SHARON TE-5 is a three-source thermal evaporation system for depositing thin films by resistive heating. The three thermal sources are controlled by a 2.5-kW power supply, suitable for sequential deposition. Film thickness is monitored in-situ by a quartz crystal monitor. The base pressure of system can reach 10E-7 torr range pumped by cryopump and dry mechanical roughing pumps. This system is available for the following metals deposition: Ti, Cr, Ni, Pd, Pt, Ag, Au, Al, Ge, and now also these high-vapor materials deposition: Zn, Bi, Mg, Sn, In. These are the only materials allowed in TE-5. Users supply their own materials and evaporation sources (boats) for this system. 

For questions about this system, please contact:  Ed Macomber (eddiemac@cns.fas.harvard.edu)

For training, please contact:  John Tsakirgis (jtsakirg@cns.fas.harvard.edu)

Click here to view this tool in the CNS virtual reality model.