EL-3
JEOL JSM-7000F
Nanofabrication Facility
MAKE
JEOL
MODEL
JSM-7000F
LOCATION
LISE Cleanroom G07
Imaging Resolution (SEM-mode): 1.2 nm 30kv 1.5 nm 15kv 3.0 nm 1kv Magnification Range: 10X-500,000X Deben PCD Beam Blanking System Beam Current 10pA-200nA Computer controlled large eucentric specimen stage Nabity's Nanometer Pattern Generation System V9.0 Thermal FE SEM.
Click here to view this tool in the CNS virtual reality model.
Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Yuan Lu
ylu@fas.harvard.edu
primary contact
Jiangdong Deng
jdeng@cns.fas.harvard.edu