Cleanroom
Trainer: Ling Xie
You have to finish NF-Training "Dry Etching Intro" first and then take this training! STS RIE - 8 is an Inductively Coupled Plasma etching system and characterized with high plasma density, low operating pressure, high etch rate, excellent etch uniformity, and low energy ion damage. Major features include: • ICP power up to 1,500 W • RF bias up to 300 W • Available gases: SF6, C4F8, CHF3, CF4, H2, Cl2, HBr, BCl3, Ar, O2, and N2 • Substrate temperatures from 10 °C to 30 °C • Handling 6″ or smaller samples Applications Etching silicon-based materials, boron nitride, and other compatible 2-D materials Available Processes • High aspect ratio Si pillars • Si nano-wires and nano-needles • Si micro holes • Si trenches • SiO2 and Si3N4 trenches • Graphene and boron nitride etch
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:30 pm - 3:00 pm	4	3	Register!

Training: Zeiss SEM Part 2 Training (Pre-Requisite Part 1 Online Training) - LISE B20B
Trainer: Tim Cavanaugh
This training covers the Zeiss FESEMs (Ultra55, Supra55VP, and UltraPlus). Topics include a discussion of microscope capabilities, software overview, and training provides a hands-on approach to acquiring high resolution surface images of various materials under different conditions. Users must complete the available “Zeiss SEM Part 1: Online training” prior to registration.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 4:00 pm	4	FULL	Registration Closed

Time	Max Attendees	Available	CNS Users ONLY
Wednesday, September 26th, 2018
Training: Contact Angle Measuring Tool Training - G06
Trainer: Sandra Nakasone
Pre-requisite: LISE G06 Room Safety Orientation
11:00 am - 11:30 am	3	3	Register!

Training: Cypher AFM General Training (attending the class - G12
Trainer: Antonio Ambrosio
This is the training event where the Cypher AFM is presented. The two hours class "Introduction to Scanning Probe Microscopy" is mandatory before attending this training event.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 3:00 pm	4	3	Register!

Training: FTIR spectroscopy and microscopy - LISE G04
Trainer: Arthur McClelland
Learn to use the Nicolet iS50 with midIR and farIR spectral ranges and the Bruker Lumos with midIR mapping capabilities.
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:00 am	3	2	Register!

Training: Introduction to Lithography - LISE 319
Trainer: Guixiong Zhong
This class introduces the lithography techniques at CNS which include Photolithography, Electron Beam Lithography (EBL), and Nanoscribe 3D lithography. The class is a prerequisite to all lithography tools in the cleanroom.
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 2:00 pm	10	8	Register!

Training: KLA-Tencor P-16 Profiler Training - LISE G06
Trainer: Hao-Yu (Greg) Lin
Surface metrology analysis technique. Capable of step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:00 pm hylin@fas.harvard.edu	4	4	Register!

Training: Lyophilizer/Freeze Dryer Training - G06
Trainer: Sandra Nakasone
Pre-requisite: LISE G06 Room Safety Orientation
Time	Max Attendees	Available	CNS Users ONLY
1:00 pm - 1:30 pm	3	2	Register!

Training: Metrology for Nanofabrication Part-1 (Stylus Profilometry, Ellipsometry, and Electrical Property Measurements) - LISE G07
Trainer: Jason Tresback
Please register and attend the Introduction to Metrology for Nanofabrication Lecture before attending Metrology for Nanofabrication part-1 or 2. Metrology for Nanofabrication part-1 is NOT required to attend part-2. This metrology part-1 training event will focus on fundamental measurement tools for nanofabrication including, contact/stylus surface Profilometer (DekTak XT and 6m) (PL-5/8), single wavelength scanning Ellipsometer (Gaertner-LSE) (ES-2), scanning sheet resistance mapping (CDE-ResMap 4-Pt Probe system) (MET-2), and Semiconductor Parameter Analyzer w/ Signatone 4-Pt Probe Station (Agilent 4156C & Signatone 4pt Probe Station)(PB-1 & CE-1/2). Full independent access to these tools listed above can be achieved, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 12:30 pm	3	1	Register!

Training: Neaspec SNOM general training (attending class - G12
Trainer: Antonio Ambrosio
This training is about imaging with Neaspec Scattering Near-field Optical Microscope. Attending the class "Introduction to Scanning Probe Microscopy" or previous AFM experience is considered mandatory for this training.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 12:00 pm	2	1	Register!

Training: Planetary Ball Mill Training - G06
Trainer: Sandra Nakasone
Pre-requisite: LISE G06 Room Safety Orientation
Time	Max Attendees	Available	CNS Users ONLY
1:30 pm - 2:00 pm	3	3	Register!

Training: RIE-13 - Oxford PlasmaPro 100 Cobra - in front of the tool , inside cleanroom.
Trainer: Kenlin Huang
Dry etching Intro Class is the prerequisite for taking RIE-13 - Oxford PlasmaPro 100 Cobra 300 training (2:30 - 3:30 pm Wednesday)
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:30 pm - 3:30 pm kenlinhuang@cns.fas.harvard.edu, 617-495-1738	3	2	Register!

Training: Spinner training - In the cleanroom, photolithography bay
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 3:30 pm	4	1	Register!

Training: Spinner training - In the cleanroom, photolithography bay
Trainer: Christine Yi-Ju Wang
The training covers the use and programming of the spinner. This training is required for all lithography processes (Ebeam, MLA150, uPG501, mask aligners, etc).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 2:30 pm	4	FULL	Registration Closed

Training: TE3,4&5 Thermal Evaporator Training - G07 PVD Bay (Cleanroom)
Trainer: Malcolm Tse
Training on TE-3, 4 and 5 for thermal evaporation of metals is covered. We meet at the system in the CNS cleanroom PVD bay. Training takes about 2 hours. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, etc.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:00 am - 12:00 pm	4	FULL	Registration Closed

Training: Thermo Scientific K-Alpha+ XPS Training - LISE G27
Trainer: Hao-Yu (Greg) Lin
Surface analysis technique.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 12:00 pm hylin@fas.harvard.edu	4	1	Register!

Training: Wetbench + Chemical Safety Training - OUTSIDE CLEANROOM ENTRANCE - G-07 LISE
Trainer: Mac Hathaway
Training on wetbench safety, chemical safety, Situational Awareness, and how to not DIE at the wetbenches. MAKE SURE YOUR CLEAN SUIT IS HANGING UP READY TO GO.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 12:30 pm	8	4	Register!

Time	Max Attendees	Available	CNS Users ONLY
Thursday, September 27th, 2018
Training: Discussion for nanofabrication related questions. - LISE G52
Trainer: Ling Xie

3:00 pm - 3:30 pm	1	1	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Friday, September 28th, 2018
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Ed Macomber
Use of the EE-4 for thin film metal deposition is covered by going through a standard deposition. EE-4 is fully automated and can deposit the following materials: Au, Pt, Ag, Ti, Cr, Pd. PLEASE NOTE: these listed materials are the only materials that can be used in EE-4. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD bay.
1:00 pm - 2:00 pm (check links in confirmation email for documents)	5	FULL	Registration Closed