ALD-2
GEMStar ALD and Pulsed CVD
Nanofabrication Facility
MAKE
Arradiance
MODEL
GEMStar
LOCATION
LISE Cleanroom G07
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 - 375 ℃) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 Å per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable (see datasheets). The following processes are available now (Ni3N, Ni, WNx) or will be available in the near future (CoN, Co, Ru, RuO2).
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Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart.
Mughees Khan
mkhan@fas.harvard.edu
primary contact
Mac Hathaway
hathaway@cns.fas.harvard.edu