EE-3
Sharon E-Beam Evaporator
Nanofabrication Facility
MAKE
Sharon
MODEL
N/A
LOCATION
LISE Cleanroom G07
Equipment description and usage: SHARON EE-3 is an e-beam evaporation system suitable for depositing metal thin films. The system has a six-pocket e-gun with a 10 kW power supply. Film thickness is in-situ monitored by quartz crystal monitor. The systems vacuum is supported by a cryopump and an oil-free roughing pump. Vacuum can reach 10e-8 torr range. Applications: This system is currently set up for depositing low vapor-pressure metal materials. These metals include: Ag, Co, Cr, Cu, Ge, Mo, Ni, NiFe (permalloy), Pd, and Ti. CNS supplies some of these, others are user supplied.
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Contact staff for training information. Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Ed Macomber
eddiemac@cns.fas.harvard.edu
primary contact
David LaFleur
dlafleur@cns.fas.harvard.edu