All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page

IMPORTANT Please Read

CNS is beginning to test and use our new system, the Nanoscale Instrument Control Environment (NICE) to manage training sign-up for some instrumentation as an initial rollout of NICE. Before looking through all the training sign-ups below, please consult the Date TBD training section and look for the CNS NICE TRAINING LISTING. If an instrument or training you are looking for is listed within that listing, it means that sign up for that training will be done through the new NICE system starting on April 1st. To register for a training that is listed in NICE, please go to the URL: https://nice.rc.fas.harvard.edu/nice/. You will need to use your HU Key instead of your CNS UN and PW to access that system. For instruments not listed in the CNS NICE Training Listing as described above, training sign-up will be handled via our current system and listed below.

As always, if there is something that you are looking to be trained on and do not see it listed, please either consult the Tool section of our website and request training via the primary contact via email or contact us at: info@cns.fas.harvard.edu and we will direct you to the correct member of the technical staff for training.

If you attempt to sign up for any training in the new NICE system and run into any issues, please contact us at: info@cns.fas.harvard.edu As with any new system, there are likely to be some issues and minor bumps along the way with implementation. CNS is very interested in feedback on the new system, so please let us know of any comments or concerns that you have as we start the transition to NICE.

(Important information - please read)

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: CNS NICE TRAINING LISTING - NICE System
Trainer: Jim Reynolds
Tools and trainings that can now be found on the new NICE system (https://nice.rc.fas.harvard.edu/nice/): Imaging: SEM-13 Zeiss Gemini 360 FE-SEM SEM-14 Zeiss Gemini 560 FE-SEM SEM-11 JEOL 7900F SEM NanoMaterials: XRA-002 Micro-CT System XRA-008 Thermo Scientific K-AlphaPlus XPS XRA-009 Thermo Scientific Nexsa XPS XRA-013 Micro-XRF System XRA-014 Bruker D6 Phaser XRD Nanofabrication: Intro to Thin Film Processing All ALD Systems (ALDs1-4) CVD-3 STS PECVD CVD-14 Oxford ICP-CVD Low Temp LPCVD and APCVD Training (CVDs-5-6-7-9-10-11) Diamond PECVD SP-7 AJA UHV Sputter System

Training: CNS Safety Orientation - Online at the Harvard Training Portal
Trainer: Jim Reynolds
This training is required as part of the CNS User enrollment process (step 3 for HU Users, step 7 for non-HU Users). Please note that Non-HU Users, unless they already have a HUID and HU Key, will need to wait until after completion of step 6 of the enrollment process to obtain their HU Key in order to take the CNS Safety Orientation. HU Users and those Non-HU Users who already have a HU Key can take this orientation at any point in the enrollment process. How to take the CNS Safety Orientation: As of May 13, 2024, the CNS Safety Orientation (formerly known as the CNS Safety Training) has moved to the online Harvard Training Portal (HTP) at the URL: https://trainingportalinfo.harvard.edu/ You can navigate directly to the CNS Safety Orientation via the URL: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-0000273303 Alternatively, you can also access the orientation by logging in to the HTP home page. Just put ‘CNS’ in the search bar in the upper right hand corner. All CNS online training options will result. Select the CNS Safety Orientation and complete that training. The orientation will last for about an hour. Once done with the orientation, get a copy of the completion certificate available in the HTP and send it to info@cns.fas.harvard.edu.

Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs). This includes SEM-8, SEM-12, SEM-13, and SEM-14. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: 2D-Stacker-01 training -
Trainer: Danial Haei
This training covers general operation of 2D-Stacker-01. Standard PC stacking process will be covered. Users are expected to bring their own stamps as described in SOP. Please contact danial_haie@fas.harvard.edu to schedule.

Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coater located in the CNS Imaging sample preparation room (LISE B15A). This tool is optimized for coating SEM samples with a thin conductive layer. This coater cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (in-person training), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to the sputter coater. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Any CNS User with a HU Key is eligible to take this training

Training: Introduction to TEM using the JEOL F200 SEC - SEC LL2.301-04 150 Western Ave Allston Ma
Trainer: Adam Graham
In this training you will learn to use the JEOL F200 in TEM mode for basic imaging. More advanced techniques included based on experience level. This is an individual training which will be schedule upon sign up. Group training can be arranged if multiple members from the same group require training. Individual training is 3 hours group training maybe longer based on number of trainees. Prerequisite: registered CNS User, and online CNS Introductory TEM Training (CNS) found on the training portal. Email AGraham@cns.fas.harvard.edu or scheduling.

