RIE-4

Samco UV & Ozone Stripper

Nanofabrication Facility

MAKE

Samco

MODEL

UV-1

LOCATION

LISE Cleanroom G07

The Samco UV-Ozone cleaner uses atomic oxygen, produced via the decomposition of ozone, to remove organic materials from substrates. It can accommodate up to 150 mm diameter samples, with a maximum substrate thickness of 10 mm. The system can effect ozone decomposition by either UV light or thermal energy. The system can also be used as a high-intensity UV-lamp system without ozone generation.

Click here to view this tool in the CNS virtual reality model.

Training is offered on an on-demand basis, contact the tool owner for more information.   Please click over to the Contact Info tab to see current tool owner.  Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.

Kenlin Huang

kenlinhuang@fas.harvard.edu

primary contact

Ling Xie

lxie@cns.fas.harvard.edu

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