All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page

(Important information - please read)

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: CNS Safety Orientation - Online at the Harvard Training Portal
Trainer: Jim Reynolds
This training is required as part of the CNS User enrollment process (step 3 for HU Users, step 7 for non-HU Users). Please note that Non-HU Users, unless they already have a HUID and HU Key, will need to wait until after completion of step 6 of the enrollment process to obtain their HU Key in order to take the CNS Safety Orientation. HU Users and those Non-HU Users who already have a HU Key can take this orientation at any point in the enrollment process. How to take the CNS Safety Orientation: As of May 13, 2024, the CNS Safety Orientation (formerly known as the CNS Safety Training) has moved to the online Harvard Training Portal (HTP) at the URL: https://trainingportalinfo.harvard.edu/ You can navigate directly to the CNS Safety Orientation via the URL: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-0000273303 Alternatively, you can also access the orientation by logging in to the HTP home page. Just put ‘CNS’ in the search bar in the upper right hand corner. All CNS online training options will result. Select the CNS Safety Orientation and complete that training. The orientation will last for about an hour. Once done with the orientation, get a copy of the completion certificate available in the HTP and send it to info@cns.fas.harvard.edu.

Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs). This includes SEM-8, SEM-12, SEM-13, and SEM-14. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: 2D-Stacker-01 training -
Trainer: Danial Haei
This training covers general operation of 2D-Stacker-01. Standard PC stacking process will be covered. Users are expected to bring their own stamps as described in SOP. Please contact danial_haie@fas.harvard.edu to schedule.

Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coater located in the CNS Imaging sample preparation room (LISE B15A). This tool is optimized for coating SEM samples with a thin conductive layer. This coater cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (in-person training), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to the sputter coater. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Any CNS User with a HU Key is eligible to take this training

Training: Introduction to TEM using the JEOL F200 SEC - SEC LL2.301-04 150 Western Ave Allston Ma
Trainer: Adam Graham
In this training you will learn to use the JEOL F200 in TEM mode for basic imaging. More advanced techniques included based on experience level. This is an individual training which will be schedule upon sign up. Group training can be arranged if multiple members from the same group require training. Individual training is 3 hours group training maybe longer based on number of trainees. Prerequisite: registered CNS User, and online CNS Introductory TEM Training (CNS) found on the training portal. Email AGraham@cns.fas.harvard.edu or scheduling.

Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100, JEOL F200 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Any CNS User with a HU Key is eligible to take this training.

Training: RTP-3 AccuThermo Rapid Thermal Processor training - LISE G07 Cleanroom PVD bay (last bay in cleanroom)
Trainer: Danial Haei
This Training covers operation and standard baseline process for RTP-3 AccuThermo Rapid Thermal Processor at CNS. Please contact Danial_haie@fas.harvard.edu to schedule.

Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope (SEC-SPM-13), including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.

Training: SEC - Electronic Characterization Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Keithley 4200A and Signatone probe station for electronic device characterization. Capacitor, resistor, transistor, and photovoltaic measurements, among others, are available. Email colella@fas.harvard.edu to schedule.

Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.

Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Raman Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba LabRAM Soleil Raman microscope. Email colella@fas.harvard.edu to schedule.

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA HR 20 rheometer, including shear, compression, tension, UV curing, and dielectric measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - Tensiometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - UV-Vis/Fluorescence Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba Duetta UV-vis absorbance/fluorescence (photoluminescence) spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC FESEM Zeiss Gemini 360 FESEM - SEC LL2.301-03 150 Western Ave Allston Ma
Trainer: Adam Graham
This training will go over the hands-on portion of the FESEM and will set up your account. If you already have access to the SEMS in Cambridge, I can add your account here please email AGraham@cns.fas.harvard.edu This is an individual training; group training can be arranged if members from same group require training. individual training is 2 hours group longer based on amount of trainees CNS Prerequisite: registered CNS User, and online CNS Online SEM Training Module (CNS) found on the training portal. Email AGraham@cns.fas.harvard.edu or scheduling

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Wednesday, March 25th, 2026
Training: AB-2 RAC Clean Wet Process Station - Acid bench in the cleanroom
Trainer: Bok Yeop Ahn
This training covers the standard operation procedure for the RCA cleaning at the acid wet benches. Listed below please complete the prerequisites before coming to this training session. - LISE Cleanroom Orientation - NF-06 Wet Bench and Chemical Safety Training This training starts at the acid benches in the cleanroom.
4:00 pm - 5:00 pm	3	1	Register!

