SEC-SC-8
Laurell Spin Coater
NanoMaterials Facility
MAKE
Laurell Technologies
MODEL
WS-650Mz-8NPPB
LOCATION
Allston SEC Soft Lithography 2.125
The Laurell Technologies spin coater is available for spin coating SU-8 photoresist and PDMS onto glass or silicon substrates. We have multiple vacuum chucks and adapters that allow processing substrates of various shape and size, including small fragments, up to 200mm in diameter. It can be programmed with multi-step recipes with a maximum spin speed of 12K RPM and maximum acceleration of 12K RPM/Sec.
Contact Jiten Narang (jnarangATfas.harvard.edu) for training on any tools in the SEC Soft Lith Lab
Hao-Yu (Greg) Lin
hlin@cns.fas.harvard.edu
primary contact
Cathleen Hallinan
cathleen_hallinan@fas.harvard.edu