EE-5
PVD E-Beam Deposition System
Nanofabrication Facility
MAKE
PVD Products
MODEL
LOCATION
LISE Cleanroom G07
EE-5 (PVD Products E-beam Deposition System) is an automated e-beam evaporator that can deposit six different materials in one pump-down. It utilizes a tilting and rotating stage capable of loading up to (1) 6-inch wafer. Deposition rates are fixed in the recipe, and materials are supplied by CNS.
The only materials available in EE-5 are: Ti, Cr, Au, Pt, Ni, Pd (contact staff for deposition rates).
Cr in EE-5 is limited to 25nm, only for an adhesive layer. Contact CNS staff for thicker Cr films.
There is no cooling on the tilting/rotating substrate stage.
There is an upper rotating, cooling stage (at 15°C) that has been implemented, for PMMA/photoresist deposition (up to 6” diameter wafer).
System thickness accuracy is within 5% on flat surfaces with profilometer measurement (contact staff for details).
Click here to view this tool in the CNS virtual reality model.
Training will consist of working with CNS staff in an assisted use format until the staff feels the user is adequately comfortable to safely operate the system on their own. For training or questions, contact primary contact for additional info. Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart. Prerequisites: LISE Cleanroom Qualification. Thin Film Intro Training.
Ed Macomber
eddiemac@cns.fas.harvard.edu
primary contact
Yumian Zhu
yumian_zhu@fas.harvard.edu