Training: CVD-14 Oxford ICP-CVD - Low Temp - CNS cleanroom - Dry processing bay at CVD-14
Trainer: Mughees Khan
Introduction to Thin Film Growth and Processing is required before you can sign up for training. This training will enable users to grow high quality SiO2, SiNx, and a-Si films. No doping or active cooling is available on this tool. All baseline processes are at 80C with the exception of a-Si, which runs at 200C. Full temperature range is from -20C to 400C.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
11:00 am - 12:30 pm Prerequisite: Introduction to Thin Film Growth and Processing	3	3	Register!

Training: CVD-3 STS PECVD - CNS Cleanroom - Dry processing bay
Trainer: Mughees Khan
This training will provide users the necessary protocol to deposit high quality SiO2, SiNx, and a:Si films at temperatures from ~200 to 350C. a-Si films can also be doped with B or P. This tool is equipped with two RF generators, one at 13.56MHz (High frequency, HF recipes) and 380 kHz (low frequency, LF recipes). There are also recipes that take advantage of both RF generators to yield films with lower stress esp. silicon nitride films.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
9:00 am - 11:00 am Prerequisite: Introduction to Thin Film Growth and Processing	3	2	Register!

Training: Jupiter XR Atomic Force Microscopy (AFM) Training (SPM-12) Inside the Nanofabrication Cleanroom - Inside Nanofabrication Cleanroom LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This training event will focus on the basic imaging and operation of the Jupiter XR AFM available inside the Nanofabrication Cleanroom (SPM-12). Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. The Jupiter AFM (SPM-12) is for large samples up to 200mm and large scan range (100x100x12um). AFM probes are provided for training; however, users must supply their own probes during independent use. Full independent tool access requires completion of part-1 basic imaging and operation demonstrated by staff, followed by part-2 individual user assisted session that serves as a qualification for independent use on another day.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 4:30 pm	3	FULL	Register!

Training: Metrology for Nanofabrication (Stylus Profilometer, Reflectometer, and Ellipsometer) - Inside Nanofabrication Cleanroom LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
The Metrology for Nanofabrication training event will focus on fundamental measurement tools for thin film characterization including contact/stylus surface Profilometer (Dektak XT) (PL-8 & 11), multi-wavelength scanning Ellipsometer (FS-150XY) (ES-3), and Reflectometer (F50-UVX) (MET-35). Full independent access to these tools listed above will be provided after the training, however the amount of time spent on each tool will vary based on participants. We meet inside the Cleanroom gowning area or within the Metrology Bay inside the CNS cleanroom (G07).
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 12:00 pm	3	1	Register!

Training: NF-06 Wet Bench and Chemical Safety Training - Location: G07 in the gowning room
Trainer: Bok Yeop Ahn
This training covers general operations of all wet benches including spin coating, developing, acid, and wet processing benches as well as chemical safety policies in the cleanroom. All users must complete this training before using any wet benches in the cleanroom. Listed below please complete the prerequisite trainings before coming to this wet bench and chemical safety training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. Let’s meet in the Gouging Room at 1pm.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:00 pm	4	1	Register!

Training: OL-4 - SUSS MA6 Mask Aligner - At the tool in the photo bay
Trainer: Bok Yeop Ahn
This is a training session for MA6 Mask Aligner in the cleanroom. Listed below please complete the prerequisites before getting this training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. - NF-06 Wet Bench and Chemical Safety Training The training starts at the tool in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 4:00 pm	4	FULL	Register!

Training: RIE-13 - Oxford PlasmaPro 100 Cobra 300 - In front of the tool inside cleanroom
Trainer: Kenlin Huang
RIE-13 - Oxford PlasmaPro 100 Cobra 300 training at 3pm.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 4:00 pm 617-495-1738	5	4	Register!

