TE-5
Sharon Thermal Evaporator TE-5
Nanofabrication Facility
MAKE
Sharon
MODEL
N/A
LOCATION
LISE Cleanroom G07
Equipment description and usage: SHARON TE-5 is a three-source thermal evaporation system for depositing thin films by resistive heating. The three thermal sources are controlled by a 2.5-kW power supply, suitable for sequential deposition. Film thickness is monitored in-situ by a quartz crystal monitor. The base pressure of system can reach 10E-7 torr range pumped by cryo and oil-free roughing pumps. This system is a rapid turn-around machine with a typical pump down time of ~60 minutes and evaporation times of several minutes, dependent on material. This system is currently set up for general metal deposition (Ti, Cr, Ni, Pd, Pt, Ag, Au, Al, Ge).
Click here to view this tool in the CNS virtual reality model.
If you wish to become a qualified user for this system, you must contact Ed Macomber for training and qualification. Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Ed Macomber
eddiemac@cns.fas.harvard.edu
primary contact
David LaFleur
dlafleur@cns.fas.harvard.edu