Harvard CNS

CNS Nanofabrication Team will continue offering a series of tutorials on nanofabrication technologies in this summer. Two tutorials every week will cover the fundamentals of each nanofabrication technology. The operation principles, process tips/tricks, and related frontier research and applications will be discussed. All CNS users are eligible to attend.
Certificate will be awarded to any attendee who takes more than 7 courses!!

Agenda
Jun 21 Introduction of Nanofabrication JD Deng
Jun 24 Photolithography Guixiong Zhong
Jun 28 E-beam Lithography (EBL) and beyond Yuan Lu
July 5 Advanced Laser Writing Technologies Heidelberg Ins.
July 8 Reactive Ion Etch (RIE) Ling Xie
July 12 ALE- CNS Seminar II Oxford Corp.
July 15 Thin Film Growth - (CVD-PVD-ALD) Mughees Khan
July 19 Die Bonding Methods and Materials - Finetech & Indium
July 22 Metrology for Nanofabrication Jason Tresback
July 26 MEMS process and Packaging Guixiong Zhong

Location and Time: 100 Geological Lecture Hall, 24 Oxford St., Cambridge MA,
02138, Tuesday/ Friday, 12:00-1:30pm, Pizza lunch is available.

The agenda may be changed according to staff’s availability.
Contact Ling Xie: lxie@cns.fas.harvard.edu; Jiangdong Deng: jdeng@cns.fas.harvard.edu

New research, partly performed at the Center for Nanoscale Systems, in which the researchers design, fabricate, and demonstrate a Pockels modulator in silicon carbide can be found in a Nature Communications publication and highlighted by the Harvard School of Engineering and Applied Science.

We are excited to announce the arrival of our new Maskless Aligner MLA-2 at CNS. This is an advanced direct-write photolithography tool for exposing photoresist on varieties of substrate materials such as silicon, III-V, glass, diamond, ceramic, and metals etc. The tool is being used for fabrication of quantum devices, MEMS, micro-optic elements, sensors, actuators, MOEMS, and other micro-devices. The system, equipped with both pneumatic and optical focusing, has a minimum resolution of 0.6um ,and a global alignment accuracy of 500nm.

The RC2 spectroscopic ellipsometer provides innovative new technology: dual rotating compensators, achromatic compensator design, advanced light source, and next-generation spectrometer design. The RC2 is a near-universal solution for the diverse applications of spectroscopic ellipsometry and Mueller matrix ellipsometry.

Measurement Capabilities

• High speed data acquisition over a wide spectral range (210nm-2500nm) with small focus spot (120um) and live camera sample view.

• Standard SE: Both Psi and Delta over their full range.

• Generalized-SE: Characterize samples with complete 2x2 Jones matrix.

• Mueller matrix SE: Measure 15 normalized MM elements or all 16 un-normalized MM elements.

• Depolarization: Check sample properties that cause depolarization.

• Intensity Reflectance and Transmittance (manual mount).

• Like- and Cross-polarized Intensity: Determine pp, ss, ps and sp Reflectance or Transmittance