Training: SC-5 - Cleanroom Headway Spinner Training - Negative station in the photo bay
Trainer: Bok Yeop Ahn
This training session covers the standard operation procedure (SOP) for spin coaters in the cleanroom. Listed below please complete the prerequisites before coming to the spin coater training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. - NF-06 Wet Bench and Chemical Safety Training The training starts at the negative resist coating bench in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	4	1	Register!

Training: SP-3 AJA sputtering system training for 3-gun system - CNS cleanroom (G 07) Dry Bay
Trainer: Yumian Zhu
Please read the training description all the way through. If you need to deposit a film thicker than 500nm, please contact the staff before signing up. This training is for standard operating procedure of SP-3 sputtering system. The system has one RF source and two DC sources (DC power supply is switchable between the two sources).The substrate holder can accommodate up to a 4” diameter wafer. SP-3 can deposit many different materials including conductive metals and oxide and nitride materials (Al, Cu, Si3N4, SiO2, etc.). No ferromagnetics (including Ni, Fe, Co) are allowed in SP-3. CNS does not supply Au or Pt for use in SP-3. The system has process O2 flow, process N2 flow, substrate heating to 850C, and can facilitate co-sputtering with one RF and one DC gun. After an additional one-to-one training for target changes, the user can then change targets on their own to fit their own schedule. After 3 uses (with no problems) users are given 24/7 access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 4:00 pm (check document links in confirmation email)	3	2	Register!

Training: WB-3/4 Wedge and Ball Wire Bonders Training Part-1 Basic Operation - LISE-G27
Trainer: Haojie Ji
Part-1, group training. Introduce WB-3 Al wedge bond and WB-4 Au ball bond. One more certificate session needed for full access.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 4:30 pm	3	2	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Thursday, March 26th, 2026
Training: ALD-2 GEMStar ALD Training - Wet Processing Bay - CNS cleanroom
Trainer: Mughees Khan
This training introduces users protocols needed to operate ALD-2. This system is primarily used for depositing conducting metal nitride and potentially pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 � per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable. Currently, only WNx is available. In addition, Al2O3 can also be deposited on this tool.
9:00 am - 10:00 am Prerequisite: Introduction to Thin Film Growth and Processing	2	2	Register!

Training: CNS orientation G07 LISE access - G07
Trainer: John Tsakirgis
To understand safety and operational protocols
Time	Max Attendees	Available	CNS Users ONLY
9:00 am - 10:30 am please meet in front of G07	10	9	Register!

Training: SW-5 Disco Dicing Saw Training Part-1 Basic Operation - LISE-G06
Trainer: Haojie Ji
Part-1, group training. One more certificate session needed for full access. User will also need to take G06 room safety orientation to have room access.
Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 4:30 pm	3	1	Register!

Time	Max Attendees	Available	CNS Users ONLY
Friday, March 27th, 2026
Training: B15A Sample Prep Training - LISE B15A
Trainer: Cathleen Hallinan
The sample prep room training will go over general equipment, consumables provided and safety orientation for the lab.
11:00 am - 12:00 pm meet by the couches on the basement level	6	4	Register!

Training: SP-7 AJA E-Beam System Training - G-27
Trainer: Yumian Zhu
- PLEASE READ THE WHOLE TRAINING DESCRIPTION BEFORE SIGNING UP – If you need to deposit a film thicker than 500nm, please contact the staff before signing up. SP-7 is a Hybrid PVD system includes Sputtering and Ebeam system. This training is for the E-beam part. SP-7 is dedicated to the superconductive material deposition and application. No outgassing, organic substance, such as photoresist, PDMs, etc… allow in the system. The system has 6 pockets that can carry 6 different materials. Currently the system can use aluminum, titanium, niobium. Venting chamber is not allowed in this tool. CNS will provide the materials. The tool has two size of sample carrier, 4” and 6”. But the substrate heater is only suitable for 4” carrier. Do not apply heater function when you are using the 6” carrier. If user needs help, please contact the CNS staffs.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:30 pm (check document links in confirmation email)	4	4	Register!

