Denton EE-4 is an electron beam deposition tool with a 6-position hearth capable of depositing nanoscale films of non-magnetic metals in a vacuum environment on the order of e-7 torr. EE-4 has a dual chamber design that affords the deposition materials to remain under vacuum during sample load-in. EE-4 can accommodate up to five 3"" diameter wafers, or (3) 4"" wafers, or (1) 6"" wafer, or multiple small samples/pieces of wafers on rotating substrate holders. Depositions and pump-down/venting sequences are automated utilizing an onboard PLC that synchronizes these operations. The following materials are available for use in EE-4: Au, Pt, Ag, Ti, Cr, Pd. These are the only materials available in EE-4, and are supplied by CNS.

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