Training: JEOL 7900 SEM Training (for EDS, WDS, EBSD) - LISE B15H
Trainer: Tim Cavanaugh
The JEOL 7900 FE-SEM offers high resolution secondary and backscatter imaging, as well as low vacuum capability. This will be an in-depth training session covering all aspects of the hardware and software and the imaging process. Depending on user requirements, this training can also cover EDS, EBSD, and WDS analyses. Please complete the pre-requisite Part 1 Online SEM training prior to registering for this event, and reach out to Tim Cavanaugh directly to schedule: tcavanaugh@fas.harvard.edu

Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100, JEOL F200 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Any CNS User with a HU Key is eligible to take this training.

Training: RTP-3 AccuThermo Rapid Thermal Processor training - LISE G07 Cleanroom PVD bay (last bay in cleanroom)
Trainer: Danial Haei
This Training covers operation and standard baseline process for RTP-3 AccuThermo Rapid Thermal Processor at CNS. Please contact Danial_haie@fas.harvard.edu to schedule.

Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope (SEC-SPM-13), including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.

Training: SEC - Electronic Characterization Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Keithley 4200A and Signatone probe station for electronic device characterization. Capacitor, resistor, transistor, and photovoltaic measurements, among others, are available. Email colella@fas.harvard.edu to schedule.

Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.

Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Raman Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba LabRAM Soleil Raman microscope. Email colella@fas.harvard.edu to schedule.

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA HR 20 rheometer, including shear, compression, tension, UV curing, and dielectric measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - Tensiometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - UV-Vis/Fluorescence Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba Duetta UV-vis absorbance/fluorescence (photoluminescence) spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC FESEM Zeiss Gemini 360 FESEM - SEC LL2.301-03 150 Western Ave Allston Ma
Trainer: Adam Graham
This training will go over the hands-on portion of the FESEM and will set up your account. If you already have access to the SEMS in Cambridge, I can add your account here please email AGraham@cns.fas.harvard.edu This is an individual training; group training can be arranged if members from same group require training. individual training is 2 hours group longer based on amount of trainees CNS Prerequisite: registered CNS User, and online CNS Online SEM Training Module (CNS) found on the training portal. Email AGraham@cns.fas.harvard.edu or scheduling

Time	Max Attendees	Available	CNS Users ONLY
Monday, September 28th, 2026
Training: Basic KLayout for Photomask Design - LISE 319
Trainer: Ben Suwarato
This introductory course teaches the fundamentals of using K-Layout for photomask design, from downloading K-Layout and setting up workspace to creating, editing, checking, and preparing mask-ready geometries for MLA-150 UV exposure. Students will learn how to work with common layout format GDSII, organize designs using cells, sub-cells, layers, measurement tools, and creating instance geometries. This course is designed for CNS users who want to have photomask layouts ready for the MLA-150 Training and Certification. Prerequisites No prior K-Layout experience is required. Basic familiarity with microfabrication concepts, photolithography, or CAD-style drawing tools is helpful but not necessary. Course Format The course combines short demonstrations with guided exercises. Participants will practice building simple photomask layouts, checking geometry, and organizing design layers. Students should bring their own computers with mice so they can follow along with the hands-on activities.
9:30 am - 11:30 am	2	1	Register!

Training: Woollam RC2 Spectroscopic Ellipsometer Training (ES-4) - Inside Nanofabrication Cleanroom LISE-G07 (cleanroom-metrology bay)
Trainer: Jason Tresback
This training event will cover the basic operation of RC2 spectroscopic ellipsometer to characterize transparent thin films. We begin with sample mounting and alignment, single point measurements, model fitting, and mapping with the option to use a small spot size (125um). The system has a wavelength range of 200-2500nm. We will meet inside the Nanofabrication cleanroom along the windows
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:30 pm	3	FULL	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Tuesday, September 29th, 2026
Training: AB-2 RAC Clean Wet Process Station - Acid bench in the cleanroom
Trainer: Bok Yeop Ahn
This training covers the standard operating procedure for the RCA cleaning at the acid wet benches. Please complete the prerequisites listed below before attending this training session. - LISE Cleanroom Orientation - NF-06 Wet Bench and Chemical Safety Training This training starts at the acid benches in the cleanroom.
1:00 pm - 2:00 pm	3	1	Register!

