System is identical to the old K-Alpha model except the ion gun has dual sputtering mode. Sputtering can be done either using monatomic source for standard material or cluster source for polymer and organic material. * Analyzer: 180° double focusing hemispherical analyzer with 128-channel detector * X-ray source: Al k-alpha micro-focused monochromator with variable spot size (30-400µm in 5µm steps) * Ion Gun: Energy range 200-4000eV (monatomic), 2000-8000eV (cluster) * Charge Compensation: Dual beam source and ultra-low energy electron beam * Sample Handling: 4-axis sample stage (60 x 60mm sample area, 20mm maximum sample thickness) * Vacuum System: 2x 220 l/s turbo molecular pumps for entry & analysis chambers * Data-system: Avantage data system * Options: tilt module for ARXPS * Options: biasing module for work function measurement.

Click here to view this tool in the CNS virtual reality model.