3/14/25 12pm – 1pm, LISE 303

Patterning nanostructures is deceptively simple when you have access to state-of-the-art tools like CNS’s Elionix e-beam lithography instruments. But the devil is in the details, especially where minimizing nanoscale imperfections is crucial, like in photonics. In this tutorial we will cover advanced methods of e beam lithography from exposure to development, giving you the knowledge and tools to help you develop the optimal process flow for your research.

We will cover:

– e beam lithography system column: what’s inside and how it works

– Sources of imperfections in exposures and how to mitigate them

– Strategies for pattern preparation

– Resist development optimization