All in-person trainings that CNS offers are listed in one of three categories. They are as follows:

Open Event: Any training with this designation is not charged and one does not require a CNS User Name and password in order to register. As a result, you can sign-up for any training with this designation even prior to completion of the CNS User enrollment process.

CNS Users Only: Trainings under this training designation do require an active CNS UN and PW. One must have completed the CNS User enrollment process and received the new user confirmation email in order to attend a training of this designation.

LISE Cleanroom Users Only: Trainings under this designation require, in addition to having a CNS UN and PW, that one be fully cleanroom qualified before one can sign-up. Information on how to become cleanroom qualified can be found in the User Info section of the website under the Nanofabrication Facility Use tab.

CNS does offer some trainings online through the Harvard University Training Portal. They will be listed below and do not require advance sign-up. Online trainings at the portal do require a Harvard Key. If you are a Non-Harvard User who does not have a HUID or HU Key, you will get one as part of the enrollment process.

The LISE CNS Safety Training, which is required as part of the enrollment process, is not listed as it is held at fixed times. Please see the Become a CNS User tab of the CNS web site for more info regarding that training.

Important information regarding training pre-requisite requirements and training pathways for specific instrumentation can be found in the User Info section of the CNS website under the tabs: Nanofabrication Facility Use and Imaging and Analysis Facility Use.

If you cannot find a training for something you are interested in receiving training on at CNS, please see the instrument sections of our website to find the technical staff member who manages it and contact them directly. If you cannot figure out who to contact regarding training, please contact us at info@cns.fas.harvard.edu

It is CNS policy that CNS Users only sign-up for trainings that they plan to attend. It is not permitted for a CNS User to sign-up for a groupmate or other party as a placeholder.

CNS Training Events - Registration Page

IMPORTANT Please Read

CNS is beginning to test and use our new system, the Nanoscale Instrument Control Environment (NICE) to manage training sign-up for some instrumentation as an initial rollout of NICE. Before looking through all the training sign-ups below, please consult the Date TBD training section and look for the CNS NICE TRAINING LISTING. If an instrument or training you are looking for is listed within that listing, it means that sign up for that training will be done through the new NICE system starting on April 1st. To register for a training that is listed in NICE, please go to the URL: https://nice.rc.fas.harvard.edu/nice/. You will need to use your HU Key instead of your CNS UN and PW to access that system. For instruments not listed in the CNS NICE Training Listing as described above, training sign-up will be handled via our current system and listed below.

As always, if there is something that you are looking to be trained on and do not see it listed, please either consult the Tool section of our website and request training via the primary contact via email or contact us at: info@cns.fas.harvard.edu and we will direct you to the correct member of the technical staff for training.

If you attempt to sign up for any training in the new NICE system and run into any issues, please contact us at: info@cns.fas.harvard.edu As with any new system, there are likely to be some issues and minor bumps along the way with implementation. CNS is very interested in feedback on the new system, so please let us know of any comments or concerns that you have as we start the transition to NICE.

(Important information - please read)

Date TBD - you can pre-register for this training session. CNS staff will notify you when a date has been set.
Training: CNS NICE TRAINING LISTING - NICE System
Trainer: Jim Reynolds
Tools and trainings that can now be found on the new NICE system (https://nice.rc.fas.harvard.edu/nice/): Imaging: SEM-13 Zeiss Gemini 360 FE-SEM SEM-14 Zeiss Gemini 560 FE-SEM SEM-11 JEOL 7900F SEM NanoMaterials: XRA-002 Micro-CT System XRA-008 Thermo Scientific K-AlphaPlus XPS XRA-009 Thermo Scientific Nexsa XPS XRA-013 Micro-XRF System XRA-014 Bruker D6 Phaser XRD Nanofabrication: Intro to Thin Film Processing All ALD Systems (ALDs1-4) CVD-3 STS PECVD CVD-14 Oxford ICP-CVD Low Temp LPCVD and APCVD Training (CVDs-5-6-7-9-10-11) Diamond PECVD SP-7 AJA UHV Sputter System

Training: CNS Safety Orientation - Online at the Harvard Training Portal
Trainer: Jim Reynolds
This training is required as part of the CNS User enrollment process (step 3 for HU Users, step 7 for non-HU Users). Please note that Non-HU Users, unless they already have a HUID and HU Key, will need to wait until after completion of step 6 of the enrollment process to obtain their HU Key in order to take the CNS Safety Orientation. HU Users and those Non-HU Users who already have a HU Key can take this orientation at any point in the enrollment process. How to take the CNS Safety Orientation: As of May 13, 2024, the CNS Safety Orientation (formerly known as the CNS Safety Training) has moved to the online Harvard Training Portal (HTP) at the URL: https://trainingportalinfo.harvard.edu/ You can navigate directly to the CNS Safety Orientation via the URL: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt-0000273303 Alternatively, you can also access the orientation by logging in to the HTP home page. Just put ‘CNS’ in the search bar in the upper right hand corner. All CNS online training options will result. Select the CNS Safety Orientation and complete that training. The orientation will last for about an hour. Once done with the orientation, get a copy of the completion certificate available in the HTP and send it to info@cns.fas.harvard.edu.

