RIE-1
South Bay RIE
Nanofabrication Facility
MAKE
South Bay Technology
MODEL
RIE-2000
LOCATION
LISE Cleanroom G07
The SouthBay reactive ion etcher is for anisotropic etching. It is a capacitive coupled parallel plate plasma reactor and equipped with 200W RF generator, manual matching network, 6"" sample stage, and turbo pump. Available etching gases with this tool include SF6, CF4, CHF3, O2, and Ar. RIE-1 can be used to etch Si, SiO2, Si3N4, W, Ti, and other substrate materials.
Click here to view this tool in the CNS virtual reality model.
Contact staff for training information. Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Ling Xie
lxie@cns.fas.harvard.edu
primary contact