Training: Introduction to Dry Etch - Online with Zoom: ID 990 9681 5765, passcode 315648.
Trainer: Ling Xie
Introduction to Dry Etching In this introduction class, the basic working principles of Reactive Ion Etch (RIE) and Ion Beam Etch (IBE) will be discussed, main topics include: i) What is the plasma used in dry etching processes? ii) Chemical etching, iii) Physical etching, iv) Etch profile control, and v) Dry etch technologies and capabilities in CNS Cleanroom. This introduction class is pre-required for taking trainings on any CNS dry etching systems. At current time, the class is offered online with Zoom: ID 990 9681 5765, passcode 315648.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
11:00 am - 12:00 pm	12	3	Register!

Training: KLayout Photomask Design Consultation - LISE 509
Trainer: Ben Suwarato
This consultation is intended for CNS users who are new to KLayout, are developing a photomask design, or would like help improving an existing layout. Participants are encouraged to bring their design files, process requirements, and specific questions.
Time	Max Attendees	Available	CNS Users ONLY
10:00 am - 12:00 pm	1	FULL	Register!

Training: OL-9 - Nanoscribe 3D Lithography System - At the tool in the cleanroom
Trainer: Bok Yeop Ahn
This training session covers the standard operating procedure (SOP) for the OL-9 Nanoscribe Lithography System, which is useful for fabricating 3D nanostructures in arbitrary form factors with a minimum resolution of 150 nm. Please complete the prerequisite trainings listed below before attending this training session. - LISE Cleanroom Orientation - NF-Training Litho. Intro. (Bok Yeop Ahn: byahn@cns.fas.harvard.edu) - NF-06 Wet Bench and Chemical Safety Training
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 4:30 pm	3	2	Register!

Training: RIE-17 - Plasma Therm VERSALINE Etching System - In front of the tool inside the cleanroom
Trainer: Kenlin Huang
RIE-17 - Plasma Therm VERSALINE Etching System tool training at 2 pm.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm 617-495-1738	6	3	Register!

Training: SEM-10, Hitachi SU8230 SEM - At the tool in the cleanroom
Trainer: Bok Yeop Ahn
This is a training session for the HITACHI SU8230 SEM in the cleanroom at CNS. Please complete the prerequisite trainings listed below before attending this SEM-10 tool training. - LISE Cleanroom Orientation - CNS Online SEM Training Module (Online course): https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-00008486 The training starts at the tool in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	3	FULL	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Wednesday, September 30th, 2026
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Yumian Zhu
Please read the training description all the way through. For depositions thicker than 0.5 micron, contact CNS staff before signing up for the training. In this training, the use of the Denton EE-4 e-beam system for thin film metal deposition is covered by going through a standard deposition procedure from beginning to end. EE-4 is fully automated and can deposit the following materials: Ag, Ti, Cr, Pd. Please be aware that these listed materials are all that can be done in EE-4 at this time; the materials do not change. Thickness accuracy: a recent (10/2024) measurement showed a deposited (on the controller) thickness of 800Å to yield actual (measured with reflectometry) 785Å and 769Å on two samples using planetary substrate holder and 105% tooling factor. Denton states uniformity over a 4” wafer for this system can be expected to be within 5%. This system can accommodate up to (1) 6” wafer or (3) 4” wafers. There is no substrate cooling. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD Bay.
2:00 pm - 3:00 pm (check document links in confirmation email)	4	2	Register!

Training: EL-6 and EL-7 training - EL-7 room
Trainer: Yuan Lu
EL-6 and EL-7 training
Time	Max Attendees	Available	CNS Users ONLY
11:00 am - 2:00 pm	6	FULL	Register!

Training: FCB-2 Finetech Sigma Flip Chip Bonder Training Part-1 Basic Operation - LISE-G27
Trainer: Haojie Ji
Part-1, group training. One more certificate session needed for full access.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 4:30 pm	3	3	Register!

Training: NF-06 Wet Bench and Chemical Safety Training - In the Gowning Room
Trainer: Bok Yeop Ahn
This training covers the operation of all wet benches, including spin coating, developing, acid, and wet processing benches, as well as chemical safety policies in the cleanroom. All users must complete this training before using any wet benches in the cleanroom. Please complete the prerequisite trainings listed below before attending this wet bench and chemical safety training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. Let’s meet in the Gowning Room at 1 pm.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:00 pm	4	FULL	Register!