Training: Zeiss SEM Part 1: Online training - Harvard Training Portal
Trainer: Tim Cavanaugh
The SEM Part 1 training is available in an online format. You must pass this online training before taking the hands-on SEM training for our field emission Zeiss SEMs (FESEMs). This includes SEM-8, SEM-12, SEM-13, and SEM-14. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000007001 PLEASE NOTE THAT THIS TRAINING IS ONLY FOR FULLY ENROLLED CNS USERS. IF YOU ARE LOOKING FOR THE FREE CNS IMAGING GROUP MASTERCLASS WEBINARS, PLEASE SEE FURTHER BELOW Please note that this training requires a Harvard Key. If you are an external user and do not have a Harvard Key, please contact info@cns.fas.harvard.edu for details.

Training: 2D-Stacker-01 training -
Trainer: Danial Haei
This training covers general operation of 2D-Stacker-01. Standard PC stacking process will be covered. Users are expected to bring their own stamps as described in SOP. Please contact danial_haie@fas.harvard.edu to schedule.

Training: HAR-053 sputter coater training (online) - Harvard Training Portal
Trainer: Jules Gardener
This training is for the EMS sputter coater located in the CNS Imaging sample preparation room (LISE B15A). This tool is optimized for coating SEM samples with a thin conductive layer. This coater cannot be used for coating thick (>20nm) films. Pt/Pd and Au coatings are available. Sputter coater training is available in an online format for these tools. You must pass this online training, and have completed the B15A room safety training (in-person training), before access to the sputter coaters can be granted. Once you have completed these requirements, you will have access to the sputter coater. There is no sign-up required for our online trainings and these can be taken by CNS users at any time. You can access the sputter coater training course at https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/leclassview/dowbt000000000004421 Please copy this URL into your browser to take the training. We recommend using Chrome, Safari or Internet Explorer. Any CNS User with a HU Key is eligible to take this training

Training: Introduction to TEM using the JEOL F200 SEC - SEC LL2.301-04 150 Western Ave Allston Ma
Trainer: Adam Graham
In this training you will learn to use the JEOL F200 in TEM mode for basic imaging. More advanced techniques included based on experience level. This is an individual training which will be schedule upon sign up. Group training can be arranged if multiple members from the same group require training. Individual training is 3 hours group training maybe longer based on number of trainees. Prerequisite: registered CNS User, and online CNS Introductory TEM Training (CNS) found on the training portal. Email AGraham@cns.fas.harvard.edu or scheduling.

Training: Online TEM training course - Harvard Training Portal
Trainer: Jules Gardener
This is a new online training which is required as the first step of TEM training for the JEOL 2100, JEOL F200 and Hitachi 7800 instruments. This training will provide an introduction to TEM concepts and background about our TEMs. You must pass the assessment at the end of this online course before attending an in-person TEM training on the JEOL 2100 or Hitachi 7800 instruments. There is no sign-up required for the online training; you can access the training course from this link: https://trainingportal.harvard.edu/Saba/Web_spf/NA1PRD0068/common/ledetail/cours000000000010142 Any CNS User with a HU Key is eligible to take this training.

Training: RTP-3 AccuThermo Rapid Thermal Processor training - LISE G07 Cleanroom PVD bay (last bay in cleanroom)
Trainer: Danial Haei
This Training covers operation and standard baseline process for RTP-3 AccuThermo Rapid Thermal Processor at CNS. Please contact Danial_haie@fas.harvard.edu to schedule.

Training: SEC - AFM Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker JPK NanoWizard 4 XP atomic force microscope (SEC-SPM-13), including mechanical and fluorescence-correlated measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DLS/Zetasizer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Malvern Zetasizer Pro for dynamic light scattering and zeta potential measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - DMA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Mettler Toledo DMA 1 dynamic mechanical analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - DSC Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discover DSC 250 differential scanning calorimeter. Email colella@fas.harvard.edu to schedule.

