2D-STACKER-01
2D Materials Stacking System
Nanofabrication Facility
MAKE
Various
MODEL
LOCATION
LISE G27
2D material stacking system is designed for chip scale mechanical stacking of 2D material via polymer-based stamps. Multilayer heterostructures as well as twisted samples can be made using this system. This set up has one of highest resolution micro-manipulators available (20nm). In addition, utilization of highly accurate memory positions enables users to save time during stacking.
Key Features
路 Sample stage rotation: Maximum allowable rotation with 0.003accuracy.
路 Sample stage XY range:
路 Micro-manipulator travel range in XYZ direction: with 20nm resolution
路 Standard substrate size: SiO2 chips. Up to chips can be fitted under the stage. Sample height up to fits on the stage.
路 Temperature range:
Danial Haei
danial_haie@fas.harvard.edu
primary contact
Jiangdong Deng
jdeng@cns.fas.harvard.edu