2D-STACKER-01

2D Materials Stacking System

Nanofabrication Facility

MAKE

Various

MODEL

LOCATION

LISE G27

2D material stacking system is designed for chip scale mechanical stacking of 2D material via polymer-based stamps. Multilayer heterostructures as well as twisted samples can be made using this system. This set up has one of highest resolution micro-manipulators available (20nm). In addition, utilization of highly accurate memory positions enables users to save time during stacking.

 

Key Features

路       Sample stage rotation: Maximum allowable rotation with 0.003accuracy.

路       Sample stage XY range:

路       Micro-manipulator travel range in XYZ direction: with 20nm resolution

路       Standard substrate size: SiO2 chips. Up to chips can be fitted under the stage. Sample height up to fits on the stage.

路       Temperature range:

Danial Haei

danial_haie@fas.harvard.edu

primary contact

Jiangdong Deng

jdeng@cns.fas.harvard.edu

Quick links

doubleArrow-right