EE-3

Sharon E-Beam Evaporator

Nanofabrication Facility

MAKE

Sharon

MODEL

N/A

LOCATION

LISE Cleanroom G07

Equipment description and usage: SHARON EE-3 is an e-beam evaporation system suitable for depositing metal thin films. The system has a six-pocket e-gun with a 10 kW power supply. Film thickness is in-situ monitored by quartz crystal monitor. The systems vacuum is supported by a cryopump and an oil-free roughing pump. Vacuum can reach 10e-8 torr range. Applications: This system is currently set up for depositing low vapor-pressure metal materials. These metals include: Ag, Co, Cr, Cu, Ge, Mo, Ni, NiFe (permalloy), Pd, and Ti. CNS supplies some of these, others are user supplied.

Click here to view this tool in the CNS virtual reality model.

Contact staff for training information.  Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.

Ed Macomber

eddiemac@cns.fas.harvard.edu

primary contact

David LaFleur

dlafleur@cns.fas.harvard.edu

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