Training: OL-10, 11, 12: MLA-150 Training and Certification Options - LISE G07: OL-10
Trainer: Ben Suwarato
MLA-150 Training and Certification Options This course is intended for users who are ready to perform lithography work on the MLA-150 as part of an active research process. Training is conducted using each user’s real research pattern and substrate. Users must have a defined process plan, a photomask design, and a substrate intended for photoresist patterning. Users who want only a general introduction to MLA-150 operation and capabilities should review publicly available MLA-150 training resources instead of signing up for this course. Users may choose Option 1 or Option 2 based on their experience. Please email the instructor with the option you would like to attend. Option 1: Basic Operation Prerequisite: Before attending the Basic Operation session, users must demonstrate the ability to apply photoresist to a wafer by spin coating, including HMDS vapor priming. Users must also demonstrate the ability to manually develop photoresist on a wafer while following all applicable safety protocols. Session Description: This session provides supervised, hands-on MLA-150 training using series exposure mode. Participants work through the photolithography workflow with instructor guidance and may repeat the session as needed to build confidence and achieve an acceptable photoresist pattern. Additional instructor-assisted sessions may cover: 1. Standard exposure mode 2. Alignment exposure This session includes: 1. HMDS vapor priming 2. Photoresist spin coating 3. Soft bake 4. UV exposure matrix, including dose and defocus testing 5. Post-exposure bake 6. Development Required materials: 1. 4-inch or 6-inch Si wafer in a wafer container 2. Tweezers 3. USB drive containing a photomask design 4. Developing container Option 2: Certification Test Prerequisite: Before beginning the Certification Test session, users must demonstrate safe chemical handling during photolithography in accordance with CNS safety protocols. Users must also bring a photomask design and a substrate intended for photoresist patterning. In addition, users must demonstrate the ability to spin coat photoresist on the substrate, including HMDS vapor priming, and to develop exposed photoresist while strictly following all safety protocols. Session Description: This session is intended for users with prior MLA-150 experience who are seeking certification on the MLA systems at CNS. Participants will complete the qualification test using a real research pattern and substrate. Users who do not pass the test must retake it before certification can be granted. This session includes: 1. HMDS vapor priming 2. Photoresist spin coating 3. Soft bake 4. UV exposure using standard exposure mode, with and without alignment 5. Post-exposure bake 6. Development Required materials: 1. Substrate in a sample container 2. Tweezers 3. USB drive containing a photomask design 4. Developing container
Time	Max Attendees	Available	CNS Users ONLY
9:30 am - 11:30 am	1	FULL	Register!

Training: OL-4 - SUSS MA6 Mask Aligner - At the tool in the photo bay
Trainer: Bok Yeop Ahn
This is a training session for MA6 Mask Aligner in the cleanroom. Please complete the prerequisite trainings listed below before attending this spinner training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. - NF-06 Wet Bench and Chemical Safety Training The training starts at the tool in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
3:00 pm - 4:00 pm	4	3	Register!

Training: SC-5 - Cleanroom Headway Spinner Training - Negative station in the photo bay
Trainer: Bok Yeop Ahn
This training session covers the standard operating procedure (SOP) for spin coaters in the cleanroom. Please complete the prerequisite trainings listed below before attending this spinner training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. - NF-06 Wet Bench and Chemical Safety Training The training starts at the negative resist coating bench in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	4	2	Register!

Training: Sharon TE-3, 4, and 5 Thermal Evaporator Training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Please read the whole training description all the way through For films thicker than 0.5um, contact CNS staff This is a training for TE-3, 4 and 5 for thermal evaporation of metals. We meet promptly at the system in the CNS cleanroom PVD bay. To attend this training, you need to be able to show up at the time indicated and stay for the whole training. Plan on about 1.5 hours for this training. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, Ni, etc. Check the links in the confirmation email for important attachments including the S.O.P. Please review the SOP before the training.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm (Please review document links in email confirmation)	3	2	Register!

Training: WB-2 EVG 501 Wafer Bonder Training - Inside cleanroom at WB-2
Trainer: Haojie Ji
One group training session for full tool access.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
10:30 am - 11:30 am	3	2	Register!