EL-7
Elionix BODEN 150
Nanofabrication Facility
MAKE
Elionix
MODEL
BODEN 150
LOCATION
LISE Cleanroom G07
Elionix B150 is an ultra-high speed electron beam lithography system with 150 keV acceleration voltage, 200 MHz high frequency deflector, and strong beam current range of 5pA to 100nA. It can handle small piece sample and up to 8" wafer with stiching accuracy 20nm or less.
Click here to view this tool in the CNS virtual reality model.
Please refer to the Nanofabrication Facility Use tab of the User Info section of the CNS website for the nanofab training flowchart. Prerequisites: LISE Cleanroom Qualification. Wetbench Training. Spinner Training. Lithography Intro Training.
Yuan Lu
ylu@fas.harvard.edu
primary contact