Maskless Aligner MLA-2 at CNS is an advanced direct-write photolithography tool for exposing photoresist on varieties of substrate materials such as silicon, III-V, glass, diamond, ceramic, and metals etc. The tool is being used for fabrication of quantum devices, MEMS, micro-optic elements, sensors, actuators, MOEMS, and other micro-devices. The system, equipped with both pneumatic and optical focusing, has a minimum resolution of 0.6um ,and a global alignment accuracy of 500nm.