Training: Zeiss Gemini 360 SEM Training - LISE B15i
Trainer: Tim Cavanaugh
This is a training session on the Zeiss Gemini 360 FESEM for users who have not previously used Zeiss SEM tools at CNS. The Gemini 360 offers high resolution secondary and backscatter imaging at high vacuum, as well as low vacuum capability. This will be an in depth training session covering all aspects of the hardware and software and the entire imaging process. Please attend this training for access to SEM-13 and/or SEM-14. Users should complete the pre-requisite Part 1 Online training prior to registering for this event.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 1:00 pm	4	FULL	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Monday, March 30th, 2026
Training: RIE 10 DRIE SPTS Rapier training - CNS Cleanroom
Trainer: Ling Xie
It is required to take the "Introduction to Dry Etching" before this training. The first hour training is online, Zoom ID 990 9681 5765, passcode 315648. The SPTS Rapier system is for deep silicon etch only, it is configured with dual plasma sources, dual gas inlets, electro-static clamping chuck, AMS chiller to control the chuck temperature from -15�C to + 40�C, and Claritas end-point detector. Specifications � Etch rate: 1.0 � 10 �m/min � Aspect ratio: 5 � 50 � Etch depth: 5�m � several hundreds of microns � Feature size: nm � mm scales in lateral dimension � Sider wall roughness (scallop depth): 6nm � 700nm � Sample size ≤ 6� � Etch mask: only resists and SiO2 allowed The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.
5:00 pm - 6:00 pm The first hour training is online, Zoom ID 990 9681 5765, passcode 315648.	4	4	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Tuesday, March 31st, 2026
Training: Introduction to Dry Etch - Zoom Meeting ID 99096815765, Password: 315648.
Trainer: Ling Xie
This introduction class is a prerequisite for any RIE tool trainings. It is one hour online class with Zoom: Meeting ID 99096815765, Password: 315648.
11:00 am - 12:00 pm	12	11	Register!

Training: Ling Xie's office hour for RIE or general fabrication related issues - online Zoom ID 990 9681 5765, Password 315648
Trainer: Ling Xie

Time	Max Attendees	Available	CNS Users ONLY
3:00 pm - 3:30 pm	1	1	Register!

Training: NF-Training Litho. Intro. - Online by Zoom
Trainer: Bok Yeop Ahn
This is an online training by Zoom, covering CNS lithography tools, policies, and basics of photolithography, e-beam lithography, and 3D laser lithography. Users should take this class before using any tools, including wet benches, spin coaters, and photo- or e-beam lithography tools. The Zoom link will be sent to attendees on the training date.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
9:30 am - 10:30 am Online by Zoom	20	17	Register!

Training: OL-10/11/12 Heidelberg MLA Maskless Aligner Training Part-1 Basic Operation - Inside cleanroom at OL-10
Trainer: Haojie Ji
Part-1, group training. Training covers OL-10, OL-11 and OL-12. One more certificate session needed for full access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 4:30 pm	3	1	Register!

Training: RIE 8 STS ICP RIE training - CNS Cleanroom at the RIE 8
Trainer: Ling Xie

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm	4	1	Register!

Training: RIE-17 - Plasma Therm VERSALINE Etching System - In front of the tool inside the cleanroom
Trainer: Kenlin Huang
RIE-17 - Plasma Therm VERSALINE Etching System tool training at 2 pm.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm 617-495-1738	6	6	Register!

Training: RTP-3 AccuThermo Rapid Thermal Processor training - LISE G07 Cleanroom PVD bay (last bay in cleanroom)
Trainer: Danial Haei
This Training covers operation and standard baseline process for RTP-3 AccuThermo Rapid Thermal Processor at CNS.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 3:00 pm	2	1	Register!

Training: SEM-10, Hitachi SU8230 SEM - At the tool in the cleanroom
Trainer: Bok Yeop Ahn
This is a training session for HITACHI SU8230 SEM in cleanroom at CNS. Listed below, please complete the prerequisites trainings before coming to this SEM-10 tool training. - LISE Cleanroom Orientation - CNS Online SEM Training Module (Online course): https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486 The training starts at the tool in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	3	2	Register!