EL-6
Elionix HS50
Nanofabrication Facility
MAKE
Elionix
MODEL
HS50
LOCATION
LISE Cleanroom G07
Elionix HS50 is an ultra-high speed electron beam lithography system with 50 keV acceleration voltage, 100 MHz high frequency deflector, and strong beam current range of 1nA to 1uA. It can handle small piece sample and up to 8" wafer with stiching accuracy 30nm.
Click here to view this tool in the CNS virtual reality model.
Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart. Prerequisites: LISE Cleanroom Qualification. Wetbench Training. Spinner Training. Lithography Intro Training.
Yuan Lu
ylu@fas.harvard.edu
primary contact
Jiangdong Deng
jdeng@cns.fas.harvard.edu