Training: SEC - Electronic Characterization Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Keithley 4200A and Signatone probe station for electronic device characterization. Capacitor, resistor, transistor, and photovoltaic measurements, among others, are available. Email colella@fas.harvard.edu to schedule.

Training: SEC - FTIR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Nicolet iS50 infrared spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Nanoindenter Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker Hysitron TS 77 nanoindenter. Email colella@fas.harvard.edu to schedule.

Training: SEC - NMR Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Magritek Spinsolve 80 nuclear magnetic resonance spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Optical Profilometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Bruker ContourX optical profilometer. Email colella@fas.harvard.edu to schedule.

Training: SEC - Raman Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba LabRAM Soleil Raman microscope. Email colella@fas.harvard.edu to schedule.

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA HR 20 rheometer, including shear, compression, tension, UV curing, and dielectric measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - Tensiometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Droplet Lab Tensiometer for surface tension and contact angle measurements. Email colella@fas.harvard.edu to schedule.

Training: SEC - TGA Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA Discovery TGA 550 thermogravimetric analyzer. Email colella@fas.harvard.edu to schedule.

Training: SEC - UV-Vis/Fluorescence Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the Horiba Duetta UV-vis absorbance/fluorescence (photoluminescence) spectrometer. Email colella@fas.harvard.edu to schedule.

Training: SEC FESEM Zeiss Gemini 360 FESEM - SEC LL2.301-03 150 Western Ave Allston Ma
Trainer: Adam Graham
This training will go over the hands-on portion of the FESEM and will set up your account. If you already have access to the SEMS in Cambridge, I can add your account here please email AGraham@cns.fas.harvard.edu This is an individual training; group training can be arranged if members from same group require training. individual training is 2 hours group longer based on amount of trainees CNS Prerequisite: registered CNS User, and online CNS Online SEM Training Module (CNS) found on the training portal. Email AGraham@cns.fas.harvard.edu or scheduling

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Wednesday, April 29th, 2026
Training: Denton E-beam Evaporator (EE-4) training - LISE G07 (cleanroom); PVD Bay
Trainer: Yumian Zhu
Please read the training description all the way through. For depositions thicker than 0.5 micron, contact CNS staff before signing up for the training. In this training, the use of the Denton EE-4 e-beam system for thin film metal deposition is covered by going through a standard deposition procedure from beginning to end. EE-4 is fully automated and can deposit the following materials: Ag, Ti, Cr, Pd. For Au, Pt, user need to bring their own materials and crucible. CNS staff will provide the training on how to install/remove their Au, Pt crucible from the tool. Please be aware that these listed materials are all that can be done in EE-4 at this time; the materials do not change. Thickness accuracy: a recent (10/2024) measurement showed a deposited (on the controller) thickness of 800Å to yield actual (measured with reflectometry) 785Å and 769Å on two samples using planetary substrate holder and 105% tooling factor. Denton states uniformity over a 4” wafer for this system can be expected to be within 5%. This system can accommodate up to (1) 6” wafer or (3) 4” wafers. There is no substrate cooling. We use a test sample for a quick deposition, which is all that's required for the training. Plan on ~1 hr for this training. We meet promptly right at the machine in the LISE CR PVD Bay.
2:00 pm - 3:00 pm (check document links in confirmation email)	4	2	Register!

Training: EL-6 and EL-7 training - EL-7 room
Trainer: Yuan Lu
EL-6 and EL-7 training
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
11:00 am - 2:00 pm	6	5	Register!

Training: FCB-2 Finetech Sigma Flip Chip Bonder Training Part-1 Basic Operation - LISE-G27
Trainer: Haojie Ji
Part-1, group training. One more certificate session needed for full access.
Time	Max Attendees	Available	CNS Users ONLY
2:00 pm - 4:30 pm	3	1	Register!

Training: NF-06 Wet Bench and Chemical Safety Training - Location: G07 in the gowning room
Trainer: Bok Yeop Ahn
This training covers general operations of all wet benches, including spin coating, developing, acid, and wet processing benches, as well as chemical safety policies in the cleanroom. All users must complete this training before using any wet benches in the cleanroom. Listed below, please complete the prerequisite trainings before coming to this wet bench and chemical safety training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. Let’s meet in the Gowning Room at 1pm.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:00 pm	4	FULL	Register!

