OL-4
SUSS MA6 Mask Aligner
Nanofabrication Facility
MAKE
Suss MicroTec
MODEL
MA6
LOCATION
LISE Cleanroom G07
The SUSS MA6 Mask Aligner is the highest resolution contact mask aligner available at the CNS, with sub-micron feature capability in positive tone resists. In addition to the highly accurate topside alignment capability, the MA6 can perform front-to-backside alignment with the use of a second alignment microscope.
Major functions, features, and benefits:
*Topside(TSA) and Backside(BSA) alignment
*Achievable exposure resolution 0.6 µm, alignment resolution better than 1µm
*Maximum substrate size 6"
*Able to perform soft, hard, low vacuum and vacuum contact, as well as proximity exposure
*Restricted to positive-tone photoresists
*Minimum alignment mark separation for binocular vision: 5 cm
Click here to view this tool in the CNS virtual reality model.
Training is offered on-demand, typically after users have been trained on the MJB4 mask aligner. Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Bok Yeop Ahn
byahn@cns.fas.harvard.edu
primary contact
Guixiong Zhong
gzhong@cns.fas.harvard.edu