EL-4
Elionix ELS-7000
Nanofabrication Facility
MAKE
Elionix
MODEL
ELS-7000
LOCATION
LISE Cleanroom G07
Ultra high precision 100 keV Electron Beam Lithography System. Minimum line width 7nm; maximum wafer size 8"". Laser interferometer stage with stitching accuracy 30nm.
Click here to view this tool in the CNS virtual reality model.
Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Yuan Lu
ylu@fas.harvard.edu
primary contact
Jiangdong Deng
jdeng@cns.fas.harvard.edu