Training: SC-5 - Cleanroom Headway Spinner Training - Negative station in the photo bay
Trainer: Bok Yeop Ahn
This training session covers the standard operation procedure (SOP) for spin coaters in the cleanroom. Listed below please complete the prerequisites before coming to the spin coater training. - LISE Cleanroom Orientation - NF-Training Litho. Intro. - NF-06 Wet Bench and Chemical Safety Training The training starts at the negative resist coating bench in the photolithography bay.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm	4	1	Register!

Training: SEC - Rheometer Training - SEC LL2.226
Trainer: Nicholas Colella
Training on the TA HR 20 rheometer, including shear, compression, tension, UV curing, and dielectric measurements.
Time	Max Attendees	Available	CNS Users ONLY
3:30 pm - 5:30 pm	2	1	Register!

Training: Sharon EE-3 e-beam evaporator training - We meet in the cleanroom PVD bay (last bay inside of LISE G07)
Trainer: Ed Macomber
Please read the training description all the way through: For depositions thicker than 0.5 micron, contact CNS staff. E-beam evaporation in EE-3 is covered; EE-3 can deposit 19 different materials (metals). All materials are user supplied for EE-3 (pellets and crucible liners). We will cover venting, loading the sample, pumping down (vacuum system) and the actual deposition. Plan on ~1.5 hr for this training. This is a manually operated deposition system and will likely take most users a few times using it to become comfortable with the machine. We meet in the cleanroom PVD bay (last bay inside LISE G07). Once you sign up, you will receive the training confirmation email which will contain links to documents including the SOP. Please be sure to review the SOP BEFORE the training. If you are using expensive materials (Au, Pt, Pd, etc.) you might consider using the TE systems so you can use less material; the EE systems require the crucible liner to be at least ½ full (~65g of Au) so it is quite expensive.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm (Please review document links in email confirmation)	3	1	Register!

Time	Max Attendees	Available	LISE Cleanroom Users ONLY
Thursday, April 30th, 2026
Training: CD-2 Critical Point Dryer Training - At CD-2, next to the benches.
Trainer: Haojie Ji
One training session, for sample preparation and use of Critical Point Dryer.
2:30 pm - 3:30 pm	4	2	Register!

Training: CNS orientation G07 LISE access - G07
Trainer: John Tsakirgis
To understand safety and operational protocols
Time	Max Attendees	Available	CNS Users ONLY
9:00 am - 10:30 am please meet in front of G07	10	9	Register!

Training: EE-5 PVD System E-beam Evaporator Training - Dry Bay in cleanroom
Trainer: Yumian Zhu
- PLEASE READ THE WHOLE TRAINING DESCRIPTION BEFORE SIGNING UP – E-beam deposition for <500nm. If you need to deposit materials more than 500nm thick, please contact CNS staff before signing up for the training. EE-5 is an automated pumping and deposition e-beam system. Pd, Ni, Ti, and Cr are the only materials in EE-5. For Au, Pt, user need to bring their own materials and crucible. CNS staff will provide the training on how to install/remove their Au, Pt crucible from the tool. Cr is limited to 25nm in EE-5 (adhesive layer only). Materials are supplied by CNS. The system accommodates a substrate up to a (1) 6” wafer. Precision GLADS stage for tilting and rotating the substrate. Uniformity is about 5% over a 6” wafer, on a flat deposition, according to the vendor. There is no cooling on the GLADS sample stage. Training takes about one hour. You need to be able to show up on time and stay for the whole training. Please read through the SOP (linked in the confirmation email) before the training, it makes things go a lot smoother.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
2:00 pm - 3:00 pm (check document links in confirmation email)	3	1	Register!

Training: Sharon TE-3, 4, and 5 Thermal Evaporator Training - LISE G07 (CNS Cleanroom), PVD Bay
Trainer: Ed Macomber
Please read the whole training description all the way through For films thicker than 0.5um, contact CNS staff This is a training for TE-3, 4 and 5 for thermal evaporation of metals. We meet promptly at the system in the CNS cleanroom PVD bay. To attend this training, you need to be able to show up at the time indicated and stay for the whole training. Plan on about 1.5 hours for this training. Venting, loading a sample, pumping and evaporation are performed and explained. For these TE systems, users supply their own deposition materials and boats (sources). CNS supplies the materials for training. After this training you will have access to all 3 systems, which are collectively capable of depositing: Ti, Cr, Cu, Ag, Au, Al, Ni, etc. Check the links in the confirmation email for important attachments including the S.O.P. Please review the SOP before the training.
Time	Max Attendees	Available	LISE Cleanroom Users ONLY
1:00 pm - 2:30 pm (Please review document links in email confirmation)	3